FR2227344A2 - Vacuum chamber for cathode sputtering - with electrode and substrate cleaning disc - Google Patents

Vacuum chamber for cathode sputtering - with electrode and substrate cleaning disc

Info

Publication number
FR2227344A2
FR2227344A2 FR7315281A FR7315281A FR2227344A2 FR 2227344 A2 FR2227344 A2 FR 2227344A2 FR 7315281 A FR7315281 A FR 7315281A FR 7315281 A FR7315281 A FR 7315281A FR 2227344 A2 FR2227344 A2 FR 2227344A2
Authority
FR
France
Prior art keywords
electrode
vacuum chamber
horizontal
anode
enclosure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7315281A
Other languages
English (en)
French (fr)
Other versions
FR2227344B2 (cs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bpifrance Financement SA
Original Assignee
Agence National de Valorisation de la Recherche ANVAR
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR7238211A external-priority patent/FR2204708A1/fr
Application filed by Agence National de Valorisation de la Recherche ANVAR filed Critical Agence National de Valorisation de la Recherche ANVAR
Priority to FR7315281A priority Critical patent/FR2227344A2/fr
Publication of FR2227344A2 publication Critical patent/FR2227344A2/fr
Application granted granted Critical
Publication of FR2227344B2 publication Critical patent/FR2227344B2/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32853—Hygiene
    • H01J37/32862—In situ cleaning of vessels and/or internal parts
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR7315281A 1972-10-27 1973-04-27 Vacuum chamber for cathode sputtering - with electrode and substrate cleaning disc Granted FR2227344A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7315281A FR2227344A2 (en) 1972-10-27 1973-04-27 Vacuum chamber for cathode sputtering - with electrode and substrate cleaning disc

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR7238211A FR2204708A1 (en) 1972-10-27 1972-10-27 Vacuum chamber for cathode sputtering - for prepn. of multiple thin layers by sputtering and evapn. inside the same chamber
FR7315281A FR2227344A2 (en) 1972-10-27 1973-04-27 Vacuum chamber for cathode sputtering - with electrode and substrate cleaning disc

Publications (2)

Publication Number Publication Date
FR2227344A2 true FR2227344A2 (en) 1974-11-22
FR2227344B2 FR2227344B2 (cs) 1979-01-12

Family

ID=32232278

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7315281A Granted FR2227344A2 (en) 1972-10-27 1973-04-27 Vacuum chamber for cathode sputtering - with electrode and substrate cleaning disc

Country Status (1)

Country Link
FR (1) FR2227344A2 (cs)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107881480A (zh) * 2017-12-25 2018-04-06 苏州浩联光电科技有限公司 一种镀膜飞行平衡装置以及镀膜系统

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107881480A (zh) * 2017-12-25 2018-04-06 苏州浩联光电科技有限公司 一种镀膜飞行平衡装置以及镀膜系统

Also Published As

Publication number Publication date
FR2227344B2 (cs) 1979-01-12

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