FR2320584B1 - - Google Patents

Info

Publication number
FR2320584B1
FR2320584B1 FR7622726A FR7622726A FR2320584B1 FR 2320584 B1 FR2320584 B1 FR 2320584B1 FR 7622726 A FR7622726 A FR 7622726A FR 7622726 A FR7622726 A FR 7622726A FR 2320584 B1 FR2320584 B1 FR 2320584B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7622726A
Other languages
French (fr)
Other versions
FR2320584A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of FR2320584A1 publication Critical patent/FR2320584A1/fr
Application granted granted Critical
Publication of FR2320584B1 publication Critical patent/FR2320584B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2022Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02109Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02118Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR7622726A 1975-08-04 1976-07-26 Procede pour la realisation, sur un support, de structures a couches de vernis photosensibles positives Granted FR2320584A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2534795A DE2534795C3 (de) 1975-08-04 1975-08-04 Verfahren zur Herstellung von Strukturen aus Positiv-Fotolackschichten

Publications (2)

Publication Number Publication Date
FR2320584A1 FR2320584A1 (fr) 1977-03-04
FR2320584B1 true FR2320584B1 (ja) 1979-09-28

Family

ID=5953192

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7622726A Granted FR2320584A1 (fr) 1975-08-04 1976-07-26 Procede pour la realisation, sur un support, de structures a couches de vernis photosensibles positives

Country Status (7)

Country Link
JP (1) JPS5219531A (ja)
BE (1) BE844743A (ja)
DE (1) DE2534795C3 (ja)
FR (1) FR2320584A1 (ja)
GB (1) GB1548017A (ja)
IT (1) IT1067163B (ja)
NL (1) NL7608635A (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5329135B2 (ja) * 1973-12-12 1978-08-18
AU544060B2 (en) * 1980-07-28 1985-05-16 Polychrome Corp. Accelerated diazo sensitised
DE3216268A1 (de) * 1982-04-30 1983-11-03 Siemens AG, 1000 Berlin und 8000 München Verfahren zur verminderung von linienbreitenschwankungen bei der herstellung von aus fotolackschichten bestehenden strukturen auf fuer integrierte halbleiterschaltungen vorgesehenen substraten durch optische projektionsbelichtung
DE3310962A1 (de) * 1983-03-25 1984-09-27 Siemens AG, 1000 Berlin und 8000 München Verfahren zur reduzierung von linienbreitenschwankungen bei der herstellung von fotolackstrukturen
JPS6155649A (ja) * 1984-08-27 1986-03-20 Nippon Telegr & Teleph Corp <Ntt> パタン形成法
CA1285418C (en) * 1985-07-18 1991-07-02 Robert A. Owens Pre-exposure method for increased sensitivity in high contrast resist development
FR2618230A1 (fr) * 1987-07-17 1989-01-20 Thomson Semiconducteurs Procede de photolithographie.
KR930008139B1 (en) * 1990-08-30 1993-08-26 Samsung Electronics Co Ltd Method for preparation of pattern
KR950008384B1 (ko) * 1992-12-10 1995-07-28 삼성전자주식회사 패턴의 형성방법

Also Published As

Publication number Publication date
DE2534795A1 (de) 1977-02-10
IT1067163B (it) 1985-03-12
GB1548017A (en) 1979-07-04
BE844743A (fr) 1976-11-16
FR2320584A1 (fr) 1977-03-04
DE2534795C3 (de) 1978-05-24
NL7608635A (nl) 1977-02-08
JPS5219531A (en) 1977-02-14
DE2534795B2 (de) 1977-09-29

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Legal Events

Date Code Title Description
ST Notification of lapse