FR2106022A5 - - Google Patents

Info

Publication number
FR2106022A5
FR2106022A5 FR7130831A FR7130831A FR2106022A5 FR 2106022 A5 FR2106022 A5 FR 2106022A5 FR 7130831 A FR7130831 A FR 7130831A FR 7130831 A FR7130831 A FR 7130831A FR 2106022 A5 FR2106022 A5 FR 2106022A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7130831A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of FR2106022A5 publication Critical patent/FR2106022A5/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
FR7130831A 1970-08-27 1971-08-25 Expired FR2106022A5 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7012671A NL7012671A (enExample) 1970-08-27 1970-08-27

Publications (1)

Publication Number Publication Date
FR2106022A5 true FR2106022A5 (enExample) 1972-04-28

Family

ID=19810865

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7130831A Expired FR2106022A5 (enExample) 1970-08-27 1971-08-25

Country Status (6)

Country Link
US (1) US3777211A (enExample)
CA (1) CA946985A (enExample)
DE (1) DE2138766A1 (enExample)
FR (1) FR2106022A5 (enExample)
GB (1) GB1367940A (enExample)
NL (1) NL7012671A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022258893A1 (fr) 2021-06-08 2022-12-15 Psa Automobiles Sa Sous-ensemble compact pour groupe electromoteur de vehicules automobiles

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4376249A (en) * 1980-11-06 1983-03-08 International Business Machines Corporation Variable axis electron beam projection system
DE3138896A1 (de) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Elektronenoptisches system mit vario-formstrahl zur erzeugung und messung von mikrostrukturen
US5949076A (en) * 1996-02-26 1999-09-07 Kabushiki Kaisha Toshiba Charged beam applying apparatus
JP2004534360A (ja) * 2001-06-15 2004-11-11 株式会社荏原製作所 電子線装置及びその電子線装置を用いたデバイスの製造方法
EP1401007B1 (en) * 2002-09-18 2005-06-15 Staib Instrumente GmbH An electron diffraction system for use in production environment and for high pressure deposition techniques
US8110814B2 (en) 2003-10-16 2012-02-07 Alis Corporation Ion sources, systems and methods
US7786451B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US9159527B2 (en) 2003-10-16 2015-10-13 Carl Zeiss Microscopy, Llc Systems and methods for a gas field ionization source
US7786452B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US7804068B2 (en) 2006-11-15 2010-09-28 Alis Corporation Determining dopant information
EP2342734A2 (en) * 2008-09-30 2011-07-13 Carl Zeiss NTS, LLC. Aligning charged particle beams
US8525133B2 (en) * 2009-11-10 2013-09-03 Mitsubishi Electric Corporation Particle beam irradiation system and particle beam irradiation method
JP5364112B2 (ja) * 2011-01-25 2013-12-11 株式会社日立ハイテクノロジーズ 荷電粒子線装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2418349A (en) * 1945-12-13 1947-04-01 Rca Corp Method of and means for correcting for distortion in electron lens systems
GB687207A (en) * 1950-02-23 1953-02-11 Vickers Electrical Co Ltd Improvements relating to electron microscopes
US3371206A (en) * 1964-02-04 1968-02-27 Jeol Ltd Electron beam apparatus having compensating means for triangular beam distortion
DE1299088C2 (de) * 1966-06-10 1974-10-17 Siemens AG, Berlin und München, 8000 München Ablenkeinrichtung fuer den korpuskularstrahl in einem korpuskularstrahlgeraet, insbesondere elektronenmikroskop
US3588586A (en) * 1968-04-26 1971-06-28 Jeol Ltd Apparatus for correcting electron beam deflection

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022258893A1 (fr) 2021-06-08 2022-12-15 Psa Automobiles Sa Sous-ensemble compact pour groupe electromoteur de vehicules automobiles

Also Published As

Publication number Publication date
NL7012671A (enExample) 1972-02-29
CA946985A (en) 1974-05-07
DE2138766A1 (de) 1972-03-02
GB1367940A (en) 1974-09-25
US3777211A (en) 1973-12-04

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Legal Events

Date Code Title Description
ST Notification of lapse