FR2209216A1 - - Google Patents

Info

Publication number
FR2209216A1
FR2209216A1 FR7338736A FR7338736A FR2209216A1 FR 2209216 A1 FR2209216 A1 FR 2209216A1 FR 7338736 A FR7338736 A FR 7338736A FR 7338736 A FR7338736 A FR 7338736A FR 2209216 A1 FR2209216 A1 FR 2209216A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7338736A
Other languages
French (fr)
Other versions
FR2209216B1 (de
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2209216A1 publication Critical patent/FR2209216A1/fr
Application granted granted Critical
Publication of FR2209216B1 publication Critical patent/FR2209216B1/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/108Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/288Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701Low temperature co-fired ceramic [LTCC]
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0756Uses of liquids, e.g. rinsing, coating, dissolving
    • H05K2203/0759Forming a polymer layer by liquid coating, e.g. a non-metallic protective coating or an organic bonding layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Magnetic Heads (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electroplating Methods And Accessories (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
FR7338736A 1972-11-30 1973-10-23 Expired FR2209216B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31100672A 1972-11-30 1972-11-30

Publications (2)

Publication Number Publication Date
FR2209216A1 true FR2209216A1 (de) 1974-06-28
FR2209216B1 FR2209216B1 (de) 1977-09-30

Family

ID=23204973

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7338736A Expired FR2209216B1 (de) 1972-11-30 1973-10-23

Country Status (3)

Country Link
JP (1) JPS5733703B2 (de)
FR (1) FR2209216B1 (de)
GB (1) GB1441781A (de)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2388064A1 (fr) * 1977-04-18 1978-11-17 Philips Nv Procede pour renforcer par voie galvanique un motif de base conducteur et dispositif obtenu suivant ce procede
FR2495192A1 (fr) * 1980-12-03 1982-06-04 Memorex Corp Procede de formation de dessins metalliques en couches minces par attaque chimique, notamment pour tetes d'enregistrement magnetique
EP0088869A2 (de) * 1982-03-15 1983-09-21 International Business Machines Corporation Dünnfilmverfahren zur Herstellung von Ferritköpfen für schmale Spuren
CN114173510A (zh) * 2021-12-08 2022-03-11 上海交通大学 一种具有空气隔热层的微型多层隔热结构及其制备和应用

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5580819A (en) * 1978-12-14 1980-06-18 Mitsubishi Electric Corp Manufacture of thin film magnetic head
JPS5691494A (en) * 1979-12-25 1981-07-24 Nippon Electric Co Method of forming conductor pattern
JPS5766523A (en) * 1980-10-13 1982-04-22 Hitachi Ltd Thin-film magnetic head
JPS57164413A (en) * 1981-03-31 1982-10-09 Fujitsu Ltd Manufacture of thin film magnetic head
JPS5819716A (ja) * 1981-07-27 1983-02-04 Hitachi Ltd 薄膜磁気ヘツドおよびその製造方法
GB2213325B (en) * 1987-12-04 1992-01-02 Marconi Electronic Devices A method of forming electrical conductors
JPH05235173A (ja) * 1992-02-24 1993-09-10 Nec Corp 半導体装置及びその製造方法
JPH06215329A (ja) * 1992-11-18 1994-08-05 Mitsumi Electric Co Ltd 微細導電パターンの形成方法
JPH0644531A (ja) * 1993-02-24 1994-02-18 Hitachi Ltd 薄膜磁気ヘッド
JPH07273118A (ja) * 1994-03-28 1995-10-20 Toshiba Corp 配線、電極の形成方法
CN114501833B (zh) * 2020-10-23 2024-05-14 深南电路股份有限公司 线路板上阻焊层的加工方法
CN117393646A (zh) * 2021-03-02 2024-01-12 苏州太阳井新能源有限公司 一种光伏电池电极的制作方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3154450A (en) * 1960-01-27 1964-10-27 Bendix Corp Method of making mesas for diodes by etching
US3474021A (en) * 1966-01-12 1969-10-21 Ibm Method of forming openings using sequential sputtering and chemical etching
CH482306A (de) * 1967-08-04 1969-11-30 Western Electric Co Verfahren zur Herstellung einer mit Kontakten versehenen Halbleiter-Anordnung

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3154450A (en) * 1960-01-27 1964-10-27 Bendix Corp Method of making mesas for diodes by etching
US3474021A (en) * 1966-01-12 1969-10-21 Ibm Method of forming openings using sequential sputtering and chemical etching
CH482306A (de) * 1967-08-04 1969-11-30 Western Electric Co Verfahren zur Herstellung einer mit Kontakten versehenen Halbleiter-Anordnung

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2388064A1 (fr) * 1977-04-18 1978-11-17 Philips Nv Procede pour renforcer par voie galvanique un motif de base conducteur et dispositif obtenu suivant ce procede
FR2495192A1 (fr) * 1980-12-03 1982-06-04 Memorex Corp Procede de formation de dessins metalliques en couches minces par attaque chimique, notamment pour tetes d'enregistrement magnetique
EP0088869A2 (de) * 1982-03-15 1983-09-21 International Business Machines Corporation Dünnfilmverfahren zur Herstellung von Ferritköpfen für schmale Spuren
EP0088869A3 (en) * 1982-03-15 1986-02-05 International Business Machines Corporation Thin film techniques for fabricating narrow track ferrite heads
CN114173510A (zh) * 2021-12-08 2022-03-11 上海交通大学 一种具有空气隔热层的微型多层隔热结构及其制备和应用
CN114173510B (zh) * 2021-12-08 2022-12-13 上海交通大学 一种具有空气隔热层的微型多层隔热结构及其制备和应用

Also Published As

Publication number Publication date
JPS5733703B2 (de) 1982-07-19
FR2209216B1 (de) 1977-09-30
GB1441781A (en) 1976-07-07
JPS4983868A (de) 1974-08-12

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Legal Events

Date Code Title Description
ST Notification of lapse