FR2217722A1 - Imagewise-exposed, presensitised printing plate - desensitised by developing with org. liq., wiping off and treating with aq. desensitising soln. - Google Patents
Imagewise-exposed, presensitised printing plate - desensitised by developing with org. liq., wiping off and treating with aq. desensitising soln.Info
- Publication number
- FR2217722A1 FR2217722A1 FR7404997A FR7404997A FR2217722A1 FR 2217722 A1 FR2217722 A1 FR 2217722A1 FR 7404997 A FR7404997 A FR 7404997A FR 7404997 A FR7404997 A FR 7404997A FR 2217722 A1 FR2217722 A1 FR 2217722A1
- Authority
- FR
- France
- Prior art keywords
- desensitising
- desensitised
- imagewise
- liq
- soln
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB737273 | 1973-02-14 | ||
GB2688273 | 1973-06-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2217722A1 true FR2217722A1 (en) | 1974-09-06 |
FR2217722B3 FR2217722B3 (ja) | 1976-11-26 |
Family
ID=26241380
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7404997A Granted FR2217722A1 (en) | 1973-02-14 | 1974-02-14 | Imagewise-exposed, presensitised printing plate - desensitised by developing with org. liq., wiping off and treating with aq. desensitising soln. |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS49111703A (ja) |
DE (1) | DE2407089A1 (ja) |
FR (1) | FR2217722A1 (ja) |
IT (1) | IT1002926B (ja) |
LU (1) | LU69378A1 (ja) |
NL (1) | NL7401885A (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3523176A1 (de) * | 1985-06-28 | 1987-01-08 | Hoechst Ag | Strahlungsempfindliche beschichtungsloesung und verfahren zur herstellung einer strahlungsempfindlichen schicht auf einem schichttraeger |
DE4020372A1 (de) * | 1990-06-27 | 1992-01-02 | Basf Ag | Verfahren zur herstellung photopolymerer flexographischer reliefdruckplatten |
-
1974
- 1974-02-12 NL NL7401885A patent/NL7401885A/xx unknown
- 1974-02-12 LU LU69378D patent/LU69378A1/xx unknown
- 1974-02-14 IT IT4835474A patent/IT1002926B/it active
- 1974-02-14 DE DE19742407089 patent/DE2407089A1/de active Pending
- 1974-02-14 FR FR7404997A patent/FR2217722A1/fr active Granted
- 1974-02-14 JP JP1721674A patent/JPS49111703A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE2407089A1 (de) | 1974-09-05 |
JPS49111703A (ja) | 1974-10-24 |
LU69378A1 (ja) | 1974-05-29 |
FR2217722B3 (ja) | 1976-11-26 |
NL7401885A (ja) | 1974-08-16 |
IT1002926B (it) | 1976-05-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |