FR2128728A1 - Junction diodes - contg a glass-type active layer - Google Patents
Junction diodes - contg a glass-type active layerInfo
- Publication number
- FR2128728A1 FR2128728A1 FR7208027A FR7208027A FR2128728A1 FR 2128728 A1 FR2128728 A1 FR 2128728A1 FR 7208027 A FR7208027 A FR 7208027A FR 7208027 A FR7208027 A FR 7208027A FR 2128728 A1 FR2128728 A1 FR 2128728A1
- Authority
- FR
- France
- Prior art keywords
- active layer
- glass
- contg
- type active
- junction diodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/043—Photoconductive layers characterised by having two or more layers or characterised by their composite structure
- G03G5/0433—Photoconductive layers characterised by having two or more layers or characterised by their composite structure all layers being inorganic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
- G03G5/08214—Silicon-based
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
- G03G5/08214—Silicon-based
- G03G5/08221—Silicon-based comprising one or two silicon based layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/085—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and being incorporated in an inorganic bonding material, e.g. glass-like layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/052—Light-emitting semiconductor devices having Schottky type light-emitting regions; Light emitting semiconductor devices having Metal-Insulator-Semiconductor type light-emitting regions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Light Receiving Elements (AREA)
- Photovoltaic Devices (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12242071A | 1971-03-09 | 1971-03-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2128728A1 true FR2128728A1 (en) | 1972-10-20 |
| FR2128728B1 FR2128728B1 (https=) | 1977-12-30 |
Family
ID=22402628
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7208027A Granted FR2128728A1 (en) | 1971-03-09 | 1972-03-08 | Junction diodes - contg a glass-type active layer |
Country Status (6)
| Country | Link |
|---|---|
| CA (1) | CA959177A (https=) |
| DE (1) | DE2211145B2 (https=) |
| FR (1) | FR2128728A1 (https=) |
| IL (1) | IL38901A (https=) |
| IT (1) | IT952931B (https=) |
| NL (1) | NL7202932A (https=) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3564353A (en) * | 1969-04-16 | 1971-02-16 | Westinghouse Electric Corp | Bulk semiconductor switching device formed from amorphous glass type substance and having symmetrical switching characteristics |
-
1972
- 1972-03-01 CA CA135,938A patent/CA959177A/en not_active Expired
- 1972-03-06 NL NL7202932A patent/NL7202932A/xx unknown
- 1972-03-06 IL IL38901A patent/IL38901A/xx unknown
- 1972-03-08 FR FR7208027A patent/FR2128728A1/fr active Granted
- 1972-03-08 DE DE2211145A patent/DE2211145B2/de not_active Withdrawn
- 1972-03-08 IT IT67730/72A patent/IT952931B/it active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3564353A (en) * | 1969-04-16 | 1971-02-16 | Westinghouse Electric Corp | Bulk semiconductor switching device formed from amorphous glass type substance and having symmetrical switching characteristics |
Non-Patent Citations (3)
| Title |
|---|
| (REVUE US:"CHEMICAL ABSTRACTS",VOL.73,NO 6,10 AOUT 1970,"RECTIFYING PROPERTIES OF JUNCTION BETWEEN VITREOUS T12SEAS2TE3 AND GE,SI AND INSB SINGLE CRYSTALS"B.T.KOLOMIETS ET AL.) * |
| BETWEEN VITREOUS T12SEAS2TE3 AND GE,SI AND INSB SINGLE CRYSTALS"B.T.KOLOMIETS ET AL.) * |
| REVUE US:"CHEMICAL ABSTRACTS",VOL.73,NO 6,10 AOUT 1970,"RECTIFYING PROPERTIES OF JUNCTION * |
Also Published As
| Publication number | Publication date |
|---|---|
| IT952931B (it) | 1973-07-30 |
| FR2128728B1 (https=) | 1977-12-30 |
| IL38901A0 (en) | 1972-05-30 |
| DE2211145A1 (de) | 1972-12-07 |
| IL38901A (en) | 1974-11-29 |
| CA959177A (en) | 1974-12-10 |
| NL7202932A (https=) | 1972-09-12 |
| DE2211145B2 (de) | 1979-02-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ES352038A1 (es) | Un metodo para producir una imagen grafica sobre una super-ficie de soporte. | |
| CA949683A (en) | Process for controlling the thickness of a thin layer of semiconductor material and semiconductor substrate | |
| FR2128728A1 (en) | Junction diodes - contg a glass-type active layer | |
| ES374056A1 (es) | Dispositivo de barrera de pontencial. | |
| CA959974A (en) | Glass switching device using an ion impermeable glass active layer | |
| CA948075A (en) | Method of depositing a layer of semiconductor material | |
| GB1208030A (en) | A semiconductor device | |
| GB1099049A (en) | A method of manufacturing transistors | |
| FR2172200B1 (https=) | ||
| AU1774570A (en) | A process for making semiconductor devices having minimum surface unevenesses, and semiconductor devices produced by said process | |
| CA666506A (en) | Process of providing a thin coherent layer on a luminescent layer in a cathode-ray tube | |
| GB1027841A (en) | Improvements relating to pick-up tubes having photo-conductive or semi-conductive targets | |
| CA742381A (en) | Method of making thin layer semiconductor devices | |
| CA851398A (en) | Method of accurately doping a semiconductor material layer | |
| AU2590467A (en) | SEMICONDUCTOR DEVICE HAVING AT LEAST ONE CONTACT APPLIED TO A SEMICONDUCTOR MATERIAL OF THE TYPE Aii Bvi AND METHOD OF MANUFACTURING SUCH A DEVICE | |
| CA789749A (en) | Epitaxial semiconductor layer as a diffusion mask | |
| CA814096A (en) | Encapsulation of doped oxide layers on semiconductors | |
| JPS53121582A (en) | Semiconductor memory unit and its manufacture | |
| CA853154A (en) | Localised diffusion of doping material into a semiconductor surface | |
| CA852177A (en) | Localised diffusion of doping material into a semiconductor surface | |
| CA812343A (en) | Method of and device for manufacturing electron tubes having a photo-sensitive layer | |
| CA886236A (en) | Semiconductor devices and fabricating techniques | |
| AU448603B2 (en) | Process for controlling the thickness ofa thin layer of semiconductor material and semiconductor substrate | |
| AU436391B2 (en) | Semiconductor device etching process and etching composition | |
| CA887612A (en) | Semiconductor device etching process and etching composition |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |