FI68474B - Foerfarande foer att sluta ett substrat i en haollare - Google Patents

Foerfarande foer att sluta ett substrat i en haollare Download PDF

Info

Publication number
FI68474B
FI68474B FI834347A FI834347A FI68474B FI 68474 B FI68474 B FI 68474B FI 834347 A FI834347 A FI 834347A FI 834347 A FI834347 A FI 834347A FI 68474 B FI68474 B FI 68474B
Authority
FI
Finland
Prior art keywords
substrate
holder
resist
carried out
dry film
Prior art date
Application number
FI834347A
Other languages
English (en)
Finnish (fi)
Other versions
FI834347A (fi
FI834347A0 (fi
FI68474C (fi
Inventor
Jeffery Alden Whalin
Charles William Shanley
Michael Nicholson Scansaroli
Lawrence Noah Dworsky
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Publication of FI834347A publication Critical patent/FI834347A/fi
Publication of FI834347A0 publication Critical patent/FI834347A0/fi
Publication of FI68474B publication Critical patent/FI68474B/fi
Application granted granted Critical
Publication of FI68474C publication Critical patent/FI68474C/fi

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/42—Piezoelectric device making

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Chemically Coating (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
  • Laminated Bodies (AREA)

Claims (18)

1. Förfarande för att innesluta ett substrat i en hällare för 1juslitografisk processering, tili vilket förfarande hör anordnandet av substratet (35), vilket uppvisar tvä motstäende huvudytor, i hällaren (20), vilken hällare har tvä motstäende huvudytor och ätminstone en öppning (30) som dimensionerats för mottagning av substratet (35),kännetecknat av att det därtill innefattar stegen: - laminering av ett torrt filmpolymerresist (40, 55) pä ätminstone ena sidan av hällaren (20) och substratet (35), varvid substratet inneslutes i hällarens öppning (30); - polymerisering av resistet (40, 55) vid önskade omräden, vilka innefattar ätminstone ett obrutet omräde som sträcker sig frän en yta hos hällaren (20) tili substratets (35) motsvarande yta; - avlägsnande av resistet (40, 55) frän icke-önskade omräden, varvid en resistremsa lämnas ätminstone pä ett obrutet omräde som sträcker sig frän en yta hos hällaren (20) tili en andra yta hos substratet (35). 68474 1 6
2. Förfarande enligt patentkravet 1, kännetecknat av att polymeriseringen utföres genom att exponera det torra film-polymerresistet (40, 55) med ljus av en viss väglängd under en viss tid.
3. Förfarande enligt patentkravet 2,kännetecknat av att lamineringen utföres som en värmelamineringsprocess.
4. Förfarande enligt patentkravet 3, kännetecknat av att substratet (35) avlägsnas frän hällaren (20) efter att resistet (40, 55) avlägsnats frän icke-önskade omräden.
5. Förfarande enligt patentkravet 4, kännetecknat av att avlägsnandet av substratet (35) frän hällaren (20) utföres genom avbrytning av de bindande remsorna (115).
6. Förfarande enligt patentkravet 4, kännetecknat av att avlägsnandet av substratet (35) frän hällaren (20) utföres som en stansningsprocess.
7. Förfarande enligt patentkravet 4,kännetecknat av att allt resist (40, 55) upplöses frän substratets (35) ytor med ett lämpligt lösningsmcdel som ett sista steg.
8. Förfarande enligt patentkravet 7, kännetecknat av att säsom lösningsmedel används en acetonlösning.
9. Förfarande enligt patentkravet 7, kännetecknat av att det torra filmpolymerresistet exponeras genom en Ijuslito-grafisk mask (80) under exponeringssteget.
10. Förfarande enligt patentkravet 9,kännetecknat av att de 1juslitografiskä maskerna (80) stär i kontakt med det torra filmpolymorresistot (40, 55) under exponeringssteget.
FI834347A 1982-03-29 1983-11-28 Foerfarande foer att sluta ett substrat i en haollare FI68474C (fi)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US06/362,938 US4393131A (en) 1982-03-29 1982-03-29 Method for captivating a substrate within a holder
US36293882 1982-03-29
US8300377 1983-03-17
PCT/US1983/000377 WO1983003484A1 (en) 1982-03-29 1983-03-17 A method and apparatus for captivating a substrate within a holder

Publications (4)

Publication Number Publication Date
FI834347A FI834347A (fi) 1983-11-28
FI834347A0 FI834347A0 (fi) 1983-11-28
FI68474B true FI68474B (fi) 1985-05-31
FI68474C FI68474C (fi) 1985-09-10

Family

ID=23428127

Family Applications (1)

Application Number Title Priority Date Filing Date
FI834347A FI68474C (fi) 1982-03-29 1983-11-28 Foerfarande foer att sluta ett substrat i en haollare

Country Status (10)

Country Link
US (1) US4393131A (sv)
EP (1) EP0104242B1 (sv)
JP (1) JPS59500636A (sv)
AU (1) AU567497B2 (sv)
CA (1) CA1202123A (sv)
DE (1) DE3371710D1 (sv)
DK (1) DK161610C (sv)
FI (1) FI68474C (sv)
IL (1) IL68260A (sv)
WO (1) WO1983003484A1 (sv)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4554717A (en) * 1983-12-08 1985-11-26 The United States Of America As Represented By The Secretary Of The Army Method of making miniature high frequency SC-cut quartz crystal resonators
NL8402681A (nl) * 1984-09-03 1986-04-01 Philips Nv Optisch uitleesbare informatieschijf en methode voor de vervaardiging ervan.
US4810616A (en) * 1986-08-25 1989-03-07 Amp Incorporated Manufacturing method for integrated circuit chip carriers
EP0475045B1 (en) * 1990-08-06 1996-12-11 Bayer Corporation Method and device for the assay of ions
US5198716A (en) * 1991-12-09 1993-03-30 The United States Of America As Represented By The United States Department Of Energy Micro-machined resonator
US5530552A (en) * 1992-12-09 1996-06-25 The United States Of America As Represented By The Secretary Of The Army Double sided wafer, alignment technique
CN102598225B (zh) * 2009-10-16 2014-12-03 英派尔科技开发有限公司 向半导体晶片应用膜的设备和方法、处理半导体晶片的方法
US9142779B2 (en) * 2013-08-06 2015-09-22 University Of Rochester Patterning of OLED materials
US10644239B2 (en) 2014-11-17 2020-05-05 Emagin Corporation High precision, high resolution collimating shadow mask and method for fabricating a micro-display
TWI633197B (zh) 2016-05-24 2018-08-21 美商伊麥傑公司 高精準度蔽蔭遮罩沉積系統及其方法
KR102377183B1 (ko) 2016-05-24 2022-03-21 이매진 코퍼레이션 고정밀 섀도 마스크 증착 시스템 및 그 방법
US10386731B2 (en) 2016-05-24 2019-08-20 Emagin Corporation Shadow-mask-deposition system and method therefor

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1199943A (en) * 1915-03-01 1916-10-03 Arthur K Taylor Method of and apparatus for preparing registering impression-forms.
US1632278A (en) * 1919-10-16 1927-06-14 Leon F Douglass Method of producing colored photographic films
US1739886A (en) * 1923-05-18 1929-12-17 Photostat Corp Reproducing or enlarging camera
US2487561A (en) * 1942-10-06 1949-11-08 Photostat Corp Photographic copying machine
US3089219A (en) * 1953-10-19 1963-05-14 Raytheon Co Transistor assembly and method
US2942568A (en) * 1954-10-15 1960-06-28 Sylvania Electric Prod Manufacture of junction transistors
US3040619A (en) * 1960-01-04 1962-06-26 Animation Equipment Corp Optical printer having a plurality of projector heads
US3171187A (en) * 1962-05-04 1965-03-02 Nippon Electric Co Method of manufacturing semiconductor devices
US3250048A (en) * 1964-08-18 1966-05-10 Philips Corp Multiple alloying jigs for manufacturing semiconductor devices having at least one alloy contact each
US3531198A (en) * 1966-06-27 1970-09-29 Jade Corp Method of printing images on opposite sides of a substrate
US3580670A (en) * 1968-08-12 1971-05-25 Xerox Corp Apparatus for duplexing
US3507592A (en) * 1968-10-28 1970-04-21 Rca Corp Method of fabricating photomasks
US3688656A (en) * 1969-10-06 1972-09-05 Image Products Corp Microfilm printer
US3624724A (en) * 1970-02-12 1971-11-30 Gaf Corp Medical x-ray sensitometer
US3622241A (en) * 1970-05-21 1971-11-23 John L Dexter Rotary photosensitive material printer
DE2029325C3 (de) * 1970-06-13 1980-04-03 Manfred Dr. Strauch Verfahren zum Herstellen von Modellen, Gießformen oder Kernen mit komplizierter Oberflächengeometrie oder -struktur hoher Konturenschärfe und geringer Rauhigkeit
GB1336254A (en) * 1972-03-17 1973-11-07 Acheson Ind Inc Devices
US4026008A (en) * 1972-10-02 1977-05-31 Signetics Corporation Semiconductor lead structure and assembly and method for fabricating same
US3959527A (en) * 1974-04-08 1976-05-25 Lee John Droege Flat costume jewelry and method for the surface treatment thereof
US3968563A (en) * 1975-03-27 1976-07-13 E. I. Du Pont De Nemours And Company Precision registration system for leads
JPS5826828B2 (ja) * 1978-04-26 1983-06-06 新光電気工業株式会社 テ−プキヤリアの製造方法
US4230757A (en) * 1978-06-21 1980-10-28 Eastman Kodak Company Sonically securing articles in plastic mounts

Also Published As

Publication number Publication date
JPS59500636A (ja) 1984-04-12
DK161610B (da) 1991-07-22
FI834347A (fi) 1983-11-28
EP0104242B1 (en) 1987-05-20
EP0104242A1 (en) 1984-04-04
FI834347A0 (fi) 1983-11-28
AU567497B2 (en) 1987-11-26
DK161610C (da) 1991-12-30
US4393131A (en) 1983-07-12
DE3371710D1 (en) 1987-06-25
AU1515883A (en) 1983-10-24
JPH0349424B2 (sv) 1991-07-29
DK535283A (da) 1983-11-23
CA1202123A (en) 1986-03-18
FI68474C (fi) 1985-09-10
WO1983003484A1 (en) 1983-10-13
IL68260A (en) 1987-08-31
IL68260A0 (en) 1983-06-15
DK535283D0 (da) 1983-11-23
EP0104242A4 (en) 1984-10-29

Similar Documents

Publication Publication Date Title
FI68474B (fi) Foerfarande foer att sluta ett substrat i en haollare
EP0219872A2 (en) Mask assembly having mask stress relieving feature
FI82948C (sv) Mask för att bilda elektrodstrukturer i en tunnfilmsanordning
US3795043A (en) Method for obtaining beam lead connections for integrated circuits
CN107709602B (zh) 制造蒸镀掩模、有机半导体元件和有机el显示器的方法、蒸镀掩模准备体、及蒸镀掩模
KR960019477A (ko) 정전 척 장치 및 그의 제작 방법
US3909930A (en) Method for fabricating a liquid crystal display device
KR880014666A (ko) 다층 상호접속 시스템 층 제조방법
NL9300174A (nl) Werkwijze en inrichting voor het langs electrolytische weg plaatselijk aanbrengen van metaalbedekkingen op van openingen voorziene metalen of gemetalliseerde producten.
CN112267091A (zh) 制造蒸镀掩模、有机半导体元件和有机el显示器的方法、蒸镀掩模准备体、及蒸镀掩模
US3960561A (en) Method for making electrical lead frame devices
US4528071A (en) Process for the production of masks having a metal carrier foil
US4015987A (en) Process for making chip carriers using anodized aluminum
JPH07263837A (ja) 両面配線基板の製造法
US5156716A (en) Process for the manufacture of a three layer tape for tape automated bonding
JPS61144396A (ja) スクリ−ン製版
KR100275372B1 (ko) 회로기판 제조방법
JPH0683067A (ja) 印刷版の製造方法
JP2024093559A (ja) 膜付き基板の製造方法
KR970078781A (ko) 인쇄회로 기판의 제조 방법
JPS62267743A (ja) 再露光部を有する剥離現像装置
JPH0286141A (ja) テープキャリアの製造法
JP2929882B2 (ja) 半導体装置用キャリアテープおよびその製造方法
JP3141665B2 (ja) 印版の製造方法
TW351855B (en) Lead frame manufacturing method

Legal Events

Date Code Title Description
MM Patent lapsed
MM Patent lapsed

Owner name: MOTOROLA, INC.