FR2374439A1 - Procede et appareil de polissage electrochimique - Google Patents
Procede et appareil de polissage electrochimiqueInfo
- Publication number
- FR2374439A1 FR2374439A1 FR7737722A FR7737722A FR2374439A1 FR 2374439 A1 FR2374439 A1 FR 2374439A1 FR 7737722 A FR7737722 A FR 7737722A FR 7737722 A FR7737722 A FR 7737722A FR 2374439 A1 FR2374439 A1 FR 2374439A1
- Authority
- FR
- France
- Prior art keywords
- electrochemical polishing
- polishing method
- pulses
- electrochemical
- microseconds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
- B23H3/00—Electrochemical machining, i.e. removing metal by passing current between an electrode and a workpiece in the presence of an electrolyte
- B23H3/02—Electric circuits specially adapted therefor, e.g. power supply, control, preventing short circuits
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
- B23H5/00—Combined machining
- B23H5/06—Electrochemical machining combined with mechanical working, e.g. grinding or honing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M3/00—Conversion of dc power input into dc power output
- H02M3/02—Conversion of dc power input into dc power output without intermediate conversion into ac
- H02M3/04—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters
- H02M3/10—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
- H02M3/145—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal
- H02M3/155—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only
- H02M3/156—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only with automatic control of output voltage or current, e.g. switching regulators
- H02M3/158—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only with automatic control of output voltage or current, e.g. switching regulators including plural semiconductor devices as final control devices for a single load
- H02M3/1584—Conversion of dc power input into dc power output without intermediate conversion into ac by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only with automatic control of output voltage or current, e.g. switching regulators including plural semiconductor devices as final control devices for a single load with a plurality of power processing stages connected in parallel
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
- B23H2300/00—Power source circuits or energization
- B23H2300/10—Pulsed electrochemical machining
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S204/00—Chemistry: electrical and wave energy
- Y10S204/09—Wave forms
Abstract
Procédé et appareil de polissage électrochimique dans lequel on applique un courant électrique sous forme d'impulsions entre une pièce à polir et une électrode-outil juxtaposée à la pièce en présence d'un électrolyte. Les impulsions ont une durée non supérieure à 100 microsecondes.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15005176A JPS5373437A (en) | 1976-12-14 | 1976-12-14 | Power source device for electrolysis |
JP6912977A JPS544253A (en) | 1977-06-10 | 1977-06-10 | Electrolytic apparatus |
JP11372377A JPS5921400B2 (ja) | 1977-09-21 | 1977-09-21 | 電解超音波複合表面処理装置の電源装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2374439A1 true FR2374439A1 (fr) | 1978-07-13 |
FR2374439B1 FR2374439B1 (fr) | 1984-07-20 |
Family
ID=27299962
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7737722A Granted FR2374439A1 (fr) | 1976-12-14 | 1977-12-14 | Procede et appareil de polissage electrochimique |
Country Status (5)
Country | Link |
---|---|
US (1) | US4125444A (fr) |
DE (1) | DE2755792C2 (fr) |
FR (1) | FR2374439A1 (fr) |
GB (1) | GB1539309A (fr) |
IT (1) | IT1116389B (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1983001216A1 (fr) * | 1981-10-05 | 1983-04-14 | Lach, Horst | Procede et dispositif pour l'usinage de materiaux non conducteurs lies a un metal |
Families Citing this family (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU841889A1 (ru) * | 1978-05-03 | 1981-06-30 | Ордена Трудового Красного Знамениэкспериментальный Научно-Исследо-Вательский Институт Металлорежу-Щих Ctahkob | Способ обработки токопровод щимАбРАзиВНыМ иНСТРуМЕНТОМ и уСТРОйСТВОК шлифОВАльНОМу СТАНКу дл ЕгООСущЕСТВлЕНи |
DE2950998A1 (de) * | 1980-01-09 | 1981-06-25 | Eksperimental'nyj naučno-issledovatel'skij institut metallorežuščich stankov, Moskva | Elektrochemisches bearbeitungsverfahren fuer werkstuecke und einrichtung zu dessen verwirklichung |
FI802444A (fi) * | 1980-08-05 | 1982-02-06 | Outokumpu Oy | Apparat foer elektrolytisk polering |
JPS603934B2 (ja) * | 1981-03-17 | 1985-01-31 | 株式会社ソデイツク | 放電加工方法及び装置 |
DE3210315A1 (de) * | 1982-03-20 | 1983-09-22 | Fried. Krupp Gmbh, 4300 Essen | Verfahren und vorrichtung zur elektrolytischen glaenzbehandlung von legierungen |
US4485286A (en) * | 1982-04-12 | 1984-11-27 | Inoue-Japax Research Incorporated | Multi-vibrator head EDM method and apparatus |
DE3419943C2 (de) * | 1984-05-11 | 1986-04-24 | Aktiengesellschaft für industrielle Elektronik AGIE Losone bei Locarno, Losone, Locarno | Verfahren zur Erzeugung einer elektroerosiven Entladespannung und Drahtschneidmaschine zur Durchführung des Verfahrens |
US4806216A (en) * | 1988-01-21 | 1989-02-21 | The United States Of America As Represented By The United States Department Of Energy | Electrochemical polishing of notches |
JPH02303724A (ja) * | 1989-05-19 | 1990-12-17 | Akio Nakano | 超音波加工方法 |
US5085747A (en) * | 1989-05-19 | 1992-02-04 | Akio Nikano | Ultrasonic machining method |
DE4040590C1 (fr) * | 1990-12-19 | 1992-04-23 | Fritz-Herbert 8940 Memmingen De Frembgen | |
US5660708A (en) * | 1994-11-21 | 1997-08-26 | Sumitomo Metal Mining Company, Limited | Process for manufacturing a lead frame |
EP1052062A1 (fr) | 1999-05-03 | 2000-11-15 | Applied Materials, Inc. | Préconditionnement d'un article abrasif fixé |
US6991528B2 (en) | 2000-02-17 | 2006-01-31 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
US7303462B2 (en) | 2000-02-17 | 2007-12-04 | Applied Materials, Inc. | Edge bead removal by an electro polishing process |
US7670468B2 (en) | 2000-02-17 | 2010-03-02 | Applied Materials, Inc. | Contact assembly and method for electrochemical mechanical processing |
US7374644B2 (en) | 2000-02-17 | 2008-05-20 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
US20030213703A1 (en) * | 2002-05-16 | 2003-11-20 | Applied Materials, Inc. | Method and apparatus for substrate polishing |
US7678245B2 (en) | 2000-02-17 | 2010-03-16 | Applied Materials, Inc. | Method and apparatus for electrochemical mechanical processing |
US6537144B1 (en) | 2000-02-17 | 2003-03-25 | Applied Materials, Inc. | Method and apparatus for enhanced CMP using metals having reductive properties |
US7059948B2 (en) | 2000-12-22 | 2006-06-13 | Applied Materials | Articles for polishing semiconductor substrates |
US7125477B2 (en) | 2000-02-17 | 2006-10-24 | Applied Materials, Inc. | Contacts for electrochemical processing |
US6979248B2 (en) | 2002-05-07 | 2005-12-27 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
US6991526B2 (en) * | 2002-09-16 | 2006-01-31 | Applied Materials, Inc. | Control of removal profile in electrochemically assisted CMP |
US7029365B2 (en) | 2000-02-17 | 2006-04-18 | Applied Materials Inc. | Pad assembly for electrochemical mechanical processing |
US20040182721A1 (en) * | 2003-03-18 | 2004-09-23 | Applied Materials, Inc. | Process control in electro-chemical mechanical polishing |
