FR2259863A1 - Photo-sensitive polymers for lithographic plates, etc. - consisting of 3-(2-furyl) acrylic acid esters of phenoxy resins - Google Patents

Photo-sensitive polymers for lithographic plates, etc. - consisting of 3-(2-furyl) acrylic acid esters of phenoxy resins

Info

Publication number
FR2259863A1
FR2259863A1 FR7502907A FR7502907A FR2259863A1 FR 2259863 A1 FR2259863 A1 FR 2259863A1 FR 7502907 A FR7502907 A FR 7502907A FR 7502907 A FR7502907 A FR 7502907A FR 2259863 A1 FR2259863 A1 FR 2259863A1
Authority
FR
France
Prior art keywords
furyl
photo
acrylic acid
acid esters
phenoxy resins
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7502907A
Other languages
English (en)
French (fr)
Other versions
FR2259863B3 (en, 2012
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Production Printing Holding BV
Original Assignee
Oce Van der Grinten NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oce Van der Grinten NV filed Critical Oce Van der Grinten NV
Publication of FR2259863A1 publication Critical patent/FR2259863A1/fr
Application granted granted Critical
Publication of FR2259863B3 publication Critical patent/FR2259863B3/fr
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/48Polymers modified by chemical after-treatment
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
FR7502907A 1974-02-01 1975-01-30 Photo-sensitive polymers for lithographic plates, etc. - consisting of 3-(2-furyl) acrylic acid esters of phenoxy resins Granted FR2259863A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7401407A NL7401407A (nl) 1974-02-01 1974-02-01 Fotopolymeer.

Publications (2)

Publication Number Publication Date
FR2259863A1 true FR2259863A1 (en) 1975-08-29
FR2259863B3 FR2259863B3 (en, 2012) 1977-10-21

Family

ID=19820669

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7502907A Granted FR2259863A1 (en) 1974-02-01 1975-01-30 Photo-sensitive polymers for lithographic plates, etc. - consisting of 3-(2-furyl) acrylic acid esters of phenoxy resins

Country Status (3)

Country Link
DE (1) DE2503526A1 (en, 2012)
FR (1) FR2259863A1 (en, 2012)
NL (1) NL7401407A (en, 2012)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0204292A3 (en) * 1985-06-05 1987-11-11 Siemens Aktiengesellschaft Berlin Und Munchen Process for the production of printed circuits using a photopolymerisable system
EP0281808A3 (en) * 1987-03-12 1990-05-16 Siemens Aktiengesellschaft Radiation cross-linkable polymer system for application as photoresist and dielectric for micro wiring

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0204292A3 (en) * 1985-06-05 1987-11-11 Siemens Aktiengesellschaft Berlin Und Munchen Process for the production of printed circuits using a photopolymerisable system
EP0281808A3 (en) * 1987-03-12 1990-05-16 Siemens Aktiengesellschaft Radiation cross-linkable polymer system for application as photoresist and dielectric for micro wiring

Also Published As

Publication number Publication date
FR2259863B3 (en, 2012) 1977-10-21
NL7401407A (nl) 1975-08-05
DE2503526A1 (de) 1975-08-07

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