NL7401407A - PHOTOPOLYMER. - Google Patents

PHOTOPOLYMER.

Info

Publication number
NL7401407A
NL7401407A NL7401407A NL7401407A NL7401407A NL 7401407 A NL7401407 A NL 7401407A NL 7401407 A NL7401407 A NL 7401407A NL 7401407 A NL7401407 A NL 7401407A NL 7401407 A NL7401407 A NL 7401407A
Authority
NL
Netherlands
Prior art keywords
photopolymer
Prior art date
Application number
NL7401407A
Other languages
Dutch (nl)
Original Assignee
Oce Van Der Grinten Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oce Van Der Grinten Nv filed Critical Oce Van Der Grinten Nv
Priority to NL7401407A priority Critical patent/NL7401407A/en
Priority to DE19752503526 priority patent/DE2503526A1/en
Priority to FR7502907A priority patent/FR2259863A1/en
Publication of NL7401407A publication Critical patent/NL7401407A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/48—Polymers modified by chemical after-treatment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
NL7401407A 1974-02-01 1974-02-01 PHOTOPOLYMER. NL7401407A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
NL7401407A NL7401407A (en) 1974-02-01 1974-02-01 PHOTOPOLYMER.
DE19752503526 DE2503526A1 (en) 1974-02-01 1975-01-29 PHOTOPOLYMERS
FR7502907A FR2259863A1 (en) 1974-02-01 1975-01-30 Photo-sensitive polymers for lithographic plates, etc. - consisting of 3-(2-furyl) acrylic acid esters of phenoxy resins

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7401407A NL7401407A (en) 1974-02-01 1974-02-01 PHOTOPOLYMER.

Publications (1)

Publication Number Publication Date
NL7401407A true NL7401407A (en) 1975-08-05

Family

ID=19820669

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7401407A NL7401407A (en) 1974-02-01 1974-02-01 PHOTOPOLYMER.

Country Status (3)

Country Link
DE (1) DE2503526A1 (en)
FR (1) FR2259863A1 (en)
NL (1) NL7401407A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0204292B1 (en) * 1985-06-05 1991-05-29 Siemens Aktiengesellschaft Process for the production of printed circuits using a photopolymerisable system
EP0281808B1 (en) * 1987-03-12 1994-07-20 Siemens Aktiengesellschaft Radiation cross-linkable polymer system for application as photoresist and dielectric for micro wiring

Also Published As

Publication number Publication date
FR2259863A1 (en) 1975-08-29
DE2503526A1 (en) 1975-08-07
FR2259863B3 (en) 1977-10-21

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