FR2207757A2 - - Google Patents

Info

Publication number
FR2207757A2
FR2207757A2 FR7342353A FR7342353A FR2207757A2 FR 2207757 A2 FR2207757 A2 FR 2207757A2 FR 7342353 A FR7342353 A FR 7342353A FR 7342353 A FR7342353 A FR 7342353A FR 2207757 A2 FR2207757 A2 FR 2207757A2
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7342353A
Other languages
French (fr)
Other versions
FR2207757B2 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of FR2207757A2 publication Critical patent/FR2207757A2/fr
Application granted granted Critical
Publication of FR2207757B2 publication Critical patent/FR2207757B2/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0033—Heating devices using lamps
    • H05B3/0038—Heating devices using lamps for industrial applications
    • H05B3/0047—Heating devices using lamps for industrial applications for semiconductor manufacture

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
FR7342353A 1972-11-29 1973-11-28 Expired FR2207757B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31044472A 1972-11-29 1972-11-29

Publications (2)

Publication Number Publication Date
FR2207757A2 true FR2207757A2 (en) 1974-06-21
FR2207757B2 FR2207757B2 (en) 1980-01-11

Family

ID=23202520

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7342353A Expired FR2207757B2 (en) 1972-11-29 1973-11-28

Country Status (5)

Country Link
JP (1) JPS508473A (en)
DE (1) DE2359004C3 (en)
FR (1) FR2207757B2 (en)
GB (1) GB1452076A (en)
NL (1) NL7316340A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2335043A1 (en) * 1975-12-11 1977-07-08 Phizichesky Inst Im Gas phase epitaxy process for semiconductor growth - using concentrated light source in purificn. and heating of substrate surface, suppressing diffusion
EP0104764A2 (en) * 1982-08-27 1984-04-04 Anicon, Inc. Chemical vapor deposition apparatus and process
FR2594529A1 (en) * 1986-02-19 1987-08-21 Bertin & Cie APPARATUS FOR THE THERMAL TREATMENT OF THIN PIECES, SUCH AS SILICON PLATES
EP0302490A2 (en) * 1987-08-05 1989-02-08 Joseph Thomas Burgio, Jr. Dryer-cooler apparatus

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5710240A (en) * 1980-06-20 1982-01-19 Sony Corp Forming method of insulating film
JPS5791526A (en) * 1980-11-28 1982-06-07 Fujitsu Ltd Heating method for substrate surface in vacuum container
JPS60105221A (en) * 1984-10-11 1985-06-10 Hitachi Ltd Gas phase wafer processing apparatus
JPS62227475A (en) * 1986-03-31 1987-10-06 Sekisui Chem Co Ltd Anticorrosion treatment using magnetic fluid

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3200018A (en) * 1962-01-29 1965-08-10 Hughes Aircraft Co Controlled epitaxial crystal growth by focusing electromagnetic radiation
US3623712A (en) * 1969-10-15 1971-11-30 Applied Materials Tech Epitaxial radiation heated reactor and process
FR2114105A5 (en) * 1970-11-16 1972-06-30 Applied Materials Techno Epitaxial radiation heated reactor - including a quartz reaction chamber

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2335043A1 (en) * 1975-12-11 1977-07-08 Phizichesky Inst Im Gas phase epitaxy process for semiconductor growth - using concentrated light source in purificn. and heating of substrate surface, suppressing diffusion
EP0104764A2 (en) * 1982-08-27 1984-04-04 Anicon, Inc. Chemical vapor deposition apparatus and process
EP0104764A3 (en) * 1982-08-27 1984-05-16 Anicon, Inc. Chemical vapor deposition apparatus and process
FR2594529A1 (en) * 1986-02-19 1987-08-21 Bertin & Cie APPARATUS FOR THE THERMAL TREATMENT OF THIN PIECES, SUCH AS SILICON PLATES
WO1987005054A1 (en) * 1986-02-19 1987-08-27 Bertin & Cie Apparatus for thermal treatments of thin parts such as silicon wafers
US4857704A (en) * 1986-02-19 1989-08-15 Bertin & Cie Apparatus for thermal treatments of thin parts such as silicon wafers
EP0302490A2 (en) * 1987-08-05 1989-02-08 Joseph Thomas Burgio, Jr. Dryer-cooler apparatus
EP0302490A3 (en) * 1987-08-05 1989-09-27 Joseph Thomas Burgio, Jr. Dryer-cooler apparatus

Also Published As

Publication number Publication date
FR2207757B2 (en) 1980-01-11
DE2359004A1 (en) 1974-06-06
DE2359004B2 (en) 1982-09-16
JPS508473A (en) 1975-01-28
NL7316340A (en) 1974-05-31
GB1452076A (en) 1976-10-06
DE2359004C3 (en) 1983-05-19

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