FR2337892B1 - - Google Patents
Info
- Publication number
- FR2337892B1 FR2337892B1 FR7600543A FR7600543A FR2337892B1 FR 2337892 B1 FR2337892 B1 FR 2337892B1 FR 7600543 A FR7600543 A FR 7600543A FR 7600543 A FR7600543 A FR 7600543A FR 2337892 B1 FR2337892 B1 FR 2337892B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0044—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists involving an interaction between the metallic and non-metallic component, e.g. photodope systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Holo Graphy (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7600543A FR2337892A1 (fr) | 1976-01-12 | 1976-01-12 | Procede de fabrication de produits a relief de configuration predeterminee |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7600543A FR2337892A1 (fr) | 1976-01-12 | 1976-01-12 | Procede de fabrication de produits a relief de configuration predeterminee |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2337892A1 FR2337892A1 (fr) | 1977-08-05 |
| FR2337892B1 true FR2337892B1 (cg-RX-API-DMAC10.html) | 1979-07-06 |
Family
ID=9167785
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7600543A Granted FR2337892A1 (fr) | 1976-01-12 | 1976-01-12 | Procede de fabrication de produits a relief de configuration predeterminee |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2337892A1 (cg-RX-API-DMAC10.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2460205A1 (fr) * | 1979-07-03 | 1981-01-23 | Inst Elektrodinamiki Akademii | Materiau sensible aux radiations et procede d'enregistrement d'information sur le materiau sensible aux radiations |
| DE19618447A1 (de) | 1996-05-08 | 1997-11-20 | Studiengesellschaft Kohle Mbh | Lithographisches Verfahren zur Erzeugung von Nanostrukturen auf Oberflächen |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL7211808A (cg-RX-API-DMAC10.html) * | 1971-09-07 | 1973-03-09 |
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1976
- 1976-01-12 FR FR7600543A patent/FR2337892A1/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| FR2337892A1 (fr) | 1977-08-05 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |