FR2259863A1 - Photo-sensitive polymers for lithographic plates, etc. - consisting of 3-(2-furyl) acrylic acid esters of phenoxy resins - Google Patents
Photo-sensitive polymers for lithographic plates, etc. - consisting of 3-(2-furyl) acrylic acid esters of phenoxy resinsInfo
- Publication number
- FR2259863A1 FR2259863A1 FR7502907A FR7502907A FR2259863A1 FR 2259863 A1 FR2259863 A1 FR 2259863A1 FR 7502907 A FR7502907 A FR 7502907A FR 7502907 A FR7502907 A FR 7502907A FR 2259863 A1 FR2259863 A1 FR 2259863A1
- Authority
- FR
- France
- Prior art keywords
- furyl
- photo
- acrylic acid
- acid esters
- phenoxy resins
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/48—Polymers modified by chemical after-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
Abstract
3-(2-Furyl)acrylic acid esters of phenoxy resins with mol. wt. of at least 15,000 are used as coatings of light-sensitive printing plates for lithographic use, etch-resists, etc. Greater sensitivity to light from conventional sources is obtd. than usual cinnamic acid derivs., without need for photo-sensitisers.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL7401407A NL7401407A (en) | 1974-02-01 | 1974-02-01 | PHOTOPOLYMER. |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2259863A1 true FR2259863A1 (en) | 1975-08-29 |
FR2259863B3 FR2259863B3 (en) | 1977-10-21 |
Family
ID=19820669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7502907A Granted FR2259863A1 (en) | 1974-02-01 | 1975-01-30 | Photo-sensitive polymers for lithographic plates, etc. - consisting of 3-(2-furyl) acrylic acid esters of phenoxy resins |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE2503526A1 (en) |
FR (1) | FR2259863A1 (en) |
NL (1) | NL7401407A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0204292A2 (en) * | 1985-06-05 | 1986-12-10 | Siemens Aktiengesellschaft | Process for the production of printed circuits using a photopolymerisable system |
EP0281808A2 (en) * | 1987-03-12 | 1988-09-14 | Siemens Aktiengesellschaft | Radiation cross-linkable polymer system for application as photoresist and dielectric for micro wiring |
-
1974
- 1974-02-01 NL NL7401407A patent/NL7401407A/en unknown
-
1975
- 1975-01-29 DE DE19752503526 patent/DE2503526A1/en active Pending
- 1975-01-30 FR FR7502907A patent/FR2259863A1/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0204292A2 (en) * | 1985-06-05 | 1986-12-10 | Siemens Aktiengesellschaft | Process for the production of printed circuits using a photopolymerisable system |
EP0204292A3 (en) * | 1985-06-05 | 1987-11-11 | Siemens Aktiengesellschaft Berlin Und Munchen | Process for the production of printed circuits using a photopolymerisable system |
EP0281808A2 (en) * | 1987-03-12 | 1988-09-14 | Siemens Aktiengesellschaft | Radiation cross-linkable polymer system for application as photoresist and dielectric for micro wiring |
EP0281808A3 (en) * | 1987-03-12 | 1990-05-16 | Siemens Aktiengesellschaft | Radiation cross-linkable polymer system for application as photoresist and dielectric for micro wiring |
Also Published As
Publication number | Publication date |
---|---|
DE2503526A1 (en) | 1975-08-07 |
NL7401407A (en) | 1975-08-05 |
FR2259863B3 (en) | 1977-10-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |