FR1215642A - Perfectionnements aux éléments photopolymérisables - Google Patents

Perfectionnements aux éléments photopolymérisables

Info

Publication number
FR1215642A
FR1215642A FR774402A FR774402A FR1215642A FR 1215642 A FR1215642 A FR 1215642A FR 774402 A FR774402 A FR 774402A FR 774402 A FR774402 A FR 774402A FR 1215642 A FR1215642 A FR 1215642A
Authority
FR
France
Prior art keywords
light
curing elements
curing
elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR774402A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of FR1215642A publication Critical patent/FR1215642A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
FR774402A 1957-09-16 1958-09-12 Perfectionnements aux éléments photopolymérisables Expired FR1215642A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US68418657A 1957-09-16 1957-09-16
US17707A US2993789A (en) 1957-09-16 1960-03-25 Photopolymerizable elements, their preparation and use

Publications (1)

Publication Number Publication Date
FR1215642A true FR1215642A (fr) 1960-04-20

Family

ID=26690211

Family Applications (1)

Application Number Title Priority Date Filing Date
FR774402A Expired FR1215642A (fr) 1957-09-16 1958-09-12 Perfectionnements aux éléments photopolymérisables

Country Status (4)

Country Link
US (1) US2993789A (fr)
BE (1) BE570883A (fr)
FR (1) FR1215642A (fr)
GB (1) GB841454A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0258719A2 (fr) * 1986-08-30 1988-03-09 Ciba-Geigy Ag Système à deux couches

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL245513A (fr) * 1959-01-23
NL287134A (fr) * 1959-08-05
US3146106A (en) * 1960-02-10 1964-08-25 Du Pont Preparation of printing plates
NL276329A (fr) * 1961-03-29
BE623613A (fr) * 1961-10-16
BE635432A (fr) * 1962-07-26
BE636376A (fr) * 1962-08-21
US3471596A (en) * 1966-03-11 1969-10-07 Williams Gold Refining Co Process of making fused thermosetting dental objects
US3856529A (en) * 1967-05-26 1974-12-24 Kalle Ag Method and materials for making half tone prints
DE1669723A1 (de) * 1967-09-22 1971-06-09 Basf Ag Indigoide Farbstoffe enthaltende Platten,Folien oder Filme aus photopolymerisierbaren Massen
DE1597515A1 (de) * 1967-10-28 1970-06-11 Basf Ag Verfahren zum Aufbringen lichtempfindlicher Platten,Filme oder Folien auf metallischen Unterlagen
BE795477A (fr) * 1972-02-16 1973-05-29 Quadrimetal Offset Le Compositions photopolymerisables ameliorees
US3934057A (en) * 1973-12-19 1976-01-20 International Business Machines Corporation High sensitivity positive resist layers and mask formation process
US3956235A (en) * 1974-06-24 1976-05-11 Continental Can Company, Inc. Photopolymerizable compounds stabilized against premature gelation with copper compounds and thiocarbamates
US3932346A (en) * 1974-03-18 1976-01-13 Continental Can Company, Inc. Pigmented photopolymerizable compounds stabilized against premature gelation with thiocarbamates
DE2658422C2 (de) * 1976-12-23 1986-05-22 Hoechst Ag, 6230 Frankfurt Verfahren zur Herstellung eines Negativ-Trockenresistfilms
JPS5492402A (en) * 1977-12-28 1979-07-21 Asahi Chemical Ind Photosensitive resin relief printing and fabrication
US4266007A (en) * 1978-06-22 1981-05-05 Hercules Incorporated Multilayer printing plates and process for making same
CA1123649A (fr) * 1978-06-22 1982-05-18 Norman E. Hughes Plaques d'impression constituees d'une couche de base ayant un taux de polymerisation plus eleve que celui de la couche d'impression superficielle
US4308119A (en) * 1979-02-21 1981-12-29 Panelgraphic Corporation Abrasion-resistant optical coating composition containing pentaerythritol based polyacrylates and cellulose esters
JPS55134854A (en) * 1979-04-05 1980-10-21 Dainippon Printing Co Ltd Manufacture of lithographic printing plate
FR2462457A1 (fr) * 1979-08-02 1981-02-13 Dainippon Ink & Chemicals Articles planiformes en polychlorure de vinyle, tels que feuilles ou plaques, durcissant a l'ultraviolet
US4332873A (en) * 1979-08-22 1982-06-01 Hercules Incorporated Multilayer printing plates and process for making same
US4407855A (en) * 1980-01-07 1983-10-04 Panelographic Corporation Method for forming an abrasion resistant coating from cellulose ester and pentaerythritol acrylates
US4399192A (en) * 1980-01-07 1983-08-16 Panelographic Corporation Radiation cured abrasion resistant coatings of pentaerythritol acrylates and cellulose esters on polymeric substrates
US4373007A (en) * 1980-11-03 1983-02-08 Panelgraphic Corporation [Non-photoinitialio] non-photocatalyzed dipentaerythritol polyacrylate based coating compositions exhibiting high abrasion resistance
AU560406B2 (en) * 1983-08-31 1987-04-02 Indagraf S.A. Manufacture of relief printing plates
US4699859A (en) * 1984-09-07 1987-10-13 Toyo Boseki Kabushiki Kaisha Dot-etchable image-containing element useful in lithographic mask formation and its production
JPH0610886B2 (ja) * 1984-11-01 1994-02-09 株式会社リコー 光情報記録媒体
DE3704695A1 (de) * 1987-02-14 1988-08-25 Basf Ag Verfahren zum beschichten von formzylindern oder formzylinder-huelsen mit einer durchgehenden, nahtlosen lichtempfindlichen schicht sowie verwendung der so beschichteten formzylinder bzw. formzylinder-huelsen zur herstellung von druckformen fuer den rotationsdruck
DE3740432A1 (de) * 1987-11-28 1989-06-08 Hoechst Ag Lichtempfindliche druckplatte fuer den flexodruck
DE69130102T2 (de) * 1990-05-21 1999-05-20 Asahi Kasei Kogyo K.K., Osaka Hochdruckplatte mit photovernetzbarem kunststoff
EP0522616B1 (fr) * 1991-07-12 1995-10-04 Agfa-Gevaert N.V. Méthode pour la production d'images au moyen d'une composition photopolymérisable
JP3362797B2 (ja) 1993-04-30 2003-01-07 東洋紡績株式会社 印刷原版用感光性樹脂積層体
JPH06332181A (ja) * 1993-04-30 1994-12-02 Internatl Business Mach Corp <Ibm> レジスト構造とその製造方法
JP3423077B2 (ja) * 1993-08-25 2003-07-07 ダブリュ・アール・グレイス・アンド・カンパニー・コネテイカット 版面の製造方法
US5972566A (en) * 1997-05-21 1999-10-26 Identity Group, Inc. Releasable photopolymer printing plate and method of forming same
WO2000021758A1 (fr) 1998-10-15 2000-04-20 Identity Group, Inc. Imprimante et procede d'utilisation de celle-ci pour imprimer sur un support thermoplastique
JP2005171093A (ja) * 2003-12-11 2005-06-30 Maruzen Petrochem Co Ltd 半導体リソグラフィー用共重合体の製造方法及び該方法により得られる半導体リソグラフィー用共重合体
US8333148B2 (en) * 2008-11-26 2012-12-18 Psa Essentials Llc Photopolymer stamp manufacturing process and preparation system and photopolymer stamp dies

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0258719A2 (fr) * 1986-08-30 1988-03-09 Ciba-Geigy Ag Système à deux couches
EP0258719A3 (fr) * 1986-08-30 1989-07-05 Ciba-Geigy Ag Système à deux couches

Also Published As

Publication number Publication date
GB841454A (en) 1960-07-13
US2993789A (en) 1961-07-25
BE570883A (fr) 1959-03-02

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