FR2092896A1 - Epitaxial film growth - of semiconducting material, by decomposition of organo metallic cpds - Google Patents

Epitaxial film growth - of semiconducting material, by decomposition of organo metallic cpds

Info

Publication number
FR2092896A1
FR2092896A1 FR7024045A FR7024045A FR2092896A1 FR 2092896 A1 FR2092896 A1 FR 2092896A1 FR 7024045 A FR7024045 A FR 7024045A FR 7024045 A FR7024045 A FR 7024045A FR 2092896 A1 FR2092896 A1 FR 2092896A1
Authority
FR
France
Prior art keywords
decomposition
group
iii
cpds
epitaxial film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7024045A
Other languages
English (en)
French (fr)
Other versions
FR2092896B1 (enExample
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Boeing North American Inc
Original Assignee
North American Rockwell Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by North American Rockwell Corp filed Critical North American Rockwell Corp
Priority to FR7024045A priority Critical patent/FR2092896A1/fr
Publication of FR2092896A1 publication Critical patent/FR2092896A1/fr
Application granted granted Critical
Publication of FR2092896B1 publication Critical patent/FR2092896B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H10P14/24
    • H10P14/2921
    • H10P14/3414
    • H10P14/3421

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
FR7024045A 1970-06-29 1970-06-29 Epitaxial film growth - of semiconducting material, by decomposition of organo metallic cpds Granted FR2092896A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7024045A FR2092896A1 (en) 1970-06-29 1970-06-29 Epitaxial film growth - of semiconducting material, by decomposition of organo metallic cpds

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7024045A FR2092896A1 (en) 1970-06-29 1970-06-29 Epitaxial film growth - of semiconducting material, by decomposition of organo metallic cpds

Publications (2)

Publication Number Publication Date
FR2092896A1 true FR2092896A1 (en) 1972-01-28
FR2092896B1 FR2092896B1 (enExample) 1974-05-24

Family

ID=9057981

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7024045A Granted FR2092896A1 (en) 1970-06-29 1970-06-29 Epitaxial film growth - of semiconducting material, by decomposition of organo metallic cpds

Country Status (1)

Country Link
FR (1) FR2092896A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2419585A1 (fr) * 1978-03-07 1979-10-05 Thomson Csf Procede d'obtention en phase gazeuse d'une couche epitaxiale de phosphure d'indium, et appareil d'application de ce procede
US4247359A (en) * 1978-10-30 1981-01-27 Honeywell Inc. Preparation of epitaxial rare earth thin films
MD4510C1 (ro) * 2016-06-23 2018-03-31 Государственный Университет Молд0 Procedeu de creştere a structurii n+-p-p+ InP pentru celule solare

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3364084A (en) * 1959-06-18 1968-01-16 Monsanto Co Production of epitaxial films
FR1572873A (enExample) * 1967-07-26 1969-06-27

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3364084A (en) * 1959-06-18 1968-01-16 Monsanto Co Production of epitaxial films
FR1572873A (enExample) * 1967-07-26 1969-06-27

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
(REVUE AMERICAINE:"JO *
*REVUE AMERICAINE"JOURNAL OF THE ELECTROCHEMICAL SOCIETY",VOLUME 116,NO.12,DECEMBRE 1969."THE USE OF METAL-ORGANICS IN THE PREPARATION OF SEMICONDUCTOR MATERIALS:I.EPITAXIAL GALLIUM-V COMPOUNDS H.M.MANASEVIT AND W.I.SIMPSON.PAGES 1725-1732.PAGES 1725,COLONNE 2,ALINEA 2-PAGE 1726,COLONNE 2,ALINEA 5 DEPOT EPITAXIAL DE GAAS,GAP,GAAS1-XPX,GAAS1-XSBX SUR UN SUBSTRAT ISOLANT MONOCRISTALLIN CHOISI PARMI AL 203,MGAL 204,BE0,TH02 AUSEMIISOLANT GAAS A PARTIR DES HYDRURES DES COMPOSANTS DU GROUPE V,DE TRIMETHYL OUTRIETHYLGALLIUM ET DE SUBSTANCES DOPANTES:LES HYDRURES ETANT INTRODUITS DANS L'ENCEINTEREACTIONNELLE AVANT LES DERIVES ALKYLES.) *
DE ALAS,ALP OU GAXAL1-XAS DEPOSEE PAR EPITAXIE A PARTIR D'UNE PHASE GAZEUSE CONTENANT DEL'ARSINE OU DE LA PHOSPHINE EN EXCES ET DU TRIMETHYLALUMINIUM OU UN MELANGE DETRIMETHYLALUMINIUM ET DE TRIMETHYLGALLIUM.CERTAINS DOPANTS PEUVENT ETRE AJOUTES A LA PHASEGAZEUSE VOIR FIGURE 1 . *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2419585A1 (fr) * 1978-03-07 1979-10-05 Thomson Csf Procede d'obtention en phase gazeuse d'une couche epitaxiale de phosphure d'indium, et appareil d'application de ce procede
US4247359A (en) * 1978-10-30 1981-01-27 Honeywell Inc. Preparation of epitaxial rare earth thin films
MD4510C1 (ro) * 2016-06-23 2018-03-31 Государственный Университет Молд0 Procedeu de creştere a structurii n+-p-p+ InP pentru celule solare

Also Published As

Publication number Publication date
FR2092896B1 (enExample) 1974-05-24

Similar Documents

Publication Publication Date Title
US3433684A (en) Multilayer semiconductor heteroepitaxial structure
NL168892B (nl) Werkwijze voor het onder verminderde druk doen groeien van een epitaxiale dunne laag van een verbinding van het type iii(a) - v(a) van het periodiek systeem der elementen en halfgeleiderinrichting, verkregen onder toepassing van deze werkwijze.
GB1469978A (en) Methods of producing semiconductor devices
GB1319311A (en) Epitaxial composite and method of making
GB719873A (en) Improvements in or relating to electric semi-conductor devices and processes for their production
GB1283793A (en) Depositing successive epitaxial semiconductive layers from the liquid phase
GB1468948A (en) Deposition of solid compositions and semiconductor materials
GB974750A (en) Improvements in forming semiconductor devices
GB1528192A (en) Surface treatment of iii-v compound crystals
GB1414254A (en) Epitaxial growth of semiconductor material from the liquid phase
FR2092896A1 (en) Epitaxial film growth - of semiconducting material, by decomposition of organo metallic cpds
GB1355852A (en) Growing semiconductor crystals
GB1432877A (en) Substrates of compound semiconductors
GB929559A (en) Method of growing epitaxial semiconductor layers
GB1227985A (enExample)
GB1255576A (en) Improvements in or relating to the production of epitaxially grown layers of semiconductor material
GB1190992A (en) Improved method of Depositing Semiconductor Material
FR2151171A5 (en) Epitaxial gallium aluminium arsenide layer - from liquid phase soln of aluminium arsenide in gallium
GB1273188A (en) Improvements in or relating to the production of semiconductor arrangements
GB1416005A (en) Method of manufacturing a gallium phsophide red-emitting device
GB1002528A (en) Manufacture of semiconductive bodies
GB1243295A (en) Improvements in or relating to the production of thin monocrystalline semiconductor layers
GB1239893A (en) Improvements in or relating to photocathodes
GB1027159A (en) Improvements in or relating to processes for the production of ribbon-shaped dendrites of semiconductor material
DYACHKOVA et al. Effect of substrate temperature and silicon content in arsenic (3) chloride on the properties of epitaxial layers of gallium arsenide grown from the gas phase(Influence of substrate temperature on properties of epitaxial layers of GaAs during growth)