FR2075059A5 - - Google Patents
Info
- Publication number
- FR2075059A5 FR2075059A5 FR7045865A FR7045865A FR2075059A5 FR 2075059 A5 FR2075059 A5 FR 2075059A5 FR 7045865 A FR7045865 A FR 7045865A FR 7045865 A FR7045865 A FR 7045865A FR 2075059 A5 FR2075059 A5 FR 2075059A5
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19702004184 DE2004184C3 (de) | 1970-01-30 | Verfahren und Vorrichtung zum Aufdampfen von Metallen oder Metallverbindungen auf einem Träger im Vakuum mit Hilfe einer Elektronenstrahlkanone |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR2075059A5 true FR2075059A5 (cg-RX-API-DMAC7.html) | 1971-10-08 |
Family
ID=5760947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7045865A Expired FR2075059A5 (cg-RX-API-DMAC7.html) | 1970-01-30 | 1970-12-18 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5123950B1 (cg-RX-API-DMAC7.html) |
| CH (1) | CH544157A (cg-RX-API-DMAC7.html) |
| FR (1) | FR2075059A5 (cg-RX-API-DMAC7.html) |
| GB (1) | GB1334599A (cg-RX-API-DMAC7.html) |
| NL (1) | NL7101237A (cg-RX-API-DMAC7.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0160479A3 (en) * | 1984-04-24 | 1988-03-30 | Hitachi, Ltd. | Method and apparatus for forming a thin film |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2264718B (en) * | 1992-03-04 | 1995-04-26 | Univ Hull | Coatings produced by vapour deposition |
| CN112119108B (zh) | 2018-05-21 | 2022-10-28 | 旭化成株式会社 | 聚碳酸酯二醇 |
-
1970
- 1970-11-09 JP JP9797470A patent/JPS5123950B1/ja active Pending
- 1970-12-16 CH CH1862970A patent/CH544157A/de not_active IP Right Cessation
- 1970-12-18 FR FR7045865A patent/FR2075059A5/fr not_active Expired
-
1971
- 1971-01-29 NL NL7101237A patent/NL7101237A/xx unknown
- 1971-04-19 GB GB2022771A patent/GB1334599A/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0160479A3 (en) * | 1984-04-24 | 1988-03-30 | Hitachi, Ltd. | Method and apparatus for forming a thin film |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1334599A (en) | 1973-10-24 |
| NL7101237A (cg-RX-API-DMAC7.html) | 1971-08-03 |
| CH544157A (de) | 1973-11-15 |
| JPS5123950B1 (cg-RX-API-DMAC7.html) | 1976-07-20 |
| DE2004184A1 (de) | 1971-08-05 |
| DE2004184B2 (de) | 1975-07-03 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |