FR2380627A1 - PROCESS FOR MANUFACTURING AN ELECTRONIC CERAMIC COMPONENT - Google Patents

PROCESS FOR MANUFACTURING AN ELECTRONIC CERAMIC COMPONENT

Info

Publication number
FR2380627A1
FR2380627A1 FR7803479A FR7803479A FR2380627A1 FR 2380627 A1 FR2380627 A1 FR 2380627A1 FR 7803479 A FR7803479 A FR 7803479A FR 7803479 A FR7803479 A FR 7803479A FR 2380627 A1 FR2380627 A1 FR 2380627A1
Authority
FR
France
Prior art keywords
ceramic
coating
metal
manufacturing
ceramic component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7803479A
Other languages
French (fr)
Other versions
FR2380627B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1380077A external-priority patent/JPS5399453A/en
Priority claimed from JP2191077A external-priority patent/JPS53115095A/en
Priority claimed from JP52155207A external-priority patent/JPS6036089B2/en
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of FR2380627A1 publication Critical patent/FR2380627A1/en
Application granted granted Critical
Publication of FR2380627B1 publication Critical patent/FR2380627B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/006—Thin film resistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/30—Apparatus or processes specially adapted for manufacturing resistors adapted for baking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/10—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material voltage responsive, i.e. varistors
    • H01C7/102—Varistor boundary, e.g. surface layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Capacitors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)

Abstract

Ce procédé concerne la fabrication d'un composant électronique en céramique, notamment un élément résistant non linéaire dépendant de la tension ou un condensateur en céramique semi-conductrice. Un revêtement de métal est formé avec une uniformité précise sur la surface d'une céramique, puis le revêtement de métal est traité par la chaleur afin de convertir un métal de ce revêtement en un composé métallique pour former un revêtement de composé métallique sur la surface de la céramique et/ou diffuser une partie ou la totalité du revêtement de metal dans la céramique, en vue d'obtenir des propriétés électriques entièrement différentes de celles d'une ceramique non traitée. Le procédé de l'invention est applicable de façon particulièrement avantageuse à un condensateur en céramique semi-conductrice.This method relates to the manufacture of an electronic ceramic component, in particular a non-linear voltage-dependent resistive element or a semiconductor ceramic capacitor. A metal coating is formed with precise uniformity on the surface of a ceramic, then the metal coating is heat treated to convert a metal of that coating to a metal compound to form a metal compound coating on the surface. ceramic and / or diffusing part or all of the metal coating in the ceramic, in order to obtain electrical properties entirely different from those of untreated ceramic. The method of the invention is particularly advantageously applicable to a semiconductor ceramic capacitor.

FR7803479A 1977-02-09 1978-02-08 PROCESS FOR MANUFACTURING AN ELECTRONIC CERAMIC COMPONENT Granted FR2380627A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP1380077A JPS5399453A (en) 1977-02-09 1977-02-09 Method of porcelain electronic part
JP2191077A JPS53115095A (en) 1977-02-28 1977-02-28 Preparation of porcelain electron articles
JP52155207A JPS6036089B2 (en) 1977-12-21 1977-12-21 Manufacturing method of porcelain electronic components

Publications (2)

Publication Number Publication Date
FR2380627A1 true FR2380627A1 (en) 1978-09-08
FR2380627B1 FR2380627B1 (en) 1983-02-11

Family

ID=27280407

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7803479A Granted FR2380627A1 (en) 1977-02-09 1978-02-08 PROCESS FOR MANUFACTURING AN ELECTRONIC CERAMIC COMPONENT

Country Status (5)

Country Link
AU (1) AU497648B2 (en)
DE (1) DE2805228B2 (en)
FR (1) FR2380627A1 (en)
GB (1) GB1556638A (en)
NL (1) NL175674C (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0062314A2 (en) * 1981-04-03 1982-10-13 Hitachi, Ltd. Non-linear resistor and production thereof
EP0223303A1 (en) * 1985-11-15 1987-05-27 Koninklijke Philips Electronics N.V. N-conducting electrical ceramic element with contacting layers

