FR2208183B1 - - Google Patents

Info

Publication number
FR2208183B1
FR2208183B1 FR7341723A FR7341723A FR2208183B1 FR 2208183 B1 FR2208183 B1 FR 2208183B1 FR 7341723 A FR7341723 A FR 7341723A FR 7341723 A FR7341723 A FR 7341723A FR 2208183 B1 FR2208183 B1 FR 2208183B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7341723A
Other versions
FR2208183A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19722257920 external-priority patent/DE2257920C3/de
Priority claimed from DE19732310617 external-priority patent/DE2310617A1/de
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of FR2208183A1 publication Critical patent/FR2208183A1/fr
Application granted granted Critical
Publication of FR2208183B1 publication Critical patent/FR2208183B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
    • H01J29/18—Luminescent screens
    • H01J29/22—Luminescent screens characterised by the binder or adhesive for securing the luminescent material to its support, e.g. vessel
    • H01J29/225—Luminescent screens characterised by the binder or adhesive for securing the luminescent material to its support, e.g. vessel photosensitive adhesive
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing
FR7341723A 1972-11-25 1973-11-23 Expired FR2208183B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19722257920 DE2257920C3 (de) 1972-11-25 Verfahren zum Herstellen eines Raster-Leuchtschirmes
DE19732310617 DE2310617A1 (de) 1973-03-02 1973-03-02 Verfahren zum herstellen eines leuchtschirmes fuer kathodenstrahlroehren

Publications (2)

Publication Number Publication Date
FR2208183A1 FR2208183A1 (fr) 1974-06-21
FR2208183B1 true FR2208183B1 (fr) 1978-02-24

Family

ID=25764143

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7341723A Expired FR2208183B1 (fr) 1972-11-25 1973-11-23

Country Status (6)

Country Link
US (1) US3915707A (fr)
JP (1) JPS5851375B2 (fr)
FR (1) FR2208183B1 (fr)
GB (1) GB1450196A (fr)
IT (1) IT997623B (fr)
SE (1) SE388969B (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7403205A (nl) * 1974-03-11 1975-09-15 Philips Nv Werkwijze voor het vervaardigen van een kathode- straalbuis voor het weergeven van gekleurde beelden en kathodestraalbuis vervaardigd volgens deze werkwijze.
JPS5847811B2 (ja) * 1974-06-17 1983-10-25 株式会社日立製作所 ケイコウメンノ セイゾウホウホウ
US4154614A (en) * 1975-07-02 1979-05-15 Nippon Paint Co., Ltd. Photosensitive diazo composition with graft copolymer for use in printing screen
FI71851C (fi) * 1977-04-13 1987-02-09 Hitachi Ltd Foerfarande foer bildande av ett pulverbelaeggningsskikt enligt moenster pao en bildyta av ett faergbildroer.
DE2731126A1 (de) * 1977-07-09 1979-01-25 Licentia Gmbh Verfahren zum herstellen eines leuchtschirmes
US4554236A (en) * 1982-03-18 1985-11-19 American Hoechst Corporation Amino acid stabilizers for water soluble diazonium compound condensation products
US4469772A (en) * 1982-06-03 1984-09-04 American Hoechst Corporation Water developable dye coating on substrate with two diazo polycondensation products and water soluble polymeric binder
US4501806A (en) * 1982-09-01 1985-02-26 Tokyo Shibaura Denki Kabushiki Kaisha Method for forming pattern and photoresist used therein
JPS59101644A (ja) * 1982-12-01 1984-06-12 Fuji Photo Film Co Ltd 感光性組成物
JPS63500400A (ja) * 1985-08-05 1988-02-12 レエイクスニフエルシテイト　レイデン 標識高分子、その製法および免疫学または免疫細胞化学検定に対する使用
JPS62105573U (fr) * 1985-12-19 1987-07-06

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3406068A (en) * 1951-07-30 1968-10-15 Rca Corp Photographic methods of making electron-sensitive mosaic screens
US2840470A (en) * 1951-09-27 1958-06-24 Sylvania Electric Prod Method of preparing a fluorescent screen
US2959483A (en) * 1955-09-06 1960-11-08 Zenith Radio Corp Color image reproducer and method of manufacture
US3149975A (en) * 1962-07-06 1964-09-22 Du Pont Photopolymerizable compositions and elements
US3317319A (en) * 1963-06-04 1967-05-02 Rca Corp Method of depositing particulate layers
US3387975A (en) * 1965-03-10 1968-06-11 Sony Corp Method of making color screen of a cathode ray tube
GB1197772A (en) * 1966-11-01 1970-07-08 Matsushita Electronics Corp Improvements in or relating to Photosensitive Slurries and Their Preparation.
GB1180194A (en) * 1967-03-29 1970-02-04 Rca Corp Method for Preparing a Stencil
US3585034A (en) * 1967-04-03 1971-06-15 Gaf Corp Manufacture of phosphor screens
CA820828A (en) * 1967-04-03 1969-08-19 General Aniline And Film Corporation Radiation sensitive photopolymerizable composition and its use in preparing a cathode ray tube viewing panel
US3598629A (en) * 1969-01-08 1971-08-10 Zenith Radio Corp Color cathode-ray tube
US3574129A (en) * 1969-02-28 1971-04-06 Sylvania Electric Prod Method for preventing hydrolysis of a rare earth oxide host phosphor in a coating slurry
US3679419A (en) * 1969-05-20 1972-07-25 Azoplate Corp Light-sensitive diazo condensate containing reproduction material
US3849392A (en) * 1969-05-20 1974-11-19 Kalle Ag Process for the production of polycondensation products of aromatic diazonium compounds
NL174835C (nl) * 1969-05-20 1984-08-16 Hoechst Ag Werkwijze voor het bereiden van een lichtgevoelig condensatieprodukt van een aromatische diazoniumverbinding.
US3867147A (en) * 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
DE2041395C2 (de) * 1970-08-20 1983-10-13 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung von Siebdruckformen

Also Published As

Publication number Publication date
IT997623B (it) 1975-12-30
JPS5851375B2 (ja) 1983-11-16
JPS4997566A (fr) 1974-09-14
US3915707A (en) 1975-10-28
SE388969B (sv) 1976-10-18
FR2208183A1 (fr) 1974-06-21
GB1450196A (en) 1976-09-22

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Legal Events

Date Code Title Description
ST Notification of lapse