FI943497A - Menetelmä ikkunan ja kehyksen muotoisia päällystekalvoja pinnallaan sisältävän substraatin valmistamiseksi - Google Patents
Menetelmä ikkunan ja kehyksen muotoisia päällystekalvoja pinnallaan sisältävän substraatin valmistamiseksi Download PDFInfo
- Publication number
- FI943497A FI943497A FI943497A FI943497A FI943497A FI 943497 A FI943497 A FI 943497A FI 943497 A FI943497 A FI 943497A FI 943497 A FI943497 A FI 943497A FI 943497 A FI943497 A FI 943497A
- Authority
- FI
- Finland
- Prior art keywords
- shaped
- making
- frame
- substrate containing
- coating films
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18379693A JPH0735920A (ja) | 1993-07-26 | 1993-07-26 | 基板上に枠部の機能性塗膜等を形成する方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
FI943497A0 FI943497A0 (fi) | 1994-07-25 |
FI943497A true FI943497A (fi) | 1995-01-27 |
Family
ID=16142075
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI943497A FI943497A (fi) | 1993-07-26 | 1994-07-25 | Menetelmä ikkunan ja kehyksen muotoisia päällystekalvoja pinnallaan sisältävän substraatin valmistamiseksi |
Country Status (6)
Country | Link |
---|---|
US (1) | US5503732A (ko) |
EP (1) | EP0636932A1 (ko) |
JP (1) | JPH0735920A (ko) |
KR (1) | KR100305443B1 (ko) |
FI (1) | FI943497A (ko) |
TW (1) | TW318260B (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW426806B (en) * | 1994-05-18 | 2001-03-21 | Toshiba Corp | Fabricating method of liquid crystal display apparatus |
JP2961350B2 (ja) * | 1994-08-18 | 1999-10-12 | 本荘ソレックス株式会社 | 微細パターンを有するネサ膜の製造方法 |
US5725976A (en) * | 1996-01-30 | 1998-03-10 | Sumitomo Chemical Company, Limited | Method for manufacture of a color filter |
GB9623185D0 (en) * | 1996-11-09 | 1997-01-08 | Epigem Limited | Improved micro relief element and preparation thereof |
US6256079B1 (en) * | 1996-11-18 | 2001-07-03 | Sharp Kabushiki Kaisha | Liquid crystal display device, method for manufacturing the same, and method for inspecting the same |
KR100472174B1 (ko) * | 1997-06-18 | 2005-06-07 | 삼성전자주식회사 | 중첩 노광을 이용한 액정 표시 장치의 제조방법 |
JP2000017490A (ja) * | 1998-06-29 | 2000-01-18 | Sony Corp | ポリイミド複合電着膜の形成方法 |
TWI391707B (zh) * | 2008-10-30 | 2013-04-01 | Ind Tech Res Inst | 複合式分光元件 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4311773A (en) * | 1979-02-28 | 1982-01-19 | Hitachi, Ltd. | Method of producing color filters |
JPS6033506A (ja) * | 1983-08-04 | 1985-02-20 | Seiko Instr & Electronics Ltd | カラ−固体撮像素子の製造方法 |
JPS60188927A (ja) * | 1984-03-08 | 1985-09-26 | Toshiba Corp | カラ−・マトリツクス型液晶表示装置の製造方法 |
JPS62160421A (ja) * | 1986-01-08 | 1987-07-16 | Shinto Paint Co Ltd | 微細な導電性回路の間に機能性塗膜を形成する方法 |
JPH07117662B2 (ja) * | 1986-04-21 | 1995-12-18 | 神東塗料株式会社 | 微細な透明導電性回路パタ−ン上およびその間隙に機能性薄膜を形成する方法 |
JP2669826B2 (ja) * | 1987-07-17 | 1997-10-29 | 日本ペイント株式会社 | 着色表示装置の製造方法 |
EP0340968A3 (en) * | 1988-04-30 | 1992-05-06 | Seiko Epson Corporation | Thin film device and method of manufacturing the same |
EP0478321B1 (en) * | 1990-09-28 | 1997-11-12 | Kabushiki Kaisha Toshiba | Photosenstive resin composition for forming polyimide film pattern and method of forming polyimide film pattern |
-
1993
- 1993-07-26 JP JP18379693A patent/JPH0735920A/ja active Pending
-
1994
- 1994-07-12 US US08/273,967 patent/US5503732A/en not_active Expired - Fee Related
- 1994-07-25 TW TW083106791A patent/TW318260B/zh active
- 1994-07-25 EP EP94111562A patent/EP0636932A1/en not_active Withdrawn
- 1994-07-25 FI FI943497A patent/FI943497A/fi not_active Application Discontinuation
- 1994-07-26 KR KR1019940018047A patent/KR100305443B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPH0735920A (ja) | 1995-02-07 |
KR100305443B1 (ko) | 2001-11-22 |
US5503732A (en) | 1996-04-02 |
FI943497A0 (fi) | 1994-07-25 |
TW318260B (ko) | 1997-10-21 |
EP0636932A1 (en) | 1995-02-01 |
KR950003895A (ko) | 1995-02-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GB | Transfer or assigment of application |
Owner name: SUMITOMO CHEMICAL COMPANY, LIMITED |
|
FD | Application lapsed |