FR2092896A1 - Epitaxial film growth - of semiconducting material, by decomposition of organo metallic cpds - Google Patents
Epitaxial film growth - of semiconducting material, by decomposition of organo metallic cpdsInfo
- Publication number
- FR2092896A1 FR2092896A1 FR7024045A FR7024045A FR2092896A1 FR 2092896 A1 FR2092896 A1 FR 2092896A1 FR 7024045 A FR7024045 A FR 7024045A FR 7024045 A FR7024045 A FR 7024045A FR 2092896 A1 FR2092896 A1 FR 2092896A1
- Authority
- FR
- France
- Prior art keywords
- decomposition
- group
- iii
- cpds
- epitaxial film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P14/24—
-
- H10P14/2921—
-
- H10P14/3414—
-
- H10P14/3421—
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7024045A FR2092896A1 (en) | 1970-06-29 | 1970-06-29 | Epitaxial film growth - of semiconducting material, by decomposition of organo metallic cpds |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7024045A FR2092896A1 (en) | 1970-06-29 | 1970-06-29 | Epitaxial film growth - of semiconducting material, by decomposition of organo metallic cpds |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2092896A1 true FR2092896A1 (en) | 1972-01-28 |
| FR2092896B1 FR2092896B1 (enExample) | 1974-05-24 |
Family
ID=9057981
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7024045A Granted FR2092896A1 (en) | 1970-06-29 | 1970-06-29 | Epitaxial film growth - of semiconducting material, by decomposition of organo metallic cpds |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2092896A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2419585A1 (fr) * | 1978-03-07 | 1979-10-05 | Thomson Csf | Procede d'obtention en phase gazeuse d'une couche epitaxiale de phosphure d'indium, et appareil d'application de ce procede |
| US4247359A (en) * | 1978-10-30 | 1981-01-27 | Honeywell Inc. | Preparation of epitaxial rare earth thin films |
| MD4510C1 (ro) * | 2016-06-23 | 2018-03-31 | Государственный Университет Молд0 | Procedeu de creştere a structurii n+-p-p+ InP pentru celule solare |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3364084A (en) * | 1959-06-18 | 1968-01-16 | Monsanto Co | Production of epitaxial films |
| FR1572873A (enExample) * | 1967-07-26 | 1969-06-27 |
-
1970
- 1970-06-29 FR FR7024045A patent/FR2092896A1/fr active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3364084A (en) * | 1959-06-18 | 1968-01-16 | Monsanto Co | Production of epitaxial films |
| FR1572873A (enExample) * | 1967-07-26 | 1969-06-27 |
Non-Patent Citations (3)
| Title |
|---|
| (REVUE AMERICAINE:"JO * |
| *REVUE AMERICAINE"JOURNAL OF THE ELECTROCHEMICAL SOCIETY",VOLUME 116,NO.12,DECEMBRE 1969."THE USE OF METAL-ORGANICS IN THE PREPARATION OF SEMICONDUCTOR MATERIALS:I.EPITAXIAL GALLIUM-V COMPOUNDS H.M.MANASEVIT AND W.I.SIMPSON.PAGES 1725-1732.PAGES 1725,COLONNE 2,ALINEA 2-PAGE 1726,COLONNE 2,ALINEA 5 DEPOT EPITAXIAL DE GAAS,GAP,GAAS1-XPX,GAAS1-XSBX SUR UN SUBSTRAT ISOLANT MONOCRISTALLIN CHOISI PARMI AL 203,MGAL 204,BE0,TH02 AUSEMIISOLANT GAAS A PARTIR DES HYDRURES DES COMPOSANTS DU GROUPE V,DE TRIMETHYL OUTRIETHYLGALLIUM ET DE SUBSTANCES DOPANTES:LES HYDRURES ETANT INTRODUITS DANS L'ENCEINTEREACTIONNELLE AVANT LES DERIVES ALKYLES.) * |
| DE ALAS,ALP OU GAXAL1-XAS DEPOSEE PAR EPITAXIE A PARTIR D'UNE PHASE GAZEUSE CONTENANT DEL'ARSINE OU DE LA PHOSPHINE EN EXCES ET DU TRIMETHYLALUMINIUM OU UN MELANGE DETRIMETHYLALUMINIUM ET DE TRIMETHYLGALLIUM.CERTAINS DOPANTS PEUVENT ETRE AJOUTES A LA PHASEGAZEUSE VOIR FIGURE 1 . * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2419585A1 (fr) * | 1978-03-07 | 1979-10-05 | Thomson Csf | Procede d'obtention en phase gazeuse d'une couche epitaxiale de phosphure d'indium, et appareil d'application de ce procede |
| US4247359A (en) * | 1978-10-30 | 1981-01-27 | Honeywell Inc. | Preparation of epitaxial rare earth thin films |
| MD4510C1 (ro) * | 2016-06-23 | 2018-03-31 | Государственный Университет Молд0 | Procedeu de creştere a structurii n+-p-p+ InP pentru celule solare |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2092896B1 (enExample) | 1974-05-24 |
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