FR1595037A - - Google Patents

Info

Publication number
FR1595037A
FR1595037A FR1595037DA FR1595037A FR 1595037 A FR1595037 A FR 1595037A FR 1595037D A FR1595037D A FR 1595037DA FR 1595037 A FR1595037 A FR 1595037A
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19681690692 external-priority patent/DE1690692A1/de
Application filed filed Critical
Application granted granted Critical
Publication of FR1595037A publication Critical patent/FR1595037A/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
FR1595037D 1968-02-12 1968-12-12 Expired FR1595037A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681690692 DE1690692A1 (de) 1968-02-12 1968-02-12 Verfahren zum Aufbringen einer Schicht aus anorganischem festem Material auf einer Unterlage durch Kathodenzerstaeubung

Publications (1)

Publication Number Publication Date
FR1595037A true FR1595037A (fr) 1970-06-08

Family

ID=5687600

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1595037D Expired FR1595037A (fr) 1968-02-12 1968-12-12

Country Status (2)

Country Link
US (1) US3654110A (fr)
FR (1) FR1595037A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2426093A2 (fr) * 1974-03-27 1979-12-14 Anvar Perfectionnements aux procedes et dispositifs de fabrication de couches minces semi-conductrices dopees et aux produits obtenus
FR2439242A1 (fr) * 1978-04-07 1980-05-16 Varian Associates Installation de revetement par pulverisation sous vide
EP0099174A1 (fr) * 1982-05-28 1984-01-25 Fazal Abbas Fazlin Appareillage et procédé pour le revêtement de trous de passage

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3897324A (en) * 1973-06-25 1975-07-29 Honeywell Inc Material deposition masking for microcircuit structures
GB1485266A (en) * 1973-11-20 1977-09-08 Atomic Energy Authority Uk Storage of material
US4026787A (en) * 1974-01-25 1977-05-31 Coulter Information Systems, Inc. Thin film deposition apparatus using segmented target means
US3932232A (en) * 1974-11-29 1976-01-13 Bell Telephone Laboratories, Incorporated Suppression of X-ray radiation during sputter-etching
US4006073A (en) * 1975-04-03 1977-02-01 The United States Of America As Represented By The United States Energy Research And Development Administration Thin film deposition by electric and magnetic crossed-field diode sputtering
JPS5812234B2 (ja) * 1976-12-24 1983-03-07 一實 奥田 表示入りダイヤモンドの製造方法
US4520268A (en) * 1983-05-26 1985-05-28 Pauline Y. Lau Method and apparatus for introducing normally solid materials into substrate surfaces
US4731539A (en) * 1983-05-26 1988-03-15 Plaur Corporation Method and apparatus for introducing normally solid material into substrate surfaces
US4824544A (en) * 1987-10-29 1989-04-25 International Business Machines Corporation Large area cathode lift-off sputter deposition device
JPH06108242A (ja) * 1992-09-25 1994-04-19 Minolta Camera Co Ltd 薄膜電極および薄膜製造装置
KR960005377Y1 (ko) * 1993-06-24 1996-06-28 현대전자산업 주식회사 반도체 소자 제조용 스퍼터링 장치
US5415753A (en) * 1993-07-22 1995-05-16 Materials Research Corporation Stationary aperture plate for reactive sputter deposition
EP0704878A1 (fr) * 1994-09-27 1996-04-03 Applied Materials, Inc. DépÔt de film d'épaisseur uniforme de matériaux pulvérisés
US5556525A (en) * 1994-09-30 1996-09-17 Advanced Micro Devices, Inc. PVD sputter system having nonplanar target configuration and methods for operating same
US5716485A (en) * 1995-06-07 1998-02-10 Varian Associates, Inc. Electrode designs for controlling uniformity profiles in plasma processing reactors
US5757879A (en) * 1995-06-07 1998-05-26 International Business Machines Corporation Tungsten absorber for x-ray mask
US6042706A (en) * 1997-01-14 2000-03-28 Applied Materials, Inc. Ionized PVD source to produce uniform low-particle deposition
US8303779B2 (en) * 2009-12-16 2012-11-06 Primestar Solar, Inc. Methods for forming a transparent conductive oxide layer on a substrate
US9145602B2 (en) * 2011-11-01 2015-09-29 The Boeing Company Open air plasma deposition system

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2426093A2 (fr) * 1974-03-27 1979-12-14 Anvar Perfectionnements aux procedes et dispositifs de fabrication de couches minces semi-conductrices dopees et aux produits obtenus
FR2439242A1 (fr) * 1978-04-07 1980-05-16 Varian Associates Installation de revetement par pulverisation sous vide
FR2439244A1 (fr) * 1978-04-07 1980-05-16 Varian Associates
EP0099174A1 (fr) * 1982-05-28 1984-01-25 Fazal Abbas Fazlin Appareillage et procédé pour le revêtement de trous de passage

Also Published As

Publication number Publication date
US3654110A (en) 1972-04-04

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Legal Events

Date Code Title Description
ST Notification of lapse