FR2122169A5 - - Google Patents

Info

Publication number
FR2122169A5
FR2122169A5 FR7200716A FR7200716A FR2122169A5 FR 2122169 A5 FR2122169 A5 FR 2122169A5 FR 7200716 A FR7200716 A FR 7200716A FR 7200716 A FR7200716 A FR 7200716A FR 2122169 A5 FR2122169 A5 FR 2122169A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7200716A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of FR2122169A5 publication Critical patent/FR2122169A5/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/30—Polysulfonamides; Polysulfonimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polyamides (AREA)
FR7200716A 1971-01-14 1972-01-11 Expired FR2122169A5 (Direct)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB183471 1971-01-14

Publications (1)

Publication Number Publication Date
FR2122169A5 true FR2122169A5 (Direct) 1972-08-25

Family

ID=9728821

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7200716A Expired FR2122169A5 (Direct) 1971-01-14 1972-01-11

Country Status (2)

Country Link
FR (1) FR2122169A5 (Direct)
GB (1) GB1335095A (Direct)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4107155A (en) 1977-06-29 1978-08-15 Eastman Kodak Company Polysulfonamides
US4865950A (en) * 1988-01-21 1989-09-12 Eastman Kodak Co. Laminate for the formation of beam leads for IC chip bonding featuring improved positive-working resist
KR100225956B1 (ko) * 1997-01-10 1999-10-15 김영환 아민을 도입한 에이알에프 감광막 수지
KR100321080B1 (ko) 1997-12-29 2002-11-22 주식회사 하이닉스반도체 공중합체수지와이의제조방법및이수지를이용한포토레지스트
KR20000015014A (ko) 1998-08-26 2000-03-15 김영환 신규의 포토레지스트용 단량체, 중합체 및 이를 이용한 포토레지스트 조성물
JP3587743B2 (ja) 1998-08-26 2004-11-10 株式会社ハイニックスセミコンダクター フォトレジスト単量体とその製造方法、フォトレジスト共重合体とその製造方法、フォトレジスト組成物、フォトレジストパターン形成方法、および、半導体素子。
US6569971B2 (en) 1998-08-27 2003-05-27 Hyundai Electronics Industries Co., Ltd. Polymers for photoresist and photoresist compositions using the same
JP2012073612A (ja) * 2010-09-14 2012-04-12 Rohm & Haas Electronic Materials Llc マルチアミド成分を含むフォトレジスト
KR102328686B1 (ko) * 2016-05-12 2021-11-19 노우록키 다니엘 제이. 폴리술폰아미드 재분배 조성물 및 이의 사용 방법

Also Published As

Publication number Publication date
GB1335095A (en) 1973-10-24

Similar Documents

Publication Publication Date Title
ATA136472A (Direct)
AR196074A1 (Direct)
AU2658571A (Direct)
AU2691671A (Direct)
AU2742671A (Direct)
AU2941471A (Direct)
AU2564071A (Direct)
AU2726271A (Direct)
AU2952271A (Direct)
AU2684071A (Direct)
AU2894671A (Direct)
AU3005371A (Direct)
AU2485671A (Direct)
AU2684171A (Direct)
AU2837671A (Direct)
AU2503871A (Direct)
AU2486471A (Direct)
AU2577671A (Direct)
AU2588771A (Direct)
AU2654071A (Direct)
AU3038671A (Direct)
AU2669471A (Direct)
AU2456871A (Direct)
AU2885171A (Direct)
AU2455871A (Direct)

Legal Events

Date Code Title Description
ST Notification of lapse