US7077721B2 (en) | 2000-02-17 | 2006-07-18 | Applied Materials, Inc. | Pad assembly for electrochemical mechanical processing |
US6962524B2 (en) | 2000-02-17 | 2005-11-08 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
US6848970B2 (en) * | 2002-09-16 | 2005-02-01 | Applied Materials, Inc. | Process control in electrochemically assisted planarization |
US7066800B2 (en) | 2000-02-17 | 2006-06-27 | Applied Materials Inc. | Conductive polishing article for electrochemical mechanical polishing |
US7303662B2 (en) | 2000-02-17 | 2007-12-04 | Applied Materials, Inc. | Contacts for electrochemical processing |
US6558231B1 (en) * | 2000-10-17 | 2003-05-06 | Faraday Technology Marketing Goup, Llc | Sequential electromachining and electropolishing of metals and the like using modulated electric fields |
US6896776B2 (en) | 2000-12-18 | 2005-05-24 | Applied Materials Inc. | Method and apparatus for electro-chemical processing |
US7137879B2 (en) | 2001-04-24 | 2006-11-21 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
US7344432B2 (en) | 2001-04-24 | 2008-03-18 | Applied Materials, Inc. | Conductive pad with ion exchange membrane for electrochemical mechanical polishing |
US6951599B2 (en) * | 2002-01-22 | 2005-10-04 | Applied Materials, Inc. | Electropolishing of metallic interconnects |
US6837983B2 (en) * | 2002-01-22 | 2005-01-04 | Applied Materials, Inc. | Endpoint detection for electro chemical mechanical polishing and electropolishing processes |
US7175752B2 (en) * | 2002-05-24 | 2007-02-13 | Federal-Mogul Worldwide, Inc. | Method and apparatus for electrochemical machining |
US7022216B2 (en) * | 2002-06-12 | 2006-04-04 | Faraday Technology Marketing Group, Llc | Electrolytic etching of metal layers |
US20050061674A1 (en) | 2002-09-16 | 2005-03-24 | Yan Wang | Endpoint compensation in electroprocessing |
US7112270B2 (en) * | 2002-09-16 | 2006-09-26 | Applied Materials, Inc. | Algorithm for real-time process control of electro-polishing |
US7842169B2 (en) * | 2003-03-04 | 2010-11-30 | Applied Materials, Inc. | Method and apparatus for local polishing control |
US7186164B2 (en) | 2003-12-03 | 2007-03-06 | Applied Materials, Inc. | Processing pad assembly with zone control |
US20060207888A1 (en) * | 2003-12-29 | 2006-09-21 | Taylor E J | Electrochemical etching of circuitry for high density interconnect electronic modules |
US20050145506A1 (en) * | 2003-12-29 | 2005-07-07 | Taylor E. J. | Electrochemical etching of circuitry for high density interconnect electronic modules |
US7390744B2 (en) | 2004-01-29 | 2008-06-24 | Applied Materials, Inc. | Method and composition for polishing a substrate |
WO2006080948A2 (fr) * | 2004-06-16 | 2006-08-03 | Harrison, Sterling, T. | Resistance a la corrosion de recipients de stockage pour dechets nucleaires |
US7084064B2 (en) | 2004-09-14 | 2006-08-01 | Applied Materials, Inc. | Full sequence metal and barrier layer electrochemical mechanical processing |
US7520968B2 (en) | 2004-10-05 | 2009-04-21 | Applied Materials, Inc. | Conductive pad design modification for better wafer-pad contact |
US7655565B2 (en) * | 2005-01-26 | 2010-02-02 | Applied Materials, Inc. | Electroprocessing profile control |
US7427340B2 (en) | 2005-04-08 | 2008-09-23 | Applied Materials, Inc. | Conductive pad |
US7422982B2 (en) * | 2006-07-07 | 2008-09-09 | Applied Materials, Inc. | Method and apparatus for electroprocessing a substrate with edge profile control |
RU2465991C2 (ru) * | 2011-01-17 | 2012-11-10 | Общество С Ограниченной Ответственностью "Есм" | Способ электрохимической обработки |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1134394A (fr) * | 1955-05-18 | 1957-04-10 | Centre Nat Rech Scient | Perfectionnements aux procédés de traitements électrolytiques ou chimiques |
FR1187532A (fr) * | 1956-12-08 | 1959-09-11 | Aluminium Walzwerke Singen | Procédé de gravure électrolytique de surfaces d'aluminium |
DE1144562B (de) * | 1961-09-21 | 1963-02-28 | Aluminium Walzwerke Singen | Verfahren zum elektrolytischen AEtzen von Aluminiumoberflaechen |
FR1360811A (fr) * | 1963-04-03 | 1964-05-15 | Microdécapeur | |
US3294666A (en) * | 1963-07-02 | 1966-12-27 | Kentron Corp | Electrolytic treating apparatus including a pulsating d. c. power source |
FR1508665A (fr) * | 1951-01-28 | 1968-01-05 | Procédé d'agrandissement de la surface efficace d'électrodes ou de feuilles d'aluminium pour des condensateurs électrolytiques | |
US3689388A (en) * | 1970-06-03 | 1972-09-05 | Siemens Ag | Electrolytic polishing of niobium parts |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3297555A (en) * | 1964-07-24 | 1967-01-10 | Kawecki Chemical Company | Etching of tantalum and columbium foils |
CA929891A (en) * | 1968-08-07 | 1973-07-10 | Inoue Kiyoshi | Adaptive ion-control system for electrochemical machining |
US3649488A (en) * | 1969-11-07 | 1972-03-14 | Bell Telephone Labor Inc | Electrochemical etching technique for charting and curing defects in thin film capacitors |
GB1338392A (en) * | 1970-03-05 | 1973-11-21 | Plessey Co Ltd | Manufacture of electrode foil for electrolytic capacitors |
US3798141A (en) * | 1972-10-19 | 1974-03-19 | Bell Telephone Labor Inc | Technique for electroetching thin film metallization |
CH629542A5 (de) * | 1976-09-01 | 1982-04-30 | Inoue Japax Res | Verfahren und vorrichtung zur galvanischen materialablagerung. |
-
1977
- 1977-12-12 GB GB51558/77A patent/GB1539309A/en not_active Expired
- 1977-12-13 US US05/860,243 patent/US4125444A/en not_active Expired - Lifetime
- 1977-12-13 IT IT52181/77A patent/IT1116389B/it active
- 1977-12-14 DE DE2755792A patent/DE2755792C2/de not_active Expired
- 1977-12-14 FR FR7737722A patent/FR2374439A1/fr active Granted
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1508665A (fr) * | 1951-01-28 | 1968-01-05 | Procédé d'agrandissement de la surface efficace d'électrodes ou de feuilles d'aluminium pour des condensateurs électrolytiques | |
FR1134394A (fr) * | 1955-05-18 | 1957-04-10 | Centre Nat Rech Scient | Perfectionnements aux procédés de traitements électrolytiques ou chimiques |
FR1187532A (fr) * | 1956-12-08 | 1959-09-11 | Aluminium Walzwerke Singen | Procédé de gravure électrolytique de surfaces d'aluminium |
DE1144562B (de) * | 1961-09-21 | 1963-02-28 | Aluminium Walzwerke Singen | Verfahren zum elektrolytischen AEtzen von Aluminiumoberflaechen |
FR1360811A (fr) * | 1963-04-03 | 1964-05-15 | Microdécapeur | |
US3294666A (en) * | 1963-07-02 | 1966-12-27 | Kentron Corp | Electrolytic treating apparatus including a pulsating d. c. power source |
US3689388A (en) * | 1970-06-03 | 1972-09-05 | Siemens Ag | Electrolytic polishing of niobium parts |
Non-Patent Citations (1)
Title |
---|
EXBK/69 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1983001216A1 (fr) * | 1981-10-05 | 1983-04-14 | Lach, Horst | Procede et dispositif pour l'usinage de materiaux non conducteurs lies a un metal |
EP0076997A1 (fr) * | 1981-10-05 | 1983-04-20 | LACH-SPEZIAL-Werkzeuge GmbH | Procédé et dispositif pour l'usinage de matière non-conductrice liée à du métal |
US4641007A (en) * | 1981-10-05 | 1987-02-03 | Horst Lach | Process and device for treatment of metal-bonded nonconductive materials |
Also Published As
Publication number | Publication date |
---|---|
FR2374439B1 (fr) | 1984-07-20 |
US4125444A (en) | 1978-11-14 |
DE2755792A1 (de) | 1978-06-29 |
DE2755792C2 (de) | 1983-03-10 |
IT1116389B (it) | 1986-02-10 |
GB1539309A (en) | 1979-01-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |