FR1602787A - - Google Patents

Info

Publication number
FR1602787A
FR1602787A FR1602787DA FR1602787A FR 1602787 A FR1602787 A FR 1602787A FR 1602787D A FR1602787D A FR 1602787DA FR 1602787 A FR1602787 A FR 1602787A
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of FR1602787A publication Critical patent/FR1602787A/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR1602787D 1968-03-25 1968-12-30 Expired FR1602787A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US71580468A 1968-03-25 1968-03-25

Publications (1)

Publication Number Publication Date
FR1602787A true FR1602787A (fr) 1971-01-25

Family

ID=24875552

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1602787D Expired FR1602787A (fr) 1968-03-25 1968-12-30

Country Status (4)

Country Link
US (1) US3627663A (fr)
DE (1) DE1914747B2 (fr)
FR (1) FR1602787A (fr)
GB (1) GB1242492A (fr)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3855110A (en) * 1973-11-15 1974-12-17 United Aircraft Corp Cylindrical rf sputtering apparatus
US3901784A (en) * 1973-11-15 1975-08-26 United Aircraft Corp Cylindrical rf sputtering apparatus
GB2001106B (en) * 1977-07-14 1982-07-07 National Research Development Co Epitaxial crystalline aluminium nitride
US4183797A (en) * 1978-12-22 1980-01-15 International Business Machines Corporation Two-sided bias sputter deposition method and apparatus
US4985313A (en) * 1985-01-14 1991-01-15 Raychem Limited Wire and cable
US4738761A (en) * 1986-10-06 1988-04-19 Microelectronics Center Of North Carolina Shared current loop, multiple field apparatus and process for plasma processing
US5219668A (en) * 1986-10-31 1993-06-15 N.V. Bekaert S.A. Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates
NL8602759A (nl) * 1986-10-31 1988-05-16 Bekaert Sa Nv Werkwijze en inrichting voor het behandelen van een langwerpig substraat, dat van een deklaag voorzien is; alsmede volgens die werkwijze behandelde substraten en met deze substraten versterkte voorwerpen uit polymeermateriaal.
DE3706218A1 (de) * 1987-02-26 1988-09-08 Werner Prof Dr Weisweiler Vorrichtung und verfahren zur kontinuierlichen beschichtung der einzelnen fasern eines faserbuendels mit oberflaechenschuetzenden und haftvermittelnden carbid- oder plasmapolymer-filmen
JP2643149B2 (ja) * 1987-06-03 1997-08-20 株式会社ブリヂストン 表面処理方法
US5045166A (en) * 1990-05-21 1991-09-03 Mcnc Magnetron method and apparatus for producing high density ionic gas discharge
US5685961A (en) * 1992-03-27 1997-11-11 P & D Medical Coatings, Inc. Method for fabrication of metallized medical devices
US5472509A (en) * 1993-11-30 1995-12-05 Neomecs Incorporated Gas plasma apparatus with movable film liners
DE19744060C2 (de) * 1997-10-06 1999-08-12 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Oberflächenbehandlung von Substraten
US6685803B2 (en) 2001-06-22 2004-02-03 Applied Materials, Inc. Plasma treatment of processing gases
PL204742B1 (pl) * 2002-05-06 2010-02-26 Guardian Industries Urządzenie powlekające do formowania pierwszej i drugiej powłoki na szklanym substracie
WO2009140417A1 (fr) * 2008-05-13 2009-11-19 Sub-One Technology, Inc. Procédé de revêtement des surfaces intérieure et extérieure de tuyaux pour applications thermiques, solaires et autres applications.
US10468236B2 (en) * 2017-06-02 2019-11-05 XEI Scienctific, Inc. Plasma device with an external RF hollow cathode for plasma cleaning of high vacuum systems

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1926336A (en) * 1930-09-13 1933-09-12 Fansteel Prod Co Inc Electrode and method of making same
US3233137A (en) * 1961-08-28 1966-02-01 Litton Systems Inc Method and apparatus for cleansing by ionic bombardment
US3250694A (en) * 1962-10-17 1966-05-10 Ibm Apparatus for coating articles by cathode sputtering
US3314873A (en) * 1962-11-28 1967-04-18 Western Electric Co Method and apparatus for cathode sputtering using a cylindrical cathode
US3324019A (en) * 1962-12-11 1967-06-06 Schjeldahl Co G T Method of sputtering sequentially from a plurality of cathodes
FR1428243A (fr) * 1964-03-02 1966-02-11 Schjeldahl Co G T Procédé et appareil de projection
US3347772A (en) * 1964-03-02 1967-10-17 Schjeldahl Co G T Rf sputtering apparatus including a capacitive lead-in for an rf potential
US3420767A (en) * 1966-03-03 1969-01-07 Control Data Corp Cathode sputtering apparatus for producing plural coatings in a confined high frequency generated discharge

Also Published As

Publication number Publication date
DE1914747A1 (de) 1970-10-08
GB1242492A (en) 1971-08-11
US3627663A (en) 1971-12-14
DE1914747B2 (de) 1973-01-18

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Legal Events

Date Code Title Description
ST Notification of lapse