FR1256781A - Dispositif électrique de contrôle de fabrication de semi-conducteurs - Google Patents

Dispositif électrique de contrôle de fabrication de semi-conducteurs

Info

Publication number
FR1256781A
FR1256781A FR826764A FR826764A FR1256781A FR 1256781 A FR1256781 A FR 1256781A FR 826764 A FR826764 A FR 826764A FR 826764 A FR826764 A FR 826764A FR 1256781 A FR1256781 A FR 1256781A
Authority
FR
France
Prior art keywords
control device
semiconductor manufacturing
manufacturing control
electric semiconductor
electric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR826764A
Other languages
English (en)
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Space Systems Loral LLC
Original Assignee
Philco Ford Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philco Ford Corp filed Critical Philco Ford Corp
Application granted granted Critical
Publication of FR1256781A publication Critical patent/FR1256781A/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/12—Etching of semiconducting materials
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/14—Etching locally
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
FR826764A 1959-05-26 1960-05-10 Dispositif électrique de contrôle de fabrication de semi-conducteurs Expired FR1256781A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US815938A US3042603A (en) 1959-05-26 1959-05-26 Thickness modifying apparatus

Publications (1)

Publication Number Publication Date
FR1256781A true FR1256781A (fr) 1961-03-24

Family

ID=25219234

Family Applications (1)

Application Number Title Priority Date Filing Date
FR826764A Expired FR1256781A (fr) 1959-05-26 1960-05-10 Dispositif électrique de contrôle de fabrication de semi-conducteurs

Country Status (5)

Country Link
US (1) US3042603A (US20100223739A1-20100909-C00025.png)
DE (1) DE1211721B (US20100223739A1-20100909-C00025.png)
FR (1) FR1256781A (US20100223739A1-20100909-C00025.png)
GB (1) GB951256A (US20100223739A1-20100909-C00025.png)
NL (1) NL113711C (US20100223739A1-20100909-C00025.png)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3377263A (en) * 1964-09-14 1968-04-09 Philco Ford Corp Electrical system for etching a tunnel diode
DE2936247A1 (de) * 1979-09-07 1981-03-19 Siemens AG, 1000 Berlin und 8000 München Einrichtung zum galvanischen abscheiden einer metallischen schicht mit vorgegebener schichtstaerke

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2199396A (en) * 1934-09-27 1940-05-07 Dubilier William System for controlling knitting
US2312357A (en) * 1940-03-02 1943-03-02 American Can Co Sorting machine
US2793345A (en) * 1953-10-29 1957-05-21 United States Steel Corp Apparatus for measuring the thickness of a coating applied to a moving strip
US2846346A (en) * 1954-03-26 1958-08-05 Philco Corp Semiconductor device
US2875140A (en) * 1954-04-21 1959-02-24 Philco Corp Method and apparatus for producing semiconductive structures
US2726202A (en) * 1955-06-06 1955-12-06 Robotron Corp Method for plating by condenser discharge
FR1131213A (fr) * 1955-09-09 1957-02-19 Csf Procédé et appareil de contrôle de l'épaisseur d'un échantillon de semi-conducteur au cours d'une attaque électrolytique
US2784154A (en) * 1956-03-30 1957-03-05 Westinghouse Electric Corp Electrolytic wire reducing apparatus and method
DE1027035B (de) * 1956-04-05 1958-03-27 Gerhard Wollank Dipl Phys Verfahren zur Verbesserung der Herstellung duenner Draehte durch elektrolytisches AEtzen
DE1029485B (de) * 1956-08-27 1958-05-08 Telefunken Gmbh Verfahren zum Anbringen eines Zuleitungsdrahtes an der Oberflaeche eines halbleitenden Koerpers
US2886026A (en) * 1957-08-20 1959-05-12 Texas Instruments Inc Method of and apparatus for cutting a semiconductor crystal

Also Published As

Publication number Publication date
GB951256A (en) 1964-03-04
NL250856A (US20100223739A1-20100909-C00025.png) 1967-01-16
US3042603A (en) 1962-07-03
DE1211721B (de) 1966-03-03
NL113711C (US20100223739A1-20100909-C00025.png) 1967-06-15

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