FR2209789A1 - Photosensitive coating composition - contg ethylenically unsatd ester monomer and acyloin deriv as photosensitiser - Google Patents

Photosensitive coating composition - contg ethylenically unsatd ester monomer and acyloin deriv as photosensitiser

Info

Publication number
FR2209789A1
FR2209789A1 FR7343350A FR7343350A FR2209789A1 FR 2209789 A1 FR2209789 A1 FR 2209789A1 FR 7343350 A FR7343350 A FR 7343350A FR 7343350 A FR7343350 A FR 7343350A FR 2209789 A1 FR2209789 A1 FR 2209789A1
Authority
FR
France
Prior art keywords
photosensitiser
acyloin
deriv
contg
coating composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7343350A
Other languages
English (en)
French (fr)
Other versions
FR2209789B1 (da
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sun Chemical Corp
Original Assignee
Sun Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sun Chemical Corp filed Critical Sun Chemical Corp
Publication of FR2209789A1 publication Critical patent/FR2209789A1/fr
Application granted granted Critical
Publication of FR2209789B1 publication Critical patent/FR2209789B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/67Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton
    • C07C45/68Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
    • C07C45/72Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction of compounds containing >C = O groups with the same or other compounds containing >C = O groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/67Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton
    • C07C45/68Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
    • C07C45/72Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction of compounds containing >C = O groups with the same or other compounds containing >C = O groups
    • C07C45/75Reactions with formaldehyde
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/82Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
    • C07C49/83Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/84Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/20Esters of polyhydric alcohols or polyhydric phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FR7343350A 1972-12-06 1973-12-05 Photosensitive coating composition - contg ethylenically unsatd ester monomer and acyloin deriv as photosensitiser Granted FR2209789A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31269872A 1972-12-06 1972-12-06

Publications (2)

Publication Number Publication Date
FR2209789A1 true FR2209789A1 (en) 1974-07-05
FR2209789B1 FR2209789B1 (da) 1977-06-10

Family

ID=23212614

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7343350A Granted FR2209789A1 (en) 1972-12-06 1973-12-05 Photosensitive coating composition - contg ethylenically unsatd ester monomer and acyloin deriv as photosensitiser

Country Status (6)

Country Link
JP (1) JPS4999147A (da)
BE (1) BE808166A (da)
DE (1) DE2357866A1 (da)
FR (1) FR2209789A1 (da)
IT (1) IT1001200B (da)
NL (1) NL7315930A (da)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0003002A2 (de) * 1977-12-22 1979-07-11 Ciba-Geigy Ag Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone
EP0108037A2 (de) * 1982-10-01 1984-05-09 Ciba-Geigy Ag Propiophenonderivate als Photoinitiatoren für die Photopolymerisation
WO1994022925A1 (en) * 1993-04-06 1994-10-13 Alliedsignal Inc. Fluorinated photoinitiators and their application in uv curing of fluorinated monomers
USRE35060E (en) * 1991-12-11 1995-10-10 Alliedsignal Inc. Fluorinated photoinitiators and their application in UV curing of fluorinated monomers

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846121B2 (ja) * 1977-04-30 1983-10-14 大日精化工業株式会社 光硬化性感脂化処理剤

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0003002A2 (de) * 1977-12-22 1979-07-11 Ciba-Geigy Ag Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone
EP0003002A3 (en) * 1977-12-22 1980-01-09 Ciba-Geigy Ag Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones
DK157083B (da) * 1977-12-22 1989-11-06 Ciba Geigy Ag Anvendelse af aromatisk-aliphatiske ketoner som initiatorer til fotopolymerisation af umaettede forbindelser samt til fotokemisk tvaerbinding af polyolefiner, fotopolymeriserbart system indeholdende saadanne ketoner samt fremgangsmaade til fotopolymerisation af umaettede forbindelser
EP0108037A2 (de) * 1982-10-01 1984-05-09 Ciba-Geigy Ag Propiophenonderivate als Photoinitiatoren für die Photopolymerisation
EP0108037A3 (en) * 1982-10-01 1984-09-05 Ciba-Geigy Ag Propiophenone derivatives as photoinitiators in the photopolymerization
US4795766A (en) * 1982-10-01 1989-01-03 Ciba-Geigy Corporation Propiophenone derivatives as photoinitiators for photopolymerization
USRE35060E (en) * 1991-12-11 1995-10-10 Alliedsignal Inc. Fluorinated photoinitiators and their application in UV curing of fluorinated monomers
WO1994022925A1 (en) * 1993-04-06 1994-10-13 Alliedsignal Inc. Fluorinated photoinitiators and their application in uv curing of fluorinated monomers

Also Published As

Publication number Publication date
FR2209789B1 (da) 1977-06-10
NL7315930A (da) 1974-06-10
JPS4999147A (da) 1974-09-19
DE2357866A1 (de) 1974-06-12
BE808166A (fr) 1974-03-29
IT1001200B (it) 1976-04-20

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Legal Events

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