FI20105096A0 - Vahvistettu rakennemoduuli ja menetelmä sen valmistamiseksi - Google Patents

Vahvistettu rakennemoduuli ja menetelmä sen valmistamiseksi

Info

Publication number
FI20105096A0
FI20105096A0 FI20105096A FI20105096A FI20105096A0 FI 20105096 A0 FI20105096 A0 FI 20105096A0 FI 20105096 A FI20105096 A FI 20105096A FI 20105096 A FI20105096 A FI 20105096A FI 20105096 A0 FI20105096 A0 FI 20105096A0
Authority
FI
Finland
Prior art keywords
manufacture
structural module
reinforced structural
reinforced
module
Prior art date
Application number
FI20105096A
Other languages
English (en)
Swedish (sv)
Other versions
FI20105096A (fi
FI122616B (fi
Inventor
Olli Jylhae
Matti Putkonen
Arto Pakkala
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Publication of FI20105096A0 publication Critical patent/FI20105096A0/fi
Priority to FI20105096A priority Critical patent/FI122616B/fi
Priority to TW100102412A priority patent/TW201213984A/zh
Priority to EA201290729A priority patent/EA201290729A1/ru
Priority to KR1020127022924A priority patent/KR20120115566A/ko
Priority to PCT/FI2011/050073 priority patent/WO2011095681A1/en
Priority to EP11739440.3A priority patent/EP2531885A4/en
Priority to CN201180007993.XA priority patent/CN102770801B/zh
Priority to US13/576,590 priority patent/US8780314B2/en
Publication of FI20105096A publication Critical patent/FI20105096A/fi
Application granted granted Critical
Publication of FI122616B publication Critical patent/FI122616B/fi

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C27/00—Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
    • C03C27/06—Joining glass to glass by processes other than fusing
    • C03C27/10—Joining glass to glass by processes other than fusing with the aid of adhesive specially adapted for that purpose
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G02F1/133311—Environmental protection, e.g. against dust or humidity
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52—Encapsulations
    • H01L33/54—Encapsulations having a particular shape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/844—Encapsulations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/214—Al2O3
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/50—Protective arrangements
    • G02F2201/503—Arrangements improving the resistance to shock

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Ceramic Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Biodiversity & Conservation Biology (AREA)
  • Ecology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Environmental Sciences (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
FI20105096A 2010-02-02 2010-02-02 Vahvistettu rakennemoduuli ja sen valmistusmenetelmä FI122616B (fi)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FI20105096A FI122616B (fi) 2010-02-02 2010-02-02 Vahvistettu rakennemoduuli ja sen valmistusmenetelmä
TW100102412A TW201213984A (en) 2010-02-02 2011-01-24 Strengthened structural module and method of fabrication
PCT/FI2011/050073 WO2011095681A1 (en) 2010-02-02 2011-01-31 Strengthened structural module and method of fabrication
KR1020127022924A KR20120115566A (ko) 2010-02-02 2011-01-31 보강 구조 모듈 및 제조방법
EA201290729A EA201290729A1 (ru) 2010-02-02 2011-01-31 Упрочненный конструкционный модуль и способ его изготовления
EP11739440.3A EP2531885A4 (en) 2010-02-02 2011-01-31 REINFORCED STRUCTURAL MODULE AND METHOD OF MANUFACTURE
CN201180007993.XA CN102770801B (zh) 2010-02-02 2011-01-31 强化结构模件和制造方法
US13/576,590 US8780314B2 (en) 2010-02-02 2011-01-31 Strengthened structural module and method of fabrication

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20105096 2010-02-02
FI20105096A FI122616B (fi) 2010-02-02 2010-02-02 Vahvistettu rakennemoduuli ja sen valmistusmenetelmä

Publications (3)

Publication Number Publication Date
FI20105096A0 true FI20105096A0 (fi) 2010-02-02
FI20105096A FI20105096A (fi) 2011-08-03
FI122616B FI122616B (fi) 2012-04-30

Family

ID=41727645

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20105096A FI122616B (fi) 2010-02-02 2010-02-02 Vahvistettu rakennemoduuli ja sen valmistusmenetelmä

Country Status (8)

Country Link
US (1) US8780314B2 (fi)
EP (1) EP2531885A4 (fi)
KR (1) KR20120115566A (fi)
CN (1) CN102770801B (fi)
EA (1) EA201290729A1 (fi)
FI (1) FI122616B (fi)
TW (1) TW201213984A (fi)
WO (1) WO2011095681A1 (fi)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102468307A (zh) * 2010-11-15 2012-05-23 联建(中国)科技有限公司 基板模组、显示面板以及触控面板
JP6361327B2 (ja) 2014-07-02 2018-07-25 セイコーエプソン株式会社 電気光学装置、及び電子機器
US20160376705A1 (en) * 2015-06-25 2016-12-29 The Regents Of The University Of California Method for optical coating of large scale substrates

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI57975C (fi) 1979-02-28 1980-11-10 Lohja Ab Oy Foerfarande och anordning vid uppbyggande av tunna foereningshinnor
US4389973A (en) 1980-03-18 1983-06-28 Oy Lohja Ab Apparatus for performing growth of compound thin films
US6174377B1 (en) 1997-03-03 2001-01-16 Genus, Inc. Processing chamber for atomic layer deposition processes
US6689626B2 (en) 1998-07-20 2004-02-10 Koninklijke Philips Electronics N.V. Flexible substrate
FI118014B (fi) * 2000-10-23 2007-05-31 Asm Int Menetelmä alumiinioksidiohutkalvojen valmistamiseksi matalissa lämpötiloissa
US6926572B2 (en) * 2002-01-25 2005-08-09 Electronics And Telecommunications Research Institute Flat panel display device and method of forming passivation film in the flat panel display device
US6887521B2 (en) * 2002-08-15 2005-05-03 Micron Technology, Inc. Gas delivery system for pulsed-type deposition processes used in the manufacturing of micro-devices
KR100641793B1 (ko) 2002-12-26 2006-11-02 샤프 가부시키가이샤 표시패널 및 그 제조방법
US20110043742A1 (en) * 2003-02-21 2011-02-24 Cavanaugh Shanti A Contamination prevention in liquid crystal cells
US20070275181A1 (en) * 2003-05-16 2007-11-29 Carcia Peter F Barrier films for plastic substrates fabricated by atomic layer deposition
US20060284556A1 (en) * 2003-11-12 2006-12-21 Tremel James D Electronic devices and a method for encapsulating electronic devices
KR100700000B1 (ko) * 2004-10-19 2007-03-26 삼성에스디아이 주식회사 표시장치와 그 제조방법
US20080259268A1 (en) * 2007-04-12 2008-10-23 Fujifilm Corporation Process of producing substrate for liquid crystal display device
US7990060B2 (en) * 2007-05-31 2011-08-02 Lg Display Co., Ltd. Organic light emitting display device and method of manufacturing the same
US20090079328A1 (en) 2007-09-26 2009-03-26 Fedorovskaya Elena A Thin film encapsulation containing zinc oxide
FI120832B (fi) 2007-12-03 2010-03-31 Beneq Oy Menetelmä ohuen lasin lujuuden kasvattamiseksi
JP2010055918A (ja) * 2008-08-28 2010-03-11 Seiko Epson Corp 電気光学装置、電気光学装置の製造方法、及び電子機器
WO2011112587A1 (en) * 2010-03-09 2011-09-15 First Solar, Inc. Deposition chamber cleaning system and method

Also Published As

Publication number Publication date
FI20105096A (fi) 2011-08-03
US8780314B2 (en) 2014-07-15
FI122616B (fi) 2012-04-30
EP2531885A1 (en) 2012-12-12
CN102770801A (zh) 2012-11-07
EA201290729A1 (ru) 2013-03-29
TW201213984A (en) 2012-04-01
WO2011095681A1 (en) 2011-08-11
KR20120115566A (ko) 2012-10-18
EP2531885A4 (en) 2014-08-06
CN102770801B (zh) 2015-11-25
US20120307193A1 (en) 2012-12-06

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