FR2273372B1 - - Google Patents

Info

Publication number
FR2273372B1
FR2273372B1 FR7513749A FR7513749A FR2273372B1 FR 2273372 B1 FR2273372 B1 FR 2273372B1 FR 7513749 A FR7513749 A FR 7513749A FR 7513749 A FR7513749 A FR 7513749A FR 2273372 B1 FR2273372 B1 FR 2273372B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7513749A
Other languages
French (fr)
Other versions
FR2273372A1 (pt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2273372A1 publication Critical patent/FR2273372A1/fr
Application granted granted Critical
Publication of FR2273372B1 publication Critical patent/FR2273372B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
FR7513749A 1974-05-31 1975-04-24 Expired FR2273372B1 (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US475005A US3889632A (en) 1974-05-31 1974-05-31 Variable incidence drive for deposition tooling

Publications (2)

Publication Number Publication Date
FR2273372A1 FR2273372A1 (pt) 1975-12-26
FR2273372B1 true FR2273372B1 (pt) 1977-04-15

Family

ID=23885855

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7513749A Expired FR2273372B1 (pt) 1974-05-31 1975-04-24

Country Status (5)

Country Link
US (1) US3889632A (pt)
JP (1) JPS50159447A (pt)
DE (1) DE2513604A1 (pt)
FR (1) FR2273372B1 (pt)
GB (1) GB1452720A (pt)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3986478A (en) * 1975-05-15 1976-10-19 Motorola, Inc. Vapor deposition apparatus including orbital substrate holder
US4022939A (en) * 1975-12-18 1977-05-10 Western Electric Company, Inc. Synchronous shielding in vacuum deposition system
US3983838A (en) * 1975-12-31 1976-10-05 International Business Machines Corporation Planetary evaporator
US4108107A (en) * 1976-04-01 1978-08-22 Airco, Inc. Rotatable substrate holder for use in vacuum
US4237662A (en) * 1978-04-04 1980-12-09 The United States Of America As Represented By The Administrator Of The National Aeronautics & Space Administration Structural members, method and apparatus
US4269137A (en) * 1979-03-19 1981-05-26 Xerox Corporation Pretreatment of substrates prior to thin film deposition
US4310614A (en) * 1979-03-19 1982-01-12 Xerox Corporation Method and apparatus for pretreating and depositing thin films on substrates
DE2944180A1 (de) * 1979-11-02 1981-05-07 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum herstellen einer einen halbleiterkoerper einseitig bedeckenden isolierschicht
US4596719A (en) * 1981-02-24 1986-06-24 Wedtech Corp. Multilayer coating method and apparatus
US4537794A (en) * 1981-02-24 1985-08-27 Wedtech Corp. Method of coating ceramics
US4609564C2 (en) * 1981-02-24 2001-10-09 Masco Vt Inc Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase
US4351855A (en) * 1981-02-24 1982-09-28 Eduard Pinkhasov Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum
GB2139248A (en) * 1983-05-04 1984-11-07 Gen Electric Co Plc Copper alloy solderable contact pad produced by vapour deposition
US4583488A (en) * 1984-03-23 1986-04-22 International Business Machines Corporation Variable axis rotary drive vacuum deposition system
IL74360A (en) * 1984-05-25 1989-01-31 Wedtech Corp Method of coating ceramics and quartz crucibles with material electrically transformed into a vapor phase
JPS61227165A (ja) * 1985-03-29 1986-10-09 Mitsubishi Electric Corp 蒸着装置
US4798165A (en) * 1985-10-07 1989-01-17 Epsilon Apparatus for chemical vapor deposition using an axially symmetric gas flow
US4816133A (en) * 1987-05-14 1989-03-28 Northrop Corporation Apparatus for preparing thin film optical coatings on substrates
DE3803411A1 (de) * 1988-02-05 1989-08-17 Leybold Ag Vorrichtung zur halterung von werkstuecken
JPH02305438A (ja) * 1989-05-19 1990-12-19 Mitsubishi Electric Corp 真空蒸着装置
US4937206A (en) * 1989-07-10 1990-06-26 Applied Materials, Inc. Method and apparatus for preventing cross contamination of species during the processing of semiconductor wafers
US5370739A (en) * 1992-06-15 1994-12-06 Materials Research Corporation Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD
DE29505497U1 (de) * 1995-03-31 1995-06-08 Balzers Hochvakuum GmbH, 65205 Wiesbaden Beschichtungsstation
JPH08296042A (ja) * 1995-04-17 1996-11-12 Read Rite Corp 複数イオンビームによる絶縁薄膜の形成方法
DE19701419A1 (de) * 1997-01-17 1998-07-23 Geesthacht Gkss Forschung Substrathaltereinrichtung
US6082296A (en) * 1999-09-22 2000-07-04 Xerox Corporation Thin film deposition chamber
KR100797435B1 (ko) * 2000-06-30 2008-01-24 동경 엘렉트론 주식회사 액처리장치
US6595031B2 (en) * 2000-12-19 2003-07-22 Larry Stephen Wilson Retaining device for personal vehicle with handlebars
KR20050072946A (ko) * 2004-01-08 2005-07-13 삼성전자주식회사 고균일 증착용 장치
TWI280986B (en) * 2004-04-30 2007-05-11 Hon Hai Prec Ind Co Ltd Vacuum vapor deposition apparatus
DE102005035904B4 (de) * 2005-07-28 2012-01-12 Leybold Optics Gmbh Vorrichtung zum Behandeln von Substraten
CN101876058B (zh) * 2010-03-23 2012-07-11 东莞宏威数码机械有限公司 真空蒸镀装置
US9230846B2 (en) * 2010-06-07 2016-01-05 Veeco Instruments, Inc. Multi-wafer rotating disc reactor with inertial planetary drive
TW201200614A (en) * 2010-06-29 2012-01-01 Hon Hai Prec Ind Co Ltd Coating device
TW201213587A (en) * 2010-09-21 2012-04-01 Hon Hai Prec Ind Co Ltd Conveying mechanism and deposition device with same
CN104084351B (zh) * 2014-07-04 2017-05-24 长兴宏能电热膜元件厂 便于电热管喷膜的回转机构
JP2018163878A (ja) * 2017-03-27 2018-10-18 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
FR3103314B1 (fr) * 2019-11-14 2021-10-08 Safran Electronics & Defense Porte substrat inclinable et orientable et systeme de depot multicouche sous vide le comprenant

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1003441A (en) * 1910-11-04 1911-09-19 Levi F Eaton Blackleading-machine.
US2369155A (en) * 1941-12-22 1945-02-13 Marinsky Davis Method of conditioning wound strand bodies
US2804976A (en) * 1954-02-03 1957-09-03 Kaiser Aluminium Chem Corp Method and apparatus for treating material
US2824029A (en) * 1956-03-16 1958-02-18 Magnus Chemical Company Inc Method and apparatus for washing machine parts
US3046157A (en) * 1958-05-07 1962-07-24 Philips Corp Method for coating the inner wall of a tube intended for electric discharge lamps with a uniform liquid layer as well as an arrangement for the application of the method
US3131917A (en) * 1958-09-09 1964-05-05 Gessner Siegfried Device for adjusting the spatial position of articles to be treated in a treatment chamber
US2997979A (en) * 1958-09-15 1961-08-29 Tassara Luigi Apparatus for applying metallic film to electrical components and the like
US3236205A (en) * 1961-04-24 1966-02-22 Baird Atomic Inc High temperature furnace
US3297475A (en) * 1963-05-27 1967-01-10 New York Air Brake Co Coating method and apparatus employing rotating workholder
US3673984A (en) * 1970-08-28 1972-07-04 Dart Ind Inc Dip coating machine
US3752691A (en) * 1971-06-29 1973-08-14 Xerox Corp Method of vacuum evaporation

Also Published As

Publication number Publication date
JPS50159447A (pt) 1975-12-24
FR2273372A1 (pt) 1975-12-26
US3889632A (en) 1975-06-17
GB1452720A (en) 1976-10-13
DE2513604A1 (de) 1975-12-11

Similar Documents

Publication Publication Date Title
FR2290282B1 (pt)
FR2310250B2 (pt)
FR2270718A1 (pt)
FR2291072B1 (pt)
FR2281871B1 (pt)
FR2288812B1 (pt)
FR2284934B1 (pt)
FR2288067B1 (pt)
FR2282433B1 (pt)
AU495930B2 (pt)
FR2288498B1 (pt)
IN141115B (pt)
CH569666A5 (pt)
CH41675A4 (pt)
BG22709A1 (pt)
CH563933A5 (pt)
BG22624A1 (pt)
CH566410A5 (pt)
CH566915A5 (pt)
CH568134A5 (pt)
CH568539A5 (pt)
BG22586A1 (pt)
CH569220A5 (pt)
CH562521A5 (pt)
CH595307A5 (pt)

Legal Events

Date Code Title Description
ST Notification of lapse