FR2273372B1 - - Google Patents
Info
- Publication number
- FR2273372B1 FR2273372B1 FR7513749A FR7513749A FR2273372B1 FR 2273372 B1 FR2273372 B1 FR 2273372B1 FR 7513749 A FR7513749 A FR 7513749A FR 7513749 A FR7513749 A FR 7513749A FR 2273372 B1 FR2273372 B1 FR 2273372B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US475005A US3889632A (en) | 1974-05-31 | 1974-05-31 | Variable incidence drive for deposition tooling |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2273372A1 FR2273372A1 (de) | 1975-12-26 |
FR2273372B1 true FR2273372B1 (de) | 1977-04-15 |
Family
ID=23885855
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7513749A Expired FR2273372B1 (de) | 1974-05-31 | 1975-04-24 |
Country Status (5)
Country | Link |
---|---|
US (1) | US3889632A (de) |
JP (1) | JPS50159447A (de) |
DE (1) | DE2513604A1 (de) |
FR (1) | FR2273372B1 (de) |
GB (1) | GB1452720A (de) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3986478A (en) * | 1975-05-15 | 1976-10-19 | Motorola, Inc. | Vapor deposition apparatus including orbital substrate holder |
US4022939A (en) * | 1975-12-18 | 1977-05-10 | Western Electric Company, Inc. | Synchronous shielding in vacuum deposition system |
US3983838A (en) * | 1975-12-31 | 1976-10-05 | International Business Machines Corporation | Planetary evaporator |
US4108107A (en) * | 1976-04-01 | 1978-08-22 | Airco, Inc. | Rotatable substrate holder for use in vacuum |
US4237662A (en) * | 1978-04-04 | 1980-12-09 | The United States Of America As Represented By The Administrator Of The National Aeronautics & Space Administration | Structural members, method and apparatus |
US4310614A (en) * | 1979-03-19 | 1982-01-12 | Xerox Corporation | Method and apparatus for pretreating and depositing thin films on substrates |
US4269137A (en) * | 1979-03-19 | 1981-05-26 | Xerox Corporation | Pretreatment of substrates prior to thin film deposition |
DE2944180A1 (de) * | 1979-11-02 | 1981-05-07 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren zum herstellen einer einen halbleiterkoerper einseitig bedeckenden isolierschicht |
US4537794A (en) * | 1981-02-24 | 1985-08-27 | Wedtech Corp. | Method of coating ceramics |
US4351855A (en) * | 1981-02-24 | 1982-09-28 | Eduard Pinkhasov | Noncrucible method of and apparatus for the vapor deposition of material upon a substrate using voltaic arc in vacuum |
US4609564C2 (en) * | 1981-02-24 | 2001-10-09 | Masco Vt Inc | Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase |
US4596719A (en) * | 1981-02-24 | 1986-06-24 | Wedtech Corp. | Multilayer coating method and apparatus |
GB2139248A (en) * | 1983-05-04 | 1984-11-07 | Gen Electric Co Plc | Copper alloy solderable contact pad produced by vapour deposition |
US4583488A (en) * | 1984-03-23 | 1986-04-22 | International Business Machines Corporation | Variable axis rotary drive vacuum deposition system |
IL74360A (en) * | 1984-05-25 | 1989-01-31 | Wedtech Corp | Method of coating ceramics and quartz crucibles with material electrically transformed into a vapor phase |
JPS61227165A (ja) * | 1985-03-29 | 1986-10-09 | Mitsubishi Electric Corp | 蒸着装置 |
US4798165A (en) * | 1985-10-07 | 1989-01-17 | Epsilon | Apparatus for chemical vapor deposition using an axially symmetric gas flow |
US4816133A (en) * | 1987-05-14 | 1989-03-28 | Northrop Corporation | Apparatus for preparing thin film optical coatings on substrates |
DE3803411A1 (de) * | 1988-02-05 | 1989-08-17 | Leybold Ag | Vorrichtung zur halterung von werkstuecken |
JPH02305438A (ja) * | 1989-05-19 | 1990-12-19 | Mitsubishi Electric Corp | 真空蒸着装置 |
US4937206A (en) * | 1989-07-10 | 1990-06-26 | Applied Materials, Inc. | Method and apparatus for preventing cross contamination of species during the processing of semiconductor wafers |
