FR2209789A1 - Photosensitive coating composition - contg ethylenically unsatd ester monomer and acyloin deriv as photosensitiser - Google Patents

Photosensitive coating composition - contg ethylenically unsatd ester monomer and acyloin deriv as photosensitiser

Info

Publication number
FR2209789A1
FR2209789A1 FR7343350A FR7343350A FR2209789A1 FR 2209789 A1 FR2209789 A1 FR 2209789A1 FR 7343350 A FR7343350 A FR 7343350A FR 7343350 A FR7343350 A FR 7343350A FR 2209789 A1 FR2209789 A1 FR 2209789A1
Authority
FR
France
Prior art keywords
photosensitiser
acyloin
deriv
contg
coating composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7343350A
Other languages
French (fr)
Other versions
FR2209789B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sun Chemical Corp
Original Assignee
Sun Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sun Chemical Corp filed Critical Sun Chemical Corp
Publication of FR2209789A1 publication Critical patent/FR2209789A1/en
Application granted granted Critical
Publication of FR2209789B1 publication Critical patent/FR2209789B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/67—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton
    • C07C45/68—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
    • C07C45/72—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction of compounds containing >C = O groups with the same or other compounds containing >C = O groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/67—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton
    • C07C45/68—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
    • C07C45/72—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction of compounds containing >C = O groups with the same or other compounds containing >C = O groups
    • C07C45/75—Reactions with formaldehyde
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
    • C07C49/83—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/20—Esters of polyhydric alcohols or polyhydric phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate

Abstract

Photosensitiser for ethylenically unsatd. ester monomers e.g. for use in coatings, printing inks and adhesives, has the formula I (where R1, R2, R3 and R4 are each opt. substd. alkyl, aryl or alkaryl; R1 and R2 can also be H; and R5 is R1 or opt. substd aryl). The ratio of the quantity of the monomer to the photosensitiser is 10-99:1-90 esp. 90-99:1-10. The photosensitiser is used in printing inks, and coating compositions.
FR7343350A 1972-12-06 1973-12-05 Photosensitive coating composition - contg ethylenically unsatd ester monomer and acyloin deriv as photosensitiser Granted FR2209789A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31269872A 1972-12-06 1972-12-06

Publications (2)

Publication Number Publication Date
FR2209789A1 true FR2209789A1 (en) 1974-07-05
FR2209789B1 FR2209789B1 (en) 1977-06-10

Family

ID=23212614

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7343350A Granted FR2209789A1 (en) 1972-12-06 1973-12-05 Photosensitive coating composition - contg ethylenically unsatd ester monomer and acyloin deriv as photosensitiser

Country Status (6)

Country Link
JP (1) JPS4999147A (en)
BE (1) BE808166A (en)
DE (1) DE2357866A1 (en)
FR (1) FR2209789A1 (en)
IT (1) IT1001200B (en)
NL (1) NL7315930A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0003002A2 (en) * 1977-12-22 1979-07-11 Ciba-Geigy Ag Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones
EP0108037A2 (en) * 1982-10-01 1984-05-09 Ciba-Geigy Ag Propiophenone derivatives as photoinitiators in the photopolymerization
WO1994022925A1 (en) * 1993-04-06 1994-10-13 Alliedsignal Inc. Fluorinated photoinitiators and their application in uv curing of fluorinated monomers
USRE35060E (en) * 1991-12-11 1995-10-10 Alliedsignal Inc. Fluorinated photoinitiators and their application in UV curing of fluorinated monomers

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846121B2 (en) * 1977-04-30 1983-10-14 大日精化工業株式会社 Photocurable oil sensitizing agent

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0003002A2 (en) * 1977-12-22 1979-07-11 Ciba-Geigy Ag Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones
EP0003002A3 (en) * 1977-12-22 1980-01-09 Ciba-Geigy Ag Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones
DK157083B (en) * 1977-12-22 1989-11-06 Ciba Geigy Ag APPLICATION FOR THE USE OF AROMATIC-ALIPHATIC KETTIC KETONS AS INITIATS TO THE PHOTOPOLYMERIZATION OF UNMUNATIVE UNITS, WORNY,
EP0108037A2 (en) * 1982-10-01 1984-05-09 Ciba-Geigy Ag Propiophenone derivatives as photoinitiators in the photopolymerization
EP0108037A3 (en) * 1982-10-01 1984-09-05 Ciba-Geigy Ag Propiophenone derivatives as photoinitiators in the photopolymerization
US4795766A (en) * 1982-10-01 1989-01-03 Ciba-Geigy Corporation Propiophenone derivatives as photoinitiators for photopolymerization
USRE35060E (en) * 1991-12-11 1995-10-10 Alliedsignal Inc. Fluorinated photoinitiators and their application in UV curing of fluorinated monomers
WO1994022925A1 (en) * 1993-04-06 1994-10-13 Alliedsignal Inc. Fluorinated photoinitiators and their application in uv curing of fluorinated monomers

Also Published As

Publication number Publication date
NL7315930A (en) 1974-06-10
IT1001200B (en) 1976-04-20
FR2209789B1 (en) 1977-06-10
JPS4999147A (en) 1974-09-19
DE2357866A1 (en) 1974-06-12
BE808166A (en) 1974-03-29

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Legal Events

Date Code Title Description
ST Notification of lapse