FR2209789A1 - Photosensitive coating composition - contg ethylenically unsatd ester monomer and acyloin deriv as photosensitiser - Google Patents
Photosensitive coating composition - contg ethylenically unsatd ester monomer and acyloin deriv as photosensitiserInfo
- Publication number
- FR2209789A1 FR2209789A1 FR7343350A FR7343350A FR2209789A1 FR 2209789 A1 FR2209789 A1 FR 2209789A1 FR 7343350 A FR7343350 A FR 7343350A FR 7343350 A FR7343350 A FR 7343350A FR 2209789 A1 FR2209789 A1 FR 2209789A1
- Authority
- FR
- France
- Prior art keywords
- photosensitiser
- acyloin
- deriv
- contg
- coating composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000178 monomer Substances 0.000 title abstract 3
- 239000008199 coating composition Substances 0.000 title abstract 2
- 150000002148 esters Chemical class 0.000 title abstract 2
- MWKAGZWJHCTVJY-UHFFFAOYSA-N 3-hydroxyoctadecan-2-one Chemical compound CCCCCCCCCCCCCCCC(O)C(C)=O MWKAGZWJHCTVJY-UHFFFAOYSA-N 0.000 title 1
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 239000000976 ink Substances 0.000 abstract 2
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 125000002877 alkyl aryl group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
- C07C45/67—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton
- C07C45/68—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
- C07C45/72—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction of compounds containing >C = O groups with the same or other compounds containing >C = O groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
- C07C45/67—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton
- C07C45/68—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
- C07C45/72—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction of compounds containing >C = O groups with the same or other compounds containing >C = O groups
- C07C45/75—Reactions with formaldehyde
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
- C07C49/83—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/20—Esters of polyhydric alcohols or polyhydric phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31269872A | 1972-12-06 | 1972-12-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2209789A1 true FR2209789A1 (en) | 1974-07-05 |
| FR2209789B1 FR2209789B1 (enrdf_load_stackoverflow) | 1977-06-10 |
Family
ID=23212614
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7343350A Granted FR2209789A1 (en) | 1972-12-06 | 1973-12-05 | Photosensitive coating composition - contg ethylenically unsatd ester monomer and acyloin deriv as photosensitiser |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS4999147A (enrdf_load_stackoverflow) |
| BE (1) | BE808166A (enrdf_load_stackoverflow) |
| DE (1) | DE2357866A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2209789A1 (enrdf_load_stackoverflow) |
| IT (1) | IT1001200B (enrdf_load_stackoverflow) |
| NL (1) | NL7315930A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0003002A3 (en) * | 1977-12-22 | 1980-01-09 | Ciba-Geigy Ag | Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones |
| EP0108037A3 (en) * | 1982-10-01 | 1984-09-05 | Ciba-Geigy Ag | Propiophenone derivatives as photoinitiators in the photopolymerization |
| WO1994022925A1 (en) * | 1993-04-06 | 1994-10-13 | Alliedsignal Inc. | Fluorinated photoinitiators and their application in uv curing of fluorinated monomers |
| USRE35060E (en) * | 1991-12-11 | 1995-10-10 | Alliedsignal Inc. | Fluorinated photoinitiators and their application in UV curing of fluorinated monomers |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5846121B2 (ja) * | 1977-04-30 | 1983-10-14 | 大日精化工業株式会社 | 光硬化性感脂化処理剤 |
-
1973
- 1973-11-20 NL NL7315930A patent/NL7315930A/xx unknown
- 1973-11-20 DE DE2357866A patent/DE2357866A1/de active Pending
- 1973-11-30 JP JP48134237A patent/JPS4999147A/ja active Pending
- 1973-12-04 BE BE138463A patent/BE808166A/xx unknown
- 1973-12-05 FR FR7343350A patent/FR2209789A1/fr active Granted
- 1973-12-05 IT IT66006/73A patent/IT1001200B/it active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0003002A3 (en) * | 1977-12-22 | 1980-01-09 | Ciba-Geigy Ag | Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones |
| DK157083B (da) * | 1977-12-22 | 1989-11-06 | Ciba Geigy Ag | Anvendelse af aromatisk-aliphatiske ketoner som initiatorer til fotopolymerisation af umaettede forbindelser samt til fotokemisk tvaerbinding af polyolefiner, fotopolymeriserbart system indeholdende saadanne ketoner samt fremgangsmaade til fotopolymerisation af umaettede forbindelser |
| EP0108037A3 (en) * | 1982-10-01 | 1984-09-05 | Ciba-Geigy Ag | Propiophenone derivatives as photoinitiators in the photopolymerization |
| US4795766A (en) * | 1982-10-01 | 1989-01-03 | Ciba-Geigy Corporation | Propiophenone derivatives as photoinitiators for photopolymerization |
| USRE35060E (en) * | 1991-12-11 | 1995-10-10 | Alliedsignal Inc. | Fluorinated photoinitiators and their application in UV curing of fluorinated monomers |
| WO1994022925A1 (en) * | 1993-04-06 | 1994-10-13 | Alliedsignal Inc. | Fluorinated photoinitiators and their application in uv curing of fluorinated monomers |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4999147A (enrdf_load_stackoverflow) | 1974-09-19 |
| DE2357866A1 (de) | 1974-06-12 |
| FR2209789B1 (enrdf_load_stackoverflow) | 1977-06-10 |
| BE808166A (fr) | 1974-03-29 |
| NL7315930A (enrdf_load_stackoverflow) | 1974-06-10 |
| IT1001200B (it) | 1976-04-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |