FI64863C - Fotopolymeriserbart material en ljuskaenslig tryckplaot innehaollande detsamma samt ett foerfarande foer framstaellning avryckplaoten - Google Patents
Fotopolymeriserbart material en ljuskaenslig tryckplaot innehaollande detsamma samt ett foerfarande foer framstaellning avryckplaoten Download PDFInfo
- Publication number
- FI64863C FI64863C FI763683A FI763683A FI64863C FI 64863 C FI64863 C FI 64863C FI 763683 A FI763683 A FI 763683A FI 763683 A FI763683 A FI 763683A FI 64863 C FI64863 C FI 64863C
- Authority
- FI
- Finland
- Prior art keywords
- hydrogen
- group
- formula
- synthesis
- acid
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C205/00—Compounds containing nitro groups bound to a carbon skeleton
- C07C205/44—Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by —CHO groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C205/00—Compounds containing nitro groups bound to a carbon skeleton
- C07C205/49—Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups
- C07C205/56—Compounds containing nitro groups bound to a carbon skeleton the carbon skeleton being further substituted by carboxyl groups having nitro groups bound to carbon atoms of six-membered aromatic rings and carboxyl groups bound to acyclic carbon atoms of the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C255/00—Carboxylic acid nitriles
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C47/00—Compounds having —CHO groups
- C07C47/20—Unsaturated compounds having —CHO groups bound to acyclic carbon atoms
- C07C47/24—Unsaturated compounds having —CHO groups bound to acyclic carbon atoms containing halogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C57/00—Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms
- C07C57/30—Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms containing six-membered aromatic rings
- C07C57/42—Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms containing six-membered aromatic rings having unsaturation outside the rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C59/00—Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups
- C07C59/40—Unsaturated compounds
- C07C59/58—Unsaturated compounds containing ether groups, groups, groups, or groups
- C07C59/64—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings
- C07C59/66—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings the non-carboxylic part of the ether containing six-membered aromatic rings
- C07C59/68—Unsaturated compounds containing ether groups, groups, groups, or groups containing six-membered aromatic rings the non-carboxylic part of the ether containing six-membered aromatic rings the oxygen atom of the ether group being bound to a non-condensed six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB5252275 | 1975-12-23 | ||
| GB52522/75A GB1572441A (en) | 1975-12-23 | 1975-12-23 | Photopolymerisable polymers with free carboxyl groups and printing plates therefrom |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| FI763683A FI763683A (id) | 1977-06-24 |
| FI64863B FI64863B (fi) | 1983-09-30 |
| FI64863C true FI64863C (fi) | 1984-01-10 |
Family
ID=10464243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FI763683A FI64863C (fi) | 1975-12-23 | 1976-12-22 | Fotopolymeriserbart material en ljuskaenslig tryckplaot innehaollande detsamma samt ett foerfarande foer framstaellning avryckplaoten |
Country Status (27)
| Country | Link |
|---|---|
| US (1) | US4263394A (id) |
| JP (1) | JPS5286488A (id) |
| AT (1) | AT348552B (id) |
| AU (1) | AU510145B2 (id) |
| BE (1) | BE849803A (id) |
| BR (1) | BR7608579A (id) |
| CA (1) | CA1107444A (id) |
| CH (1) | CH629314A5 (id) |
| CS (1) | CS212783B2 (id) |
| DE (1) | DE2658272A1 (id) |
| DK (1) | DK579976A (id) |
| ES (1) | ES454521A1 (id) |
| FI (1) | FI64863C (id) |
| FR (1) | FR2336707A1 (id) |
| GB (1) | GB1572441A (id) |
| IE (1) | IE44405B1 (id) |
| IT (1) | IT1065419B (id) |
| KE (1) | KE3336A (id) |
| LU (1) | LU76465A1 (id) |
| MW (1) | MW5276A1 (id) |
| NL (1) | NL7614259A (id) |
| NO (1) | NO764338L (id) |
| NZ (1) | NZ182955A (id) |
| PL (1) | PL103094B1 (id) |
| SE (1) | SE424642B (id) |
| ZA (1) | ZA767635B (id) |
| ZM (1) | ZM15276A1 (id) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4284710A (en) | 1980-05-01 | 1981-08-18 | E. I. Du Pont De Nemours And Company | Radiation crosslinkable polyesters and polyesterethers |
| US4343888A (en) | 1980-05-01 | 1982-08-10 | E. I. Du Pont De Nemours And Company | Use of radiation crosslinkable polyesters and polyesterethers in printing plates |
| US4592816A (en) * | 1984-09-26 | 1986-06-03 | Rohm And Haas Company | Electrophoretic deposition process |
| DE3528929A1 (de) * | 1985-08-13 | 1987-02-26 | Hoechst Ag | Strahlungsempfindliches gemisch, dieses enthaltendes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefbildern |
| CN1182485A (zh) * | 1995-04-27 | 1998-05-20 | 美国3M公司 | 负片型无处理印版 |
| US5925497A (en) | 1995-04-27 | 1999-07-20 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
| US6159658A (en) * | 1996-03-19 | 2000-12-12 | Toray Industries, Inc. | Photosensitive resin composition with polymer having an ionic group and having a polymerizable group in the side chain and printing plate materials |
| DK1272457T3 (da) * | 2000-04-13 | 2007-01-08 | Hsc Res Dev Lp | Forbindelser til modulation af celleproliferation |
| CA2407755A1 (en) * | 2002-10-11 | 2004-04-11 | The Hospital For Sick Children | Inhibition of vegf secretion |
| CA2533287A1 (en) * | 2003-07-30 | 2005-02-10 | The Hospital For Sick Children | Compounds for modulating cell proliferation |
| WO2005092904A1 (en) * | 2004-03-26 | 2005-10-06 | Hsc Research And Development Limited Partnership | Novel compounds for modulating cell proliferation |
| US8778568B2 (en) * | 2010-12-14 | 2014-07-15 | General Electric Company | Optical data storage media and methods for using the same |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3799915A (en) * | 1971-08-20 | 1974-03-26 | Western Litho Plate & Supply | Photopolymers |
| US3993684A (en) * | 1971-08-20 | 1976-11-23 | Western Litho Plate & Supply Co. | Monomeric compounds |
| US4065430A (en) * | 1973-02-13 | 1977-12-27 | Fuji Photo Film Co., Ltd. | Functional group containing polymer and method of preparing the same |
-
1975
- 1975-12-23 GB GB52522/75A patent/GB1572441A/en not_active Expired
-
1976
- 1976-12-20 SE SE7614315A patent/SE424642B/xx not_active IP Right Cessation
- 1976-12-21 PL PL1976194590A patent/PL103094B1/pl unknown
- 1976-12-21 CA CA268,315A patent/CA1107444A/en not_active Expired
- 1976-12-21 BR BR7608579A patent/BR7608579A/pt unknown
- 1976-12-22 CH CH1619976A patent/CH629314A5/de not_active IP Right Cessation
- 1976-12-22 NZ NZ182955A patent/NZ182955A/xx unknown
- 1976-12-22 AU AU20818/76A patent/AU510145B2/en not_active Expired
- 1976-12-22 DE DE19762658272 patent/DE2658272A1/de not_active Withdrawn
- 1976-12-22 IE IE2806/76A patent/IE44405B1/en unknown
- 1976-12-22 FI FI763683A patent/FI64863C/fi not_active IP Right Cessation
- 1976-12-22 FR FR7638665A patent/FR2336707A1/fr active Granted
- 1976-12-22 DK DK579976A patent/DK579976A/da not_active Application Discontinuation
- 1976-12-22 NO NO764338A patent/NO764338L/no unknown
- 1976-12-22 NL NL7614259A patent/NL7614259A/xx not_active Application Discontinuation
- 1976-12-22 MW MW52/76A patent/MW5276A1/xx unknown
- 1976-12-23 IT IT30822/76A patent/IT1065419B/it active
- 1976-12-23 JP JP15433576A patent/JPS5286488A/ja active Pending
- 1976-12-23 CS CS768572A patent/CS212783B2/cs unknown
- 1976-12-23 BE BE173590A patent/BE849803A/xx not_active IP Right Cessation
- 1976-12-23 ES ES454521A patent/ES454521A1/es not_active Expired
- 1976-12-23 LU LU76465A patent/LU76465A1/xx unknown
- 1976-12-23 AT AT964076A patent/AT348552B/de not_active IP Right Cessation
- 1976-12-23 ZA ZA767635A patent/ZA767635B/xx unknown
- 1976-12-29 ZM ZM152/76A patent/ZM15276A1/xx unknown
-
1979
- 1979-06-18 US US06/049,272 patent/US4263394A/en not_active Expired - Lifetime
-
1983
- 1983-10-05 KE KE3336A patent/KE3336A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| BR7608579A (pt) | 1977-12-27 |
| SE424642B (sv) | 1982-08-02 |
| FR2336707B1 (id) | 1983-04-29 |
| CH629314A5 (de) | 1982-04-15 |
| NZ182955A (en) | 1979-04-26 |
| CA1107444A (en) | 1981-08-18 |
| GB1572441A (en) | 1980-07-30 |
| CS212783B2 (en) | 1982-03-26 |
| PL103094B1 (pl) | 1979-05-31 |
| SE7614315L (sv) | 1977-06-24 |
| DE2658272A1 (de) | 1977-07-14 |
| ES454521A1 (es) | 1977-12-01 |
| ATA964076A (de) | 1978-07-15 |
| FI763683A (id) | 1977-06-24 |
| AT348552B (de) | 1979-02-26 |
| MW5276A1 (en) | 1978-02-08 |
| AU2081876A (en) | 1978-06-29 |
| JPS5286488A (en) | 1977-07-18 |
| IE44405B1 (en) | 1981-11-18 |
| FI64863B (fi) | 1983-09-30 |
| KE3336A (en) | 1983-11-04 |
| NL7614259A (nl) | 1977-06-27 |
| IT1065419B (it) | 1985-02-25 |
| US4263394A (en) | 1981-04-21 |
| ZM15276A1 (en) | 1978-03-21 |
| NO764338L (id) | 1977-06-24 |
| LU76465A1 (id) | 1977-06-15 |
| AU510145B2 (en) | 1980-06-12 |
| FR2336707A1 (fr) | 1977-07-22 |
| IE44405L (en) | 1977-06-23 |
| DK579976A (da) | 1977-06-24 |
| ZA767635B (en) | 1977-11-30 |
| BE849803A (fr) | 1977-06-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4736055A (en) | Oxime sulfonates containing reactive groups | |
| FI64863C (fi) | Fotopolymeriserbart material en ljuskaenslig tryckplaot innehaollande detsamma samt ett foerfarande foer framstaellning avryckplaoten | |
| US4478977A (en) | Photopolymer derivatives of polyvinyl alcohol | |
| US4268667A (en) | Derivatives of aryl ketones based on 9,10-dihydro-9,10-ethanoanthracene and p-dialkyl-aminoaryl aldehydes as visible sensitizers for photopolymerizable compositions | |
| US2811510A (en) | Light-sensitive polymeric stilbazoles and quaternary salts thereof | |
| JPS6046701B2 (ja) | 光感受性エレメント | |
| US5059698A (en) | Unsaturated beta-keto-ester acetals | |
| US2956878A (en) | Photosensitive polymers and their applications in photography | |
| AU613671B2 (en) | Photopolymers | |
| US3073699A (en) | Addition polymerizable dye-forming compositions, elements, and processes | |
| US4840869A (en) | Light-sensitive composition | |
| US5021505A (en) | Photosensitive poly(vinyl alcohol) derivative | |
| US5330877A (en) | Photosensitive compositions containing stilbazolium groups | |
| JPH0354961B2 (id) | ||
| US3748131A (en) | Photosensitive composition and element comprising light sensitive polymers | |
| FI57183C (fi) | Ljuskaenslig polymer laemplig att anvaendas foer framstaellning av tryckplattor | |
| US2824087A (en) | Light-sensitive rhodanine esters of maleic anhydride copolymers | |
| JP3315757B2 (ja) | 感光性多官能芳香族ジアゾ化合物およびそれを用いた感光性組成物 | |
| JPS5939441B2 (ja) | 光不溶化性ポリビニルアルコ−ル誘導体の製造方法 | |
| JPS60138539A (ja) | 感光性組成物 | |
| US4117039A (en) | Light sensitive materials | |
| FI62911C (fi) | Ljuskaensliga material | |
| EP0039025B1 (en) | Derivatives of aryl ketones as sensitizers of photopolymerizable compounds for the visible spectral range, and photopolymerizable compositions comprising the said sensitizers | |
| US5358999A (en) | Process for preparation of photosensitive compositions of stilbazolium quaternary | |
| CN107765510A (zh) | 一种9‑苯基吖啶大分子类光敏剂及其制备方法和应用 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM | Patent lapsed |
Owner name: VICKERS LIMITED |