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56169316A (en) * 1980-05-30 1981-12-26 Matsushita Electric Ind Co Ltd Composition functional element and method of producing same
DE3121289A1 (en) * 1981-05-29 1982-12-23 Philips Patentverwaltung Gmbh, 2000 Hamburg VOLTAGE-RESISTANT RESISTANCE AND METHOD FOR THE PRODUCTION THEREOF
DE3121290A1 (en) * 1981-05-29 1983-01-05 Philips Patentverwaltung Gmbh, 2000 Hamburg "NON-LINEAR RESISTANCE AND METHOD FOR THE PRODUCTION THEREOF"
DE3134918A1 (en) * 1981-09-03 1983-03-17 Matsushita Electric Industrial Co., Ltd., Kadoma, Osaka "Electrode on heat-resistant, insulating substrate and method for manufacturing it"

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3905006A (en) * 1972-12-29 1975-09-09 Michio Matsuoka Voltage dependent resistor

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL135251C (en) * 1963-02-22
US3673119A (en) * 1968-10-11 1972-06-27 Tdk Electronics Co Ltd Semiconducting ceramic compositions

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3905006A (en) * 1972-12-29 1975-09-09 Michio Matsuoka Voltage dependent resistor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0062314A2 (en) * 1981-04-03 1982-10-13 Hitachi, Ltd. Non-linear resistor and production thereof
EP0062314A3 (en) * 1981-04-03 1983-09-07 Hitachi, Ltd. Non-linear resistor and production thereof
EP0223303A1 (en) * 1985-11-15 1987-05-27 Koninklijke Philips Electronics N.V. N-conducting electrical ceramic element with contacting layers

Also Published As

Publication number Publication date
NL175674B (en) 1984-07-02
DE2805228B2 (en) 1981-06-19
AU497648B2 (en) 1978-12-21
GB1556638A (en) 1979-11-28
NL175674C (en) 1984-12-03
DE2805228A1 (en) 1978-08-17
NL7801443A (en) 1978-08-11
FR2380627B1 (en) 1983-02-11

Similar Documents

Publication Publication Date Title
US4292007A (en) Fastener and washer assembly
BR7502540A (en) NON-ELECTROLYTIC DEPOSITION BATH AND DEPOSITION PROCESS OF A METALLIC SUBSTRATE WITH A METAL FROM THE IB GROUP
FR2404704A1 (en) METALLIC TEXTILE MATERIAL
GB1031837A (en) Improvements in or relating to metal plating
ATE13319T1 (en) METHOD OF ACTIVATING SURFACES FOR ELECTRICAL METALLIZATION.
FR2380627A1 (en) PROCESS FOR MANUFACTURING AN ELECTRONIC CERAMIC COMPONENT
US3260634A (en) Method of etching a semiconductor wafer to provide tapered dice
US3526555A (en) Method of masking a semiconductor with a liftable metallic layer
DE1929084C3 (en) Etching solution for a method for producing a semiconductor component
JPS55111132A (en) Amending method of photomask
DE2644448A1 (en) STRUCTURE WITH A WAVE SOURCE AND METHOD OF JOINT MANUFACTURING OF SUCH STRUCTURES
DE2436600A1 (en) METHOD FOR ACHIEVING A SURFACE STABILIZING PROTECTIVE LAYER IN SEMICONDUCTOR COMPONENTS
DE2132095A1 (en) Electric coils and methods of making the same
DE888498C (en) Process for rough-etching the copper oxide layer of dry rectifier disks of the copper oxide type
Mazarbhuiya et al. Parametric Optimization in Photochemical Machining of Aluminium Using Taguchi Method
JPS56105660A (en) Semiconductor device
GB2023857A (en) Photoresist structure, particularly suitable for photolithographically depositing parallel metal strips on to a base substrate, and the method for forming it
DE4226200C1 (en) Forming air bridges to cross conductor paths on semiconductor integrated circuit - covering conducting path to be bridged with photo-resist layers, creating air gap in second layer using etching process and adding top conductive layer
JPS5782485A (en) Formation of electrode
JPH0613521A (en) Semiconductor device
JPS5630738A (en) Manufacture of semiconductor device
Harmsen The Surface Treatment of Support Metals for Electrical Contacts
GB1193715A (en) Improvements in and relating to Methods of manufacturing Semiconductor Devices
DE1614583C3 (en) Method for producing a contact metal layer for a semiconductor arrangement provided with at least one pn junction
JPS6445039A (en) Manufacture of electron tube cathode device

Legal Events

Date Code Title Description
ST Notification of lapse