GB1450630A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
GB1450630A
GB1450630A GB2422474A GB2422474A GB1450630A GB 1450630 A GB1450630 A GB 1450630A GB 2422474 A GB2422474 A GB 2422474A GB 2422474 A GB2422474 A GB 2422474A GB 1450630 A GB1450630 A GB 1450630A
Authority
GB
United Kingdom
Prior art keywords
substituted
sensitizer
compositions
cinnamate
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2422474A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Publication of GB1450630A publication Critical patent/GB1450630A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/587—Unsaturated compounds containing a keto groups being part of a ring
    • C07C49/687—Unsaturated compounds containing a keto groups being part of a ring containing halogen
    • C07C49/697—Unsaturated compounds containing a keto groups being part of a ring containing halogen containing six-membered aromatic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Epoxy Resins (AREA)

Abstract

1450630 Photocurable compositions MITSUBISHI CHEMICAL INDUSTRIES Ltd 31 May 1974 [2 June 1973] 24224/74 Heading C3P [Also in Divisions C2 and G2] Photosensitive compositions comprise a photosensitive polymer containing radicals of the formula wherein Ar represents a substituted or unsubstituted aryl group, X and Y which may be the same or different each represent a hydrogen atom, halogen atom, cyano group or nitro group and n represents 1 or 2 ; and a halogen-substituted benzanthrone as a sensitizer. Typical photosensitive polymers include polyvinyl compounds bearing cinnamate or substituted cinnamate radicals in side chains; polyglycidyl cinnamate and polyglycidyl substituted cinnamates; and reaction products of polyepichlorohydrin or polyepibromohydrin and cinnamic acid or a substituted cinnamic acid. The benzanthrone sensitizer is preferably substituted by chlorine or bromine. In use the compositions preferably include a solvent and may also contain a conventional sensitizer, e.g. an aromatic nitro compound or a ketone sensitizer, as well as a stabilizer, plasticizer, dyestuff or pigment. The compositions are particularly sensitive to g-line radiation (4358Š) and may be used in such applications as printing, reproduction, and photoresists for the manufacture of integrated circuits.
GB2422474A 1973-06-02 1974-05-31 Photosensitive composition Expired GB1450630A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48062144A JPS5146697B2 (en) 1973-06-02 1973-06-02

Publications (1)

Publication Number Publication Date
GB1450630A true GB1450630A (en) 1976-09-22

Family

ID=13191595

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2422474A Expired GB1450630A (en) 1973-06-02 1974-05-31 Photosensitive composition

Country Status (7)

Country Link
JP (1) JPS5146697B2 (en)
CA (1) CA1052164A (en)
DE (1) DE2426645C3 (en)
FR (1) FR2231985A1 (en)
GB (1) GB1450630A (en)
IT (1) IT1014637B (en)
NL (1) NL7407156A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998018764A1 (en) * 1996-10-28 1998-05-07 Merck Patent Gmbh Dihydrobenzoanthracenone, -pyrimidinone or dihydronaphtoquinolinone

Also Published As

Publication number Publication date
NL7407156A (en) 1974-12-04
JPS5146697B2 (en) 1976-12-10
JPS5011418A (en) 1975-02-05
DE2426645B2 (en) 1978-03-23
FR2231985A1 (en) 1974-12-27
DE2426645A1 (en) 1974-12-12
DE2426645C3 (en) 1978-11-23
IT1014637B (en) 1977-04-30
CA1052164A (en) 1979-04-10

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee