FR2185631A1 - - Google Patents

Info

Publication number
FR2185631A1
FR2185631A1 FR7242975A FR7242975A FR2185631A1 FR 2185631 A1 FR2185631 A1 FR 2185631A1 FR 7242975 A FR7242975 A FR 7242975A FR 7242975 A FR7242975 A FR 7242975A FR 2185631 A1 FR2185631 A1 FR 2185631A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7242975A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philip A Hunt Chemical Corp
Original Assignee
Philip A Hunt Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philip A Hunt Chemical Corp filed Critical Philip A Hunt Chemical Corp
Publication of FR2185631A1 publication Critical patent/FR2185631A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
FR7242975A 1972-05-23 1972-11-29 Withdrawn FR2185631A1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US25609772A 1972-05-23 1972-05-23

Publications (1)

Publication Number Publication Date
FR2185631A1 true FR2185631A1 (ja) 1974-01-04

Family

ID=22971094

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7242975A Withdrawn FR2185631A1 (ja) 1972-05-23 1972-11-29

Country Status (4)

Country Link
BE (1) BE793490A (ja)
DE (1) DE2312499A1 (ja)
FR (1) FR2185631A1 (ja)
GB (1) GB1367830A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2478641A1 (fr) * 1980-03-24 1981-09-25 Rhone Poulenc Ind Nouveaux photosensibilisateurs, leur procede d'obtention et leur utilisation dans des compositions photoresists
EP0101010A1 (de) * 1982-08-13 1984-02-22 Hoechst Aktiengesellschaft Wässrig-alkalische Lösing und Verfahren zum Entwickeln von positiv-arbeitenden Schichten

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4141733A (en) * 1977-10-25 1979-02-27 Eastman Kodak Company Development of light-sensitive quinone diazide compositions
JPS55127553A (en) * 1979-03-27 1980-10-02 Daicel Chem Ind Ltd Photosensitive composition
JPS55123614A (en) * 1979-03-16 1980-09-24 Daicel Chem Ind Ltd Photosensitive resin and positive type-photosensitive resin composition
JPS62149717A (ja) * 1979-03-16 1987-07-03 Daicel Chem Ind Ltd 感光性樹脂の製造方法
US4294911A (en) 1979-06-18 1981-10-13 Eastman Kodak Company Development of light-sensitive quinone diazide compositions using sulfite stabilizer
US4628023A (en) * 1981-04-10 1986-12-09 Shipley Company Inc. Metal ion free photoresist developer composition with lower alkyl quaternary ammonium hydrozide as alkalai agent and a quaternary ammonium compound as surfactant
US4423138A (en) 1982-01-21 1983-12-27 Eastman Kodak Company Resist developer with ammonium or phosphonium compound and method of use to develop o-quinone diazide and novolac resist
US4517276A (en) * 1982-11-29 1985-05-14 Varian Associates, Inc. Metal-containing organic photoresists
JPS59219743A (ja) * 1983-05-28 1984-12-11 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト現像液
DE3473359D1 (de) * 1983-06-29 1988-09-15 Fuji Photo Film Co Ltd Photosolubilizable composition
US4606999A (en) * 1983-12-21 1986-08-19 Thiokol Corporation Development of positive photoresists using cyclic quaternary ammonium hydroxides
US4603195A (en) * 1983-12-30 1986-07-29 International Business Machines Corporation Organosilicon compound and use thereof in photolithography
GB8403698D0 (en) * 1984-02-13 1984-03-14 British Telecomm Semiconductor device fabrication
JPS60237439A (ja) * 1984-04-26 1985-11-26 Oki Electric Ind Co Ltd レジスト材料及びそのレジストによる微細パタ−ン形成方法
US4791046A (en) * 1984-04-26 1988-12-13 Oki Electric Industry Co., Ltd. Process for forming mask patterns of positive type resist material with trimethylsilynitrile
JPH063549B2 (ja) * 1984-12-25 1994-01-12 株式会社東芝 ポジ型フォトレジスト現像液組成物
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US4784937A (en) * 1985-08-06 1988-11-15 Tokyo Ohka Kogyo Co., Ltd. Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant
JPS6232453A (ja) * 1985-08-06 1987-02-12 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト用現像液
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
JPH0772799B2 (ja) * 1986-08-13 1995-08-02 ソニー株式会社 レジスト材料
US5543268A (en) * 1992-05-14 1996-08-06 Tokyo Ohka Kogyo Co., Ltd. Developer solution for actinic ray-sensitive resist
US5378502A (en) * 1992-09-09 1995-01-03 U.S. Philips Corporation Method of chemically modifying a surface in accordance with a pattern
JP2007246417A (ja) 2006-03-14 2007-09-27 Canon Inc 感光性シランカップリング剤、表面修飾方法、パターン形成方法およびデバイスの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2478641A1 (fr) * 1980-03-24 1981-09-25 Rhone Poulenc Ind Nouveaux photosensibilisateurs, leur procede d'obtention et leur utilisation dans des compositions photoresists
EP0101010A1 (de) * 1982-08-13 1984-02-22 Hoechst Aktiengesellschaft Wässrig-alkalische Lösing und Verfahren zum Entwickeln von positiv-arbeitenden Schichten
WO1984000826A1 (en) * 1982-08-13 1984-03-01 Hoechst Ag Aqueous alkaline solution and method for developing positively working reproduction layers

Also Published As

Publication number Publication date
GB1367830A (en) 1974-09-25
BE793490A (fr) 1973-06-29
DE2312499A1 (de) 1973-12-06

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Legal Events

Date Code Title Description
ST Notification of lapse