US5370739A (en) * | 1992-06-15 | 1994-12-06 | Materials Research Corporation | Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD |
DE29505497U1 (de) * | 1995-03-31 | 1995-06-08 | Balzers Hochvakuum GmbH, 65205 Wiesbaden | Beschichtungsstation |
JPH08296042A (ja) * | 1995-04-17 | 1996-11-12 | Read Rite Corp | 複数イオンビームによる絶縁薄膜の形成方法 |
DE19701419A1 (de) * | 1997-01-17 | 1998-07-23 | Geesthacht Gkss Forschung | Substrathaltereinrichtung |
US6082296A (en) * | 1999-09-22 | 2000-07-04 | Xerox Corporation | Thin film deposition chamber |
KR100797435B1 (ko) * | 2000-06-30 | 2008-01-24 | 동경 엘렉트론 주식회사 | 액처리장치 |
US6595031B2 (en) * | 2000-12-19 | 2003-07-22 | Larry Stephen Wilson | Retaining device for personal vehicle with handlebars |
KR20050072946A (ko) * | 2004-01-08 | 2005-07-13 | 삼성전자주식회사 | 고균일 증착용 장치 |
TWI280986B (en) * | 2004-04-30 | 2007-05-11 | Hon Hai Prec Ind Co Ltd | Vacuum vapor deposition apparatus |
DE102005035904B4 (de) * | 2005-07-28 | 2012-01-12 | Leybold Optics Gmbh | Vorrichtung zum Behandeln von Substraten |
CN101876058B (zh) * | 2010-03-23 | 2012-07-11 | 东莞宏威数码机械有限公司 | 真空蒸镀装置 |
US9230846B2 (en) * | 2010-06-07 | 2016-01-05 | Veeco Instruments, Inc. | Multi-wafer rotating disc reactor with inertial planetary drive |
TW201200614A (en) * | 2010-06-29 | 2012-01-01 | Hon Hai Prec Ind Co Ltd | Coating device |
TW201213587A (en) * | 2010-09-21 | 2012-04-01 | Hon Hai Prec Ind Co Ltd | Conveying mechanism and deposition device with same |
CN104084351B (zh) * | 2014-07-04 | 2017-05-24 | 长兴宏能电热膜元件厂 | 便于电热管喷膜的回转机构 |
JP2018163878A (ja) * | 2017-03-27 | 2018-10-18 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置 |
FR3103314B1 (fr) * | 2019-11-14 | 2021-10-08 | Safran Electronics & Defense | Porte substrat inclinable et orientable et systeme de depot multicouche sous vide le comprenant |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1003441A (en) * | 1910-11-04 | 1911-09-19 | Levi F Eaton | Blackleading-machine. |
US2369155A (en) * | 1941-12-22 | 1945-02-13 | Marinsky Davis | Method of conditioning wound strand bodies |
US2804976A (en) * | 1954-02-03 | 1957-09-03 | Kaiser Aluminium Chem Corp | Method and apparatus for treating material |
US2824029A (en) * | 1956-03-16 | 1958-02-18 | Magnus Chemical Company Inc | Method and apparatus for washing machine parts |
US3046157A (en) * | 1958-05-07 | 1962-07-24 | Philips Corp | Method for coating the inner wall of a tube intended for electric discharge lamps with a uniform liquid layer as well as an arrangement for the application of the method |
US3131917A (en) * | 1958-09-09 | 1964-05-05 | Gessner Siegfried | Device for adjusting the spatial position of articles to be treated in a treatment chamber |
US2997979A (en) * | 1958-09-15 | 1961-08-29 | Tassara Luigi | Apparatus for applying metallic film to electrical components and the like |
US3236205A (en) * | 1961-04-24 | 1966-02-22 | Baird Atomic Inc | High temperature furnace |
US3297475A (en) * | 1963-05-27 | 1967-01-10 | New York Air Brake Co | Coating method and apparatus employing rotating workholder |
US3673984A (en) * | 1970-08-28 | 1972-07-04 | Dart Ind Inc | Dip coating machine |
US3752691A (en) * | 1971-06-29 | 1973-08-14 | Xerox Corp | Method of vacuum evaporation |
-
1974
- 1974-05-31 US US475005A patent/US3889632A/en not_active Expired - Lifetime
-
1975
- 1975-03-27 DE DE19752513604 patent/DE2513604A1/de active Pending
- 1975-04-24 FR FR7513749A patent/FR2273372B1/fr not_active Expired
- 1975-04-30 GB GB1791075A patent/GB1452720A/en not_active Expired
- 1975-05-06 JP JP50053324A patent/JPS50159447A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
GB1452720A (en) | 1976-10-13 |
US3889632A (en) | 1975-06-17 |
JPS50159447A (de) | 1975-12-24 |
FR2273372A1 (de) | 1975-12-26 |
DE2513604A1 (de) | 1975-12-11 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |