FR2062402A5 - - Google Patents

Info

Publication number
FR2062402A5
FR2062402A5 FR7034073A FR7034073A FR2062402A5 FR 2062402 A5 FR2062402 A5 FR 2062402A5 FR 7034073 A FR7034073 A FR 7034073A FR 7034073 A FR7034073 A FR 7034073A FR 2062402 A5 FR2062402 A5 FR 2062402A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7034073A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales Optronics Ltd
Original Assignee
Thales Optronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thales Optronics Ltd filed Critical Thales Optronics Ltd
Application granted granted Critical
Publication of FR2062402A5 publication Critical patent/FR2062402A5/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR7034073A 1969-09-19 1970-09-21 Expired FR2062402A5 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4618569A GB1263582A (en) 1969-09-19 1969-09-19 Improvements in or relating to thin film deposition

Publications (1)

Publication Number Publication Date
FR2062402A5 true FR2062402A5 (de) 1971-06-25

Family

ID=10440203

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7034073A Expired FR2062402A5 (de) 1969-09-19 1970-09-21

Country Status (5)

Country Link
CH (1) CH532128A (de)
DE (1) DE2045198B2 (de)
FR (1) FR2062402A5 (de)
GB (1) GB1263582A (de)
NL (1) NL141582B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4061800A (en) * 1975-02-06 1977-12-06 Applied Materials, Inc. Vapor desposition method
DE3518197A1 (de) * 1985-05-21 1986-11-27 Heinrich 7413 Gomaringen Grünwald Verfahren zur entfernung von metallionen aus koerpern aus glas, keramischen werkstoffen und sonstigen amorphen werkstoffen sowie kristallinen werkstoffen
EP0845151A1 (de) * 1996-05-09 1998-06-03 Applied Materials, Inc. Versenkte spule zur plasmaerzeugung
US6254746B1 (en) 1996-05-09 2001-07-03 Applied Materials, Inc. Recessed coil for generating a plasma

Also Published As

Publication number Publication date
CH532128A (de) 1972-12-31
NL7013403A (de) 1971-03-23
NL141582B (nl) 1974-03-15
DE2045198A1 (de) 1971-04-01
GB1263582A (en) 1972-02-09
DE2045198B2 (de) 1972-06-22

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Legal Events

Date Code Title Description
ST Notification of lapse