FR2123241A1 - - Google Patents
Info
- Publication number
- FR2123241A1 FR2123241A1 FR7121311A FR7121311A FR2123241A1 FR 2123241 A1 FR2123241 A1 FR 2123241A1 FR 7121311 A FR7121311 A FR 7121311A FR 7121311 A FR7121311 A FR 7121311A FR 2123241 A1 FR2123241 A1 FR 2123241A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/788—Field effect transistors with field effect produced by an insulated gate with floating gate
- H01L29/7881—Programmable transistors with only two possible levels of programmation
- H01L29/7884—Programmable transistors with only two possible levels of programmation charging by hot carrier injection
- H01L29/7886—Hot carrier produced by avalanche breakdown of a PN junction, e.g. FAMOS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/07—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
- H01L27/0705—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
- H01L27/0711—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with bipolar transistors and diodes, or capacitors, or resistors
- H01L27/0716—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with bipolar transistors and diodes, or capacitors, or resistors in combination with vertical bipolar transistors and diodes, or capacitors, or resistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Non-Volatile Memory (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4614870A | 1970-06-15 | 1970-06-15 | |
US10664271A | 1971-01-15 | 1971-01-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2123241A1 true FR2123241A1 (fr) | 1972-09-08 |
FR2123241B1 FR2123241B1 (fr) | 1976-02-06 |
Family
ID=26723617
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7121311A Expired FR2123241B1 (fr) | 1970-06-15 | 1971-06-11 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3755721A (fr) |
JP (1) | JPS5131073B1 (fr) |
CA (1) | CA950128A (fr) |
FR (1) | FR2123241B1 (fr) |
GB (1) | GB1357444A (fr) |
NL (1) | NL154364B (fr) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS525233B2 (fr) * | 1972-02-29 | 1977-02-10 | ||
NL7208026A (fr) * | 1972-06-13 | 1973-12-17 | ||
US3868187A (en) * | 1972-08-31 | 1975-02-25 | Tokyo Shibaura Electric Co | Avalanche injection type mos memory |
US3836992A (en) * | 1973-03-16 | 1974-09-17 | Ibm | Electrically erasable floating gate fet memory cell |
JPS5024084A (fr) * | 1973-07-05 | 1975-03-14 | ||
JPS532552B2 (fr) * | 1974-03-30 | 1978-01-28 | ||
JPS5513433B2 (fr) * | 1974-08-29 | 1980-04-09 | ||
NL7500550A (nl) * | 1975-01-17 | 1976-07-20 | Philips Nv | Halfgeleider-geheugeninrichting. |
US4119995A (en) * | 1976-08-23 | 1978-10-10 | Intel Corporation | Electrically programmable and electrically erasable MOS memory cell |
US4107721A (en) * | 1977-01-26 | 1978-08-15 | Bell Telephone Laboratories, Incorporated | Phototransistor |
US4357571A (en) * | 1978-09-29 | 1982-11-02 | Siemens Aktiengesellschaft | FET Module with reference source chargeable memory gate |
US4247861A (en) * | 1979-03-09 | 1981-01-27 | Rca Corporation | High performance electrically alterable read-only memory (EAROM) |
EP0021777B1 (fr) * | 1979-06-18 | 1983-10-19 | Fujitsu Limited | Dispositif semi-conducteur de mémoire non volatile |
US4331968A (en) * | 1980-03-17 | 1982-05-25 | Mostek Corporation | Three layer floating gate memory transistor with erase gate over field oxide region |
US4363109A (en) * | 1980-11-28 | 1982-12-07 | General Motors Corporation | Capacitance coupled eeprom |
JPS61199833U (fr) * | 1985-06-04 | 1986-12-13 | ||
GB2284031B (en) * | 1987-11-27 | 1995-11-08 | Gen Electric | Composite fastener |
US5065364A (en) * | 1989-09-15 | 1991-11-12 | Intel Corporation | Apparatus for providing block erasing in a flash EPROM |
JP3454520B2 (ja) * | 1990-11-30 | 2003-10-06 | インテル・コーポレーション | フラッシュ記憶装置の書込み状態を確認する回路及びその方法 |
US5218569A (en) | 1991-02-08 | 1993-06-08 | Banks Gerald J | Electrically alterable non-volatile memory with n-bits per memory cell |
US6002614A (en) | 1991-02-08 | 1999-12-14 | Btg International Inc. | Memory apparatus including programmable non-volatile multi-bit memory cell, and apparatus and method for demarcating memory states of the cell |
US5295113A (en) * | 1991-05-09 | 1994-03-15 | Intel Corporation | Flash memory source inhibit generator |
ATE238610T1 (de) * | 1994-03-03 | 2003-05-15 | Rohm Corp | Niederspannungs-eintransistor-flash-eeprom-zell mit fowler-nordheim programmier- und löschung |
US6353554B1 (en) * | 1995-02-27 | 2002-03-05 | Btg International Inc. | Memory apparatus including programmable non-volatile multi-bit memory cell, and apparatus and method for demarcating memory states of the cell |
KR100241524B1 (ko) * | 1996-12-28 | 2000-02-01 | 김영환 | 플래쉬 메모리 셀 |
US6518618B1 (en) | 1999-12-03 | 2003-02-11 | Intel Corporation | Integrated memory cell and method of fabrication |
US6829814B1 (en) * | 2002-08-29 | 2004-12-14 | Delphi Technologies, Inc. | Process of making an all-silicon microphone |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3264493A (en) * | 1963-10-01 | 1966-08-02 | Fairchild Camera Instr Co | Semiconductor circuit module for a high-gain, high-input impedance amplifier |
FR1559352A (fr) * | 1967-03-27 | 1969-03-07 | ||
US3500142A (en) * | 1967-06-05 | 1970-03-10 | Bell Telephone Labor Inc | Field effect semiconductor apparatus with memory involving entrapment of charge carriers |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3060327A (en) * | 1959-07-02 | 1962-10-23 | Bell Telephone Labor Inc | Transistor having emitter reversebiased beyond breakdown and collector forward-biased for majority carrier operation |
DE1228343B (de) * | 1963-10-22 | 1966-11-10 | Siemens Ag | Steuerbare Halbleiterdiode mit stellenweise negativer Strom-Spannungs-Kennlinie |
US3339086A (en) * | 1964-06-11 | 1967-08-29 | Itt | Surface controlled avalanche transistor |
US3401319A (en) * | 1966-03-08 | 1968-09-10 | Gen Micro Electronics Inc | Integrated latch circuit |
CA813537A (en) * | 1967-10-17 | 1969-05-20 | Joseph H. Scott, Jr. | Semiconductor memory device |
US3577210A (en) * | 1969-02-17 | 1971-05-04 | Hughes Aircraft Co | Solid-state storage device |
-
1971
- 1971-01-15 US US00106642A patent/US3755721A/en not_active Expired - Lifetime
- 1971-06-09 GB GB1977471*[A patent/GB1357444A/en not_active Expired
- 1971-06-11 FR FR7121311A patent/FR2123241B1/fr not_active Expired
- 1971-06-14 NL NL717108097A patent/NL154364B/xx unknown
- 1971-06-14 JP JP46041744A patent/JPS5131073B1/ja active Pending
- 1971-06-15 CA CA115,644A patent/CA950128A/en not_active Expired
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3264493A (en) * | 1963-10-01 | 1966-08-02 | Fairchild Camera Instr Co | Semiconductor circuit module for a high-gain, high-input impedance amplifier |
FR1559352A (fr) * | 1967-03-27 | 1969-03-07 | ||
US3500142A (en) * | 1967-06-05 | 1970-03-10 | Bell Telephone Labor Inc | Field effect semiconductor apparatus with memory involving entrapment of charge carriers |
Non-Patent Citations (6)
Title |
---|
(REVUE AMERICAINE"ELECTRONICS"VOLUME 44,10 MAI 1971,PAGES 91-95:"ROM CAN BE ELECTRICALLY PROGRAMMED AND REPROGRAMMED AND REPROGRAMMED D.F.BENTCHKOWSKY * |
CHARGE STORAGE EFFECT"H.G.DILL ET AL.) * |
PROGRAMMED AND REPROGRAMMED AND REPROGRAMMED D.F.BENTCHKOWSKY * |
REVUE AMERICAINE"ELECTRONICS"VOLUME 44,10 MAI 1971,PAGES 91-95:"ROM CAN BE ELECTRICALLY * |
REVUE INTERNATIONALE"SOLIDSTATE ELECTRONICS"VOLUME 12,DECEMBRE 1969 PAGES 981-987"A NEW MNOS * |
REVUE INTERNATIONALE"SOLIDSTATE ELECTRONICS"VOLUME 12,DECEMBRE 1969 PAGES 981-987"A NEW MNOS CHARGE STORAGE EFFECT"H.G.DILL ET AL.) * |
Also Published As
Publication number | Publication date |
---|---|
JPS5131073B1 (fr) | 1976-09-04 |
NL7108097A (fr) | 1971-12-17 |
DE2129181A1 (de) | 1971-12-23 |
FR2123241B1 (fr) | 1976-02-06 |
DE2129181B2 (de) | 1977-05-12 |
CA950128A (en) | 1974-06-25 |
NL154364B (nl) | 1977-08-15 |
US3755721A (en) | 1973-08-28 |
GB1357444A (en) | 1974-06-19 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |