FI823414A7 - Valotettujen negatiivi-työskentelevien jäljennöskerrosten kehitin ja menetelmä tällaisten kerrosten kehittämikehittämiseksi. - Google Patents

Valotettujen negatiivi-työskentelevien jäljennöskerrosten kehitin ja menetelmä tällaisten kerrosten kehittämikehittämiseksi. Download PDF

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Publication number
FI823414A7
FI823414A7 FI823414A FI823414A FI823414A7 FI 823414 A7 FI823414 A7 FI 823414A7 FI 823414 A FI823414 A FI 823414A FI 823414 A FI823414 A FI 823414A FI 823414 A7 FI823414 A7 FI 823414A7
Authority
FI
Finland
Prior art keywords
layers
developer
developing
exposed negative
working
Prior art date
Application number
FI823414A
Other languages
English (en)
Finnish (fi)
Swedish (sv)
Other versions
FI823414A0 (fi
FI823414L (fi
Inventor
Loni Schell
Inge Gros
Werner Frass
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of FI823414A0 publication Critical patent/FI823414A0/fi
Publication of FI823414A7 publication Critical patent/FI823414A7/fi
Publication of FI823414L publication Critical patent/FI823414L/fi

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Magnetic Record Carriers (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Measurement And Recording Of Electrical Phenomena And Electrical Characteristics Of The Living Body (AREA)
  • Fats And Perfumes (AREA)
  • Cosmetics (AREA)
FI823414A 1981-10-09 1982-10-07 Framkallare foer exponerade, negativt arbetande reproduktionsskikt och foerfarande foer framkallninav dylika skikt FI823414L (fi)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19813140186 DE3140186A1 (de) 1981-10-09 1981-10-09 Entwickler und verfahren zum entwickeln fuer belichtete negativ-arbeitende reproduktionsschichten

Publications (3)

Publication Number Publication Date
FI823414A0 FI823414A0 (fi) 1982-10-07
FI823414A7 true FI823414A7 (fi) 1983-04-10
FI823414L FI823414L (fi) 1983-04-10

Family

ID=6143762

Family Applications (1)

Application Number Title Priority Date Filing Date
FI823414A FI823414L (fi) 1981-10-09 1982-10-07 Framkallare foer exponerade, negativt arbetande reproduktionsskikt och foerfarande foer framkallninav dylika skikt

Country Status (11)

Country Link
US (1) US4579811A (enExample)
EP (1) EP0076984B1 (enExample)
JP (1) JPS5876837A (enExample)
AT (1) ATE24781T1 (enExample)
AU (1) AU557455B2 (enExample)
BR (1) BR8205902A (enExample)
CA (1) CA1184803A (enExample)
DE (2) DE3140186A1 (enExample)
ES (1) ES516391A0 (enExample)
FI (1) FI823414L (enExample)
ZA (1) ZA827372B (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59142547A (ja) * 1983-02-02 1984-08-15 Nippon Telegr & Teleph Corp <Ntt> 溶解速度差現像液の像鮮明性増大剤
EP0134407B1 (de) * 1983-08-25 1987-05-06 American Hoechst Corporation Entwickler und Verfahren zum Entwickeln für bestrahlte negativ-arbeitende Reproduktionsschichten
EP0149490B2 (en) * 1984-01-17 1993-12-15 Fuji Photo Film Co., Ltd. Presensitized plate having an anodized aluminum base with an improved hydrophilic layer
JPS6198604A (ja) * 1984-10-18 1986-05-16 Toyota Motor Corp シヨツクアブソ−バの取付け構造
JPS61113510A (ja) * 1984-11-08 1986-05-31 Toyota Motor Corp 懸架装置
JPS61129309A (ja) * 1984-11-27 1986-06-17 Toyota Motor Corp 車両のサスペンシヨン
JPH0820738B2 (ja) * 1986-11-21 1996-03-04 オーシージー マイクロエレクトロニック マテリアルズ インコーポレイテッド ポジ型フオトレジスト組成物の改良現像方法および現像液
EP0279630B1 (en) * 1987-02-16 1993-10-13 Konica Corporation Developer for light-sensitive lithographic printing plate capable of processing commonly the negative-type and the positive type and developer composition for light-sensitive material
JPS63271256A (ja) * 1987-04-28 1988-11-09 Konica Corp 感光材料の現像液組成物
JPH01223447A (ja) * 1988-03-03 1989-09-06 Konica Corp 感光材料の処理方法
US5122438A (en) * 1989-11-02 1992-06-16 Konica Corporation Method for developing a waterless light-sensitive lithographic plate
JPH0470756A (ja) * 1990-07-11 1992-03-05 Konica Corp 感光性平版印刷版の現像方法及び現像液
DE69315046T2 (de) * 1992-12-17 1998-06-04 Eastman Kodak Co Wässriger Entwickler für lithographische Druckplatten der zu einer verringerten Schlammbildung führt
US5374500A (en) * 1993-04-02 1994-12-20 International Business Machines Corporation Positive photoresist composition containing photoacid generator and use thereof
DE69527494T2 (de) * 1994-12-06 2002-11-07 Fuji Photo Film Co., Ltd. Entwickler für ein lichtempfindliches lithographisches Druckmaterial
DE69608734T2 (de) * 1995-02-15 2000-11-23 Agfa-Gevaert N.V., Mortsel Diazo-Aufzeichnungselement mit verbesserter Lagerstabilität
JP4199942B2 (ja) * 2001-07-09 2008-12-24 富士フイルム株式会社 平版印刷版の製版方法
US6756183B2 (en) * 2001-08-24 2004-06-29 Fuji Photo Film Co., Ltd. Method for preparing lithographic printing plate
EP1346843A1 (en) * 2002-03-22 2003-09-24 Fuji Photo Film Co., Ltd. Image forming method
JP5719698B2 (ja) * 2010-06-30 2015-05-20 富士フイルム株式会社 パターン形成方法及び該パターン形成方法に用いられる現像液

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE606642A (enExample) * 1960-07-29
US3867147A (en) * 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
US3891439A (en) * 1972-11-02 1975-06-24 Polychrome Corp Aqueous developing composition for lithographic diazo printing plates
US4147545A (en) * 1972-11-02 1979-04-03 Polychrome Corporation Photolithographic developing composition with organic lithium compound
JPS50108005A (enExample) * 1974-01-31 1975-08-26
GB2036993B (en) * 1978-02-06 1983-03-09 Napp Systems Inc Desensitizing solution and process for treating a diazo photosensitive printing plate
GB1603700A (en) * 1978-05-31 1981-11-25 Vickers Ltd Developers for lithographic printing plates
DE3008824A1 (de) * 1979-03-09 1980-09-18 Daicel Chem Fluessige zubereitung zur behandlung lichtempfindlicher schichtstoffe sowie verfahren unter verwendung dieser zubereitung
JPS55120032A (en) * 1979-03-09 1980-09-16 Daicel Chem Ind Ltd Treating solution for photosensitive laminate having alcohol-soluble polyamide layer
DE3162627D1 (en) * 1980-01-29 1984-07-12 Vickers Ltd Developers and methods of processing radiation sensitive plates using the same

Also Published As

Publication number Publication date
FI823414A0 (fi) 1982-10-07
DE3140186A1 (de) 1983-04-28
US4579811A (en) 1986-04-01
ATE24781T1 (de) 1987-01-15
BR8205902A (pt) 1983-09-06
ES8400611A1 (es) 1983-11-01
JPS5876837A (ja) 1983-05-10
DE3275026D1 (en) 1987-02-12
AU8912382A (en) 1983-04-14
EP0076984A1 (de) 1983-04-20
ES516391A0 (es) 1983-11-01
AU557455B2 (en) 1986-12-24
ZA827372B (en) 1983-08-31
CA1184803A (en) 1985-04-02
FI823414L (fi) 1983-04-10
EP0076984B1 (de) 1987-01-07
JPH0244064B2 (enExample) 1990-10-02

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Legal Events

Date Code Title Description
FA Application withdrawn [patent]

Owner name: HOECHST AKTIENGESELLSCHAFT