FR2231985A1 - - Google Patents

Info

Publication number
FR2231985A1
FR2231985A1 FR7418752A FR7418752A FR2231985A1 FR 2231985 A1 FR2231985 A1 FR 2231985A1 FR 7418752 A FR7418752 A FR 7418752A FR 7418752 A FR7418752 A FR 7418752A FR 2231985 A1 FR2231985 A1 FR 2231985A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7418752A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Publication of FR2231985A1 publication Critical patent/FR2231985A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/587—Unsaturated compounds containing a keto groups being part of a ring
    • C07C49/687—Unsaturated compounds containing a keto groups being part of a ring containing halogen
    • C07C49/697—Unsaturated compounds containing a keto groups being part of a ring containing halogen containing six-membered aromatic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Epoxy Resins (AREA)
FR7418752A 1973-06-02 1974-05-30 Withdrawn FR2231985A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48062144A JPS5146697B2 (fr) 1973-06-02 1973-06-02

Publications (1)

Publication Number Publication Date
FR2231985A1 true FR2231985A1 (fr) 1974-12-27

Family

ID=13191595

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7418752A Withdrawn FR2231985A1 (fr) 1973-06-02 1974-05-30

Country Status (7)

Country Link
JP (1) JPS5146697B2 (fr)
CA (1) CA1052164A (fr)
DE (1) DE2426645C3 (fr)
FR (1) FR2231985A1 (fr)
GB (1) GB1450630A (fr)
IT (1) IT1014637B (fr)
NL (1) NL7407156A (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU4946697A (en) * 1996-10-28 1998-05-22 Merck Patent Gmbh Dihydrobenzoanthracenone, -pyrimidinone or dihydronaphtoquinolinone

Also Published As

Publication number Publication date
JPS5011418A (fr) 1975-02-05
DE2426645B2 (de) 1978-03-23
JPS5146697B2 (fr) 1976-12-10
DE2426645C3 (de) 1978-11-23
GB1450630A (en) 1976-09-22
IT1014637B (it) 1977-04-30
NL7407156A (fr) 1974-12-04
CA1052164A (fr) 1979-04-10
DE2426645A1 (de) 1974-12-12

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Legal Events

Date Code Title Description
ST Notification of lapse