FR2255629B1 - - Google Patents

Info

Publication number
FR2255629B1
FR2255629B1 FR7439740A FR7439740A FR2255629B1 FR 2255629 B1 FR2255629 B1 FR 2255629B1 FR 7439740 A FR7439740 A FR 7439740A FR 7439740 A FR7439740 A FR 7439740A FR 2255629 B1 FR2255629 B1 FR 2255629B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7439740A
Other languages
French (fr)
Other versions
FR2255629A1 (da
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2255629A1 publication Critical patent/FR2255629A1/fr
Application granted granted Critical
Publication of FR2255629B1 publication Critical patent/FR2255629B1/fr
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/026Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
    • C08F299/028Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight photopolymerisable compositions
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/50Amines
    • C08G59/5033Amines aromatic
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
FR7439740A 1973-12-20 1974-10-18 Expired FR2255629B1 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US42687773A 1973-12-20 1973-12-20

Publications (2)

Publication Number Publication Date
FR2255629A1 FR2255629A1 (da) 1975-07-18
FR2255629B1 true FR2255629B1 (da) 1976-10-22

Family

ID=23692577

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7439740A Expired FR2255629B1 (da) 1973-12-20 1974-10-18

Country Status (9)

Country Link
JP (1) JPS5234935B2 (da)
BR (1) BR7410702D0 (da)
CA (1) CA1048328A (da)
CH (1) CH613287A5 (da)
ES (1) ES433118A1 (da)
FR (1) FR2255629B1 (da)
GB (1) GB1448643A (da)
IT (1) IT1030846B (da)
NL (1) NL7415671A (da)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169732A (en) * 1978-01-09 1979-10-02 International Business Machines Corporation Photosensitive coating composition and use thereof
NO159729C (no) * 1978-11-01 1989-02-01 Coates Brothers & Co Fremgangsmaate for fremstilling av et moenster av loddemetall paa et lag elektrisk ledende metall baaret av et ikke-ledende underlag.
JPS5622364A (en) 1979-08-01 1981-03-02 Matsushita Electric Ind Co Ltd Coating composition
US4390615A (en) 1979-11-05 1983-06-28 Courtney Robert W Coating compositions
EP0099856B1 (de) * 1982-06-24 1987-11-11 Ciba-Geigy Ag Photopolymerisierbares Beschichtungsmittel, photopolymerisierbares Material und seine Verwendung
JPS61125019A (ja) * 1984-11-16 1986-06-12 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション 集積回路製造方法及びその方法に使用する光導電性フオトレジスト複合体
US4933398A (en) * 1987-07-01 1990-06-12 Ciba-Geigy Corporation Photosensitive epoxy resins and use thereof
GB8715436D0 (en) * 1987-07-01 1987-08-05 Ciba Geigy Ag Substituted anthraquinones
JPH0491104A (ja) * 1990-08-06 1992-03-24 Ootex Kk 光重合反応開始剤

Also Published As

Publication number Publication date
CH613287A5 (en) 1979-09-14
DE2459179B2 (de) 1977-04-21
ES433118A1 (es) 1976-11-16
CA1048328A (en) 1979-02-13
NL7415671A (nl) 1975-06-24
FR2255629A1 (da) 1975-07-18
JPS5097324A (da) 1975-08-02
BR7410702D0 (pt) 1975-09-02
GB1448643A (en) 1976-09-08
IT1030846B (it) 1979-04-10
JPS5234935B2 (da) 1977-09-06
DE2459179A1 (de) 1975-06-26

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Legal Events

Date Code Title Description
ST Notification of lapse