FR2315110B1 - - Google Patents

Info

Publication number
FR2315110B1
FR2315110B1 FR7613143A FR7613143A FR2315110B1 FR 2315110 B1 FR2315110 B1 FR 2315110B1 FR 7613143 A FR7613143 A FR 7613143A FR 7613143 A FR7613143 A FR 7613143A FR 2315110 B1 FR2315110 B1 FR 2315110B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7613143A
Other languages
French (fr)
Other versions
FR2315110A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Napp Systems Inc
Napp Systems USA Inc
Original Assignee
Napp Systems Inc
Napp Systems USA Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Napp Systems Inc, Napp Systems USA Inc filed Critical Napp Systems Inc
Publication of FR2315110A1 publication Critical patent/FR2315110A1/fr
Application granted granted Critical
Publication of FR2315110B1 publication Critical patent/FR2315110B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Insulating Films (AREA)
FR7613143A 1975-06-19 1976-05-03 Matiere composite photosensible pour cliches d'impression Granted FR2315110A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US58833475A 1975-06-19 1975-06-19

Publications (2)

Publication Number Publication Date
FR2315110A1 FR2315110A1 (fr) 1977-01-14
FR2315110B1 true FR2315110B1 (ko) 1981-11-13

Family

ID=24353419

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7613143A Granted FR2315110A1 (fr) 1975-06-19 1976-05-03 Matiere composite photosensible pour cliches d'impression

Country Status (12)

Country Link
JP (1) JPS5936731B2 (ko)
BE (1) BE841797A (ko)
CA (1) CA1091969A (ko)
CH (1) CH633893A5 (ko)
DE (1) DE2626066A1 (ko)
DK (1) DK232276A (ko)
FR (1) FR2315110A1 (ko)
GB (1) GB1548764A (ko)
IT (1) IT1061234B (ko)
NL (1) NL7604774A (ko)
NO (1) NO762006L (ko)
SE (1) SE422847B (ko)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154627A (en) * 1976-06-18 1977-12-22 Fuji Photo Film Co Ltd Silver halide light sensitive material
JPS52154626A (en) * 1976-06-18 1977-12-22 Fuji Photo Film Co Ltd Silver halide light sensitive material
JPS5518621A (en) * 1978-07-26 1980-02-08 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate
DE2834059A1 (de) * 1978-08-03 1980-02-14 Hoechst Ag Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
JPS5823026A (ja) * 1981-08-04 1983-02-10 Nippon Paint Co Ltd 水現像性平版印刷版材
JPS58174939A (ja) * 1982-03-18 1983-10-14 Konishiroku Photo Ind Co Ltd 画像形成材料
US4668604A (en) * 1982-04-22 1987-05-26 E.I. Du Pont De Nemours And Company Positive-working photosensitive elements containing crosslinked beads and process of use
US4601970A (en) * 1982-04-22 1986-07-22 E. I. Du Pont De Nemours And Company Dry photosensitive film containing crosslinked beads
US4551415A (en) * 1982-04-22 1985-11-05 E. I. Du Pont De Nemours And Company Photosensitive coatings containing crosslinked beads
DE3328019A1 (de) * 1982-09-21 1984-03-22 Polychrome Corp., 10702 Yonkers, N.Y. Mit wasser entwickelbare druckplatte
GB2273366B (en) * 1992-11-18 1996-03-27 Du Pont Forming images on radiation-sensitive plates
US5688627A (en) * 1996-07-02 1997-11-18 Precision Lithograining Corp. Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3382069A (en) * 1964-06-18 1968-05-07 Azoplate Corp Planographic printing plate
GB1469941A (en) * 1973-04-10 1977-04-06 Andrews Paper & Chem Co Inc Diazotype reproduction layer

Also Published As

Publication number Publication date
FR2315110A1 (fr) 1977-01-14
NO762006L (ko) 1976-12-21
GB1548764A (en) 1979-07-18
SE422847B (sv) 1982-03-29
JPS5936731B2 (ja) 1984-09-05
DK232276A (da) 1976-12-20
CH633893A5 (en) 1982-12-31
BE841797A (fr) 1976-09-01
NL7604774A (nl) 1976-12-21
JPS522520A (en) 1977-01-10
SE7605083L (sv) 1976-12-20
IT1061234B (it) 1983-02-28
DE2626066A1 (de) 1977-01-20
CA1091969A (en) 1980-12-23

Similar Documents

Publication Publication Date Title
FR2315110B1 (ko)
JPS579453B2 (ko)
JPS5197433U (ko)
JPS5435090Y2 (ko)
JPS5519764Y2 (ko)
JPS5527824Y2 (ko)
JPS5275137U (ko)
JPS5350553Y2 (ko)
JPS5614552Y2 (ko)
JPS5322869Y2 (ko)
JPS51157775U (ko)
JPS5232698U (ko)
JPS51103109U (ko)
JPS5255844U (ko)
JPS5195563A (ko)
JPS5235206U (ko)
JPS5284412U (ko)
BG22542A1 (ko)
CH598038A5 (ko)
BG22335A1 (ko)
BG22431A1 (ko)
BG22483A1 (ko)
BG22493A1 (ko)
BG22273A1 (ko)
CH587505A5 (ko)

Legal Events

Date Code Title Description
ST Notification of lapse