FR2337892A1 - Procede de fabrication de produits a relief de configuration predeterminee - Google Patents

Procede de fabrication de produits a relief de configuration predeterminee

Info

Publication number
FR2337892A1
FR2337892A1 FR7600543A FR7600543A FR2337892A1 FR 2337892 A1 FR2337892 A1 FR 2337892A1 FR 7600543 A FR7600543 A FR 7600543A FR 7600543 A FR7600543 A FR 7600543A FR 2337892 A1 FR2337892 A1 FR 2337892A1
Authority
FR
France
Prior art keywords
metal
radiation
electromagnetic
intermediate layer
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7600543A
Other languages
English (en)
French (fr)
Other versions
FR2337892B1 (cg-RX-API-DMAC10.html
Inventor
Maxim Timofeevich Kostyshin
Petr Fedorovich Romanenko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INST POLUPROVODNIKOV
Original Assignee
INST POLUPROVODNIKOV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INST POLUPROVODNIKOV filed Critical INST POLUPROVODNIKOV
Priority to FR7600543A priority Critical patent/FR2337892A1/fr
Publication of FR2337892A1 publication Critical patent/FR2337892A1/fr
Application granted granted Critical
Publication of FR2337892B1 publication Critical patent/FR2337892B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0044—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists involving an interaction between the metallic and non-metallic component, e.g. photodope systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Holo Graphy (AREA)
FR7600543A 1976-01-12 1976-01-12 Procede de fabrication de produits a relief de configuration predeterminee Granted FR2337892A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7600543A FR2337892A1 (fr) 1976-01-12 1976-01-12 Procede de fabrication de produits a relief de configuration predeterminee

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7600543A FR2337892A1 (fr) 1976-01-12 1976-01-12 Procede de fabrication de produits a relief de configuration predeterminee

Publications (2)

Publication Number Publication Date
FR2337892A1 true FR2337892A1 (fr) 1977-08-05
FR2337892B1 FR2337892B1 (cg-RX-API-DMAC10.html) 1979-07-06

Family

ID=9167785

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7600543A Granted FR2337892A1 (fr) 1976-01-12 1976-01-12 Procede de fabrication de produits a relief de configuration predeterminee

Country Status (1)

Country Link
FR (1) FR2337892A1 (cg-RX-API-DMAC10.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2460205A1 (fr) * 1979-07-03 1981-01-23 Inst Elektrodinamiki Akademii Materiau sensible aux radiations et procede d'enregistrement d'information sur le materiau sensible aux radiations
WO1997042548A1 (de) * 1996-05-08 1997-11-13 Studiengesellschaft Kohle Mbh Lithographisches verfahren zur erzeugung von nanostrukturen auf oberflächen

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2152688A1 (cg-RX-API-DMAC10.html) * 1971-09-07 1973-04-27 Energy Conversion Devices Inc
DE2355446A1 (de) * 1972-11-06 1974-05-16 Canon Kk Aufzeichnungsmedium

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2152688A1 (cg-RX-API-DMAC10.html) * 1971-09-07 1973-04-27 Energy Conversion Devices Inc
DE2355446A1 (de) * 1972-11-06 1974-05-16 Canon Kk Aufzeichnungsmedium

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2460205A1 (fr) * 1979-07-03 1981-01-23 Inst Elektrodinamiki Akademii Materiau sensible aux radiations et procede d'enregistrement d'information sur le materiau sensible aux radiations
WO1997042548A1 (de) * 1996-05-08 1997-11-13 Studiengesellschaft Kohle Mbh Lithographisches verfahren zur erzeugung von nanostrukturen auf oberflächen
US6309798B1 (en) 1996-05-08 2001-10-30 Studiengesellschaft Kohle Mbh Lithographical process for production of nanostructures on surfaces

Also Published As

Publication number Publication date
FR2337892B1 (cg-RX-API-DMAC10.html) 1979-07-06

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Legal Events

Date Code Title Description
ST Notification of lapse