FR1572757A - - Google Patents
Info
- Publication number
- FR1572757A FR1572757A FR1572757DA FR1572757A FR 1572757 A FR1572757 A FR 1572757A FR 1572757D A FR1572757D A FR 1572757DA FR 1572757 A FR1572757 A FR 1572757A
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US64989767A | 1967-06-29 | 1967-06-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR1572757A true FR1572757A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1969-06-27 |
Family
ID=24606681
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR1572757D Expired FR1572757A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1967-06-29 | 1968-06-28 |
Country Status (4)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2518122A1 (fr) * | 1981-12-16 | 1983-06-17 | Energy Conversion Devices Inc | Procede de fabrication des alliages et des dispositifs amorphes photosensibles par depot de phase chimique |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1212881A (en) * | 1967-04-25 | 1970-11-18 | Glaverbel | Process for modifying glass and other materials |
| DE2130605C3 (de) * | 1971-06-21 | 1974-02-07 | Leitz Ernst Gmbh | Sontrastierungsverfahren für mikroskopisch zu untersuchende Objekte |
| US3962057A (en) * | 1971-06-21 | 1976-06-08 | Ernst Leitz G.M.B.H. | Method of imparting contrast to a microscope object |
| USRE32928E (en) * | 1972-05-12 | 1989-05-23 | Lfe Corporation | Process and material for manufacturing semiconductor devices |
| USRE30505E (en) * | 1972-05-12 | 1981-02-03 | Lfe Corporation | Process and material for manufacturing semiconductor devices |
| US3984301A (en) * | 1973-08-11 | 1976-10-05 | Nippon Electric Varian, Ltd. | Sputter-etching method employing fluorohalogenohydrocarbon etching gas and a planar electrode for a glow discharge |
| US3951709A (en) * | 1974-02-28 | 1976-04-20 | Lfe Corporation | Process and material for semiconductor photomask fabrication |
| US3975252A (en) * | 1975-03-14 | 1976-08-17 | Bell Telephone Laboratories, Incorporated | High-resolution sputter etching |
| US3994793A (en) * | 1975-05-22 | 1976-11-30 | International Business Machines Corporation | Reactive ion etching of aluminum |
| US4264393A (en) * | 1977-10-31 | 1981-04-28 | Motorola, Inc. | Reactor apparatus for plasma etching or deposition |
| US4379040A (en) * | 1981-01-29 | 1983-04-05 | Ppg Industries, Inc. | Method of and apparatus for control of reactive sputtering deposition |
| CA1184877A (en) | 1982-05-12 | 1985-04-02 | James B. Webb | Method and apparatus for depositing conducting oxide on a substrate |
| US4906315A (en) * | 1983-06-20 | 1990-03-06 | Mcgrew Stephen P | Surface relief holograms and holographic hot-stamping foils, and method of fabricating same |
| JPS62287513A (ja) * | 1986-06-04 | 1987-12-14 | 株式会社リコー | 透明導電膜およびその製造方法 |
| US4931158A (en) * | 1988-03-22 | 1990-06-05 | The Regents Of The Univ. Of Calif. | Deposition of films onto large area substrates using modified reactive magnetron sputtering |
| US4849081A (en) * | 1988-06-22 | 1989-07-18 | The Boc Group, Inc. | Formation of oxide films by reactive sputtering |
| DE69107101T2 (de) * | 1990-02-06 | 1995-05-24 | Semiconductor Energy Lab | Verfahren zum Herstellen eines Oxydfilms. |
| US5135581A (en) * | 1991-04-08 | 1992-08-04 | Minnesota Mining And Manufacturing Company | Light transmissive electrically conductive oxide electrode formed in the presence of a stabilizing gas |
| US5397920A (en) * | 1994-03-24 | 1995-03-14 | Minnesota Mining And Manufacturing Company | Light transmissive, electrically-conductive, oxide film and methods of production |
| JP3689524B2 (ja) * | 1996-03-22 | 2005-08-31 | キヤノン株式会社 | 酸化アルミニウム膜及びその形成方法 |
| FR2780054B1 (fr) * | 1998-06-19 | 2000-07-21 | Saint Gobain Vitrage | Procede de depot d'une couche a base d'oxyde metallique sur un substrat verrier, substrat verrier ainsi revetu |
| US6240622B1 (en) * | 1999-07-09 | 2001-06-05 | Micron Technology, Inc. | Integrated circuit inductors |
| EP1444727A4 (en) * | 2001-10-22 | 2007-07-18 | Unaxis Usa Inc | PROCESS AND DEVICE FOR CORROSING THIN, DAMAGE-SENSITIVE LAYERS USING HIGH FREQUENCY PULSE PLASMA |
| JP2005054220A (ja) * | 2003-08-01 | 2005-03-03 | Canon Inc | フッ化物薄膜の形成方法及びその形成装置 |
| US20120160663A1 (en) * | 2010-12-14 | 2012-06-28 | Alliance For Sustainable Energy, Llc. | Sputter Deposition and Annealing of High Conductivity Transparent Oxides |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB830392A (en) * | 1956-05-17 | 1960-03-16 | Edwards High Vacuum Ltd | Improvements in or relating to cathodic sputtering |
-
1967
- 1967-06-29 US US649897A patent/US3477936A/en not_active Expired - Lifetime
-
1968
- 1968-06-28 GB GB30854/68A patent/GB1167128A/en not_active Expired
- 1968-06-28 BE BE717353D patent/BE717353A/xx unknown
- 1968-06-28 FR FR1572757D patent/FR1572757A/fr not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2518122A1 (fr) * | 1981-12-16 | 1983-06-17 | Energy Conversion Devices Inc | Procede de fabrication des alliages et des dispositifs amorphes photosensibles par depot de phase chimique |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1167128A (en) | 1969-10-15 |
| US3477936A (en) | 1969-11-11 |
| BE717353A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1968-12-30 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |