FR2391494B1 - - Google Patents

Info

Publication number
FR2391494B1
FR2391494B1 FR7813995A FR7813995A FR2391494B1 FR 2391494 B1 FR2391494 B1 FR 2391494B1 FR 7813995 A FR7813995 A FR 7813995A FR 7813995 A FR7813995 A FR 7813995A FR 2391494 B1 FR2391494 B1 FR 2391494B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7813995A
Other versions
FR2391494A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of FR2391494A1 publication Critical patent/FR2391494A1/fr
Application granted granted Critical
Publication of FR2391494B1 publication Critical patent/FR2391494B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
FR7813995A 1977-05-20 1978-05-11 Procede pour ajuster une pastille semi-conductrice par rapport a un masque d'irradiation lors de la photolithographie aux rayons x Granted FR2391494A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772722958 DE2722958A1 (de) 1977-05-20 1977-05-20 Verfahren zur justierung einer halbleiterscheibe relativ zu einer bestrahlungsmaske bei der roentgenstrahl-fotolithografie

Publications (2)

Publication Number Publication Date
FR2391494A1 FR2391494A1 (fr) 1978-12-15
FR2391494B1 true FR2391494B1 (fr) 1980-06-20

Family

ID=6009531

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7813995A Granted FR2391494A1 (fr) 1977-05-20 1978-05-11 Procede pour ajuster une pastille semi-conductrice par rapport a un masque d'irradiation lors de la photolithographie aux rayons x

Country Status (4)

Country Link
US (1) US4176281A (fr)
JP (1) JPS53144681A (fr)
DE (1) DE2722958A1 (fr)
FR (1) FR2391494A1 (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2827086C2 (de) * 1978-06-16 1980-07-24 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Fokuseinstellung und Fehlerkorrektur eines elektronenoptischen Kondensors in einem Mikroprojektor und Mikroprojektor zur Durchführung des Verfahrens
JPS56111225A (en) * 1980-02-01 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai X ray exposuring device
JPS56111224A (en) * 1980-02-01 1981-09-02 Chiyou Lsi Gijutsu Kenkyu Kumiai X ray exposuring device
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
JPS57183034A (en) * 1981-05-07 1982-11-11 Toshiba Corp Electron bean transfer device
DE3121666A1 (de) * 1981-05-30 1982-12-16 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren und einrichtung zur gegenseitigen ausrichtung von objekten bei roentgenstrahl- und korpuskularstrahl-belichtungsvorgaengen
JPS587823A (ja) * 1981-07-06 1983-01-17 Hitachi Ltd アライメント方法およびその装置
US4790694A (en) * 1986-10-09 1988-12-13 Loma Park Associates Method and system for multi-layer printed circuit board pre-drill processing
DE3640616A1 (de) * 1986-11-27 1988-06-09 Standard Elektrik Lorenz Ag Justiervorrichtung
EP0357425B1 (fr) * 1988-09-02 1996-11-06 Canon Kabushiki Kaisha Dispositif d'exposition
JP2795005B2 (ja) * 1991-10-15 1998-09-10 日本電気株式会社 シンクロトロン放射光の光軸と露光装置の軸の傾斜角度検出器
WO1994008443A1 (fr) * 1992-09-29 1994-04-14 Berg N Edward Procede et dispositif de fabrication de plaquettes de circuits imprimes
WO2005092043A2 (fr) * 2004-03-22 2005-10-06 Epic Research Company, Inc. Procede de fabrication de cartes de circuit imprime
US7835001B2 (en) * 2006-05-24 2010-11-16 Samsung Mobile Display Co., Ltd. Method of aligning a substrate, mask to be aligned with the same, and flat panel display apparatus using the same
TWI401832B (zh) * 2008-12-15 2013-07-11 Hitachi High Tech Corp Organic electroluminescent light making device, film forming apparatus and film forming method, liquid crystal display substrate manufacturing apparatus, and calibration apparatus and calibration method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3802940A (en) * 1969-08-18 1974-04-09 Computervision Corp Enhanced contrast semiconductor wafer alignment target and method for making same
US3745358A (en) * 1971-05-10 1973-07-10 Radiant Energy Systems Alignment method and apparatus for electron projection systems
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process
US3742229A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask alignment system
US3984680A (en) * 1975-10-14 1976-10-05 Massachusetts Institute Of Technology Soft X-ray mask alignment system
US4085329A (en) * 1976-05-03 1978-04-18 Hughes Aircraft Company Hard X-ray and fluorescent X-ray detection of alignment marks for precision mask alignment

Also Published As

Publication number Publication date
DE2722958A1 (de) 1978-11-23
US4176281A (en) 1979-11-27
JPS53144681A (en) 1978-12-16
FR2391494A1 (fr) 1978-12-15

Similar Documents

Publication Publication Date Title
DE2818655C2 (fr)
DE2808505C2 (fr)
DE2844116C2 (fr)
FR2391494B1 (fr)
DE2846937C2 (fr)
DE2718896C3 (fr)
AU3353778A (fr)
AU495917B2 (fr)
AR210643A1 (fr)
AU71461S (fr)
BG25847A1 (fr)
BG25839A1 (fr)
CH597013A5 (fr)
BG26850A1 (fr)
BG26790A1 (fr)
BG26115A1 (fr)
BG25860A1 (fr)
BG25855A1 (fr)
BG25813A1 (fr)
BG25853A1 (fr)
BG25852A1 (fr)
BG25851A1 (fr)
BG25850A1 (fr)
BG25848A1 (fr)
BG25815A1 (fr)

Legal Events

Date Code Title Description
ST Notification of lapse