FI20095124A - Reaktiokammio - Google Patents

Reaktiokammio Download PDF

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Publication number
FI20095124A
FI20095124A FI20095124A FI20095124A FI20095124A FI 20095124 A FI20095124 A FI 20095124A FI 20095124 A FI20095124 A FI 20095124A FI 20095124 A FI20095124 A FI 20095124A FI 20095124 A FI20095124 A FI 20095124A
Authority
FI
Finland
Prior art keywords
reactor chamber
reactor
chamber
Prior art date
Application number
FI20095124A
Other languages
English (en)
Swedish (sv)
Other versions
FI122940B (fi
FI20095124A0 (fi
Inventor
Janne Peltoniemi
Pekka Soininen
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Priority to FI20095124A priority Critical patent/FI122940B/fi
Publication of FI20095124A0 publication Critical patent/FI20095124A0/fi
Priority to TW099103758A priority patent/TW201040309A/zh
Priority to PCT/FI2010/050077 priority patent/WO2010089459A1/en
Priority to US13/143,314 priority patent/US20110265719A1/en
Priority to CN2010800068061A priority patent/CN102308022A/zh
Priority to EP10738248A priority patent/EP2393960A4/en
Publication of FI20095124A publication Critical patent/FI20095124A/fi
Application granted granted Critical
Publication of FI122940B publication Critical patent/FI122940B/fi

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
FI20095124A 2009-02-09 2009-02-09 Reaktiokammio FI122940B (fi)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FI20095124A FI122940B (fi) 2009-02-09 2009-02-09 Reaktiokammio
TW099103758A TW201040309A (en) 2009-02-09 2010-02-08 Reaction chamber
PCT/FI2010/050077 WO2010089459A1 (en) 2009-02-09 2010-02-08 Reaction chamber
US13/143,314 US20110265719A1 (en) 2009-02-09 2010-02-08 Reaction chamber
CN2010800068061A CN102308022A (zh) 2009-02-09 2010-02-08 反应室
EP10738248A EP2393960A4 (en) 2009-02-09 2010-02-08 REACTION CHAMBER

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20095124A FI122940B (fi) 2009-02-09 2009-02-09 Reaktiokammio
FI20095124 2009-02-09

Publications (3)

Publication Number Publication Date
FI20095124A0 FI20095124A0 (fi) 2009-02-09
FI20095124A true FI20095124A (fi) 2010-08-10
FI122940B FI122940B (fi) 2012-09-14

Family

ID=40404627

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20095124A FI122940B (fi) 2009-02-09 2009-02-09 Reaktiokammio

Country Status (6)

Country Link
US (1) US20110265719A1 (fi)
EP (1) EP2393960A4 (fi)
CN (1) CN102308022A (fi)
FI (1) FI122940B (fi)
TW (1) TW201040309A (fi)
WO (1) WO2010089459A1 (fi)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI20115073A0 (fi) 2011-01-26 2011-01-26 Beneq Oy Laitteisto, menetelmä ja reaktiokammio

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59928A (ja) * 1982-06-25 1984-01-06 Ushio Inc 光加熱装置
US5194401A (en) * 1989-04-18 1993-03-16 Applied Materials, Inc. Thermally processing semiconductor wafers at non-ambient pressures
US5783492A (en) * 1994-03-04 1998-07-21 Tokyo Electron Limited Plasma processing method, plasma processing apparatus, and plasma generating apparatus
US5676757A (en) * 1994-03-28 1997-10-14 Tokyo Electron Limited Decompression container
DE4437050A1 (de) * 1994-10-17 1996-04-18 Leybold Ag Vorrichtung zum Behandeln von Oberflächen von Hohlkörpern, insbesondere von Innenflächen von Kraftstofftanks
US6159300A (en) * 1996-12-17 2000-12-12 Canon Kabushiki Kaisha Apparatus for forming non-single-crystal semiconductor thin film, method for forming non-single-crystal semiconductor thin film, and method for producing photovoltaic device
US6217972B1 (en) * 1997-10-17 2001-04-17 Tessera, Inc. Enhancements in framed sheet processing
TW364054B (en) * 1998-12-31 1999-07-11 United Microelectronics Corp Measurement tool for distance between shower head and heater platform
DE50002987D1 (de) * 2000-02-01 2003-08-28 Emil Baechli Einrichtung zur Oberflächenbehandlung und/oder Beschichtung bzw. zur Fertigung von Bauelementen, insbesondere flacher Bauelemente aus Glas, Glaslegierungen oder Metall, im Durchlaufverfahren
SK5872002A3 (en) * 2000-02-18 2003-06-03 Equipment Technologies Inc Method and apparatus for chemical vapor deposition of polysilicon
KR100458982B1 (ko) * 2000-08-09 2004-12-03 주성엔지니어링(주) 회전형 가스분사기를 가지는 반도체소자 제조장치 및 이를이용한 박막증착방법
AU2001277755A1 (en) * 2000-08-11 2002-02-25 Tokyo Electron Limited Device and method for processing substrate
US6541353B1 (en) * 2000-08-31 2003-04-01 Micron Technology, Inc. Atomic layer doping apparatus and method
TW533503B (en) * 2000-09-14 2003-05-21 Nec Electronics Corp Processing apparatus having particle counter and cleaning device, cleaning method, cleanliness diagnosis method and semiconductor fabricating apparatus using the same
US6800173B2 (en) * 2000-12-15 2004-10-05 Novellus Systems, Inc. Variable gas conductance control for a process chamber
US9708707B2 (en) * 2001-09-10 2017-07-18 Asm International N.V. Nanolayer deposition using bias power treatment
JP2004014543A (ja) * 2002-06-03 2004-01-15 Hitachi Kokusai Electric Inc 半導体製造装置および半導体装置の製造方法
JP2004311640A (ja) * 2003-04-04 2004-11-04 Tokyo Electron Ltd 処理容器
US7108753B2 (en) * 2003-10-29 2006-09-19 Asm America, Inc. Staggered ribs on process chamber to reduce thermal effects
US7169233B2 (en) * 2003-11-21 2007-01-30 Asm America, Inc. Reactor chamber
US20060032736A1 (en) * 2004-02-02 2006-02-16 Lam Research Corporation Deformation reduction at the main chamber
DE102004009772A1 (de) * 2004-02-28 2005-09-15 Aixtron Ag CVD-Reaktor mit Prozesskammerhöhenstabilisierung
US7641762B2 (en) * 2005-09-02 2010-01-05 Applied Materials, Inc. Gas sealing skirt for suspended showerhead in process chamber
JP4791110B2 (ja) * 2005-09-02 2011-10-12 東京エレクトロン株式会社 真空チャンバおよび真空処理装置
FI121750B (fi) * 2005-11-17 2011-03-31 Beneq Oy ALD-reaktori
US7845891B2 (en) * 2006-01-13 2010-12-07 Applied Materials, Inc. Decoupled chamber body
US7891366B2 (en) * 2006-06-16 2011-02-22 Tokyo Electron Limited Liquid processing apparatus
JP2008169437A (ja) * 2007-01-11 2008-07-24 Mitsubishi Heavy Ind Ltd 製膜装置
DE102007057644A1 (de) * 2007-11-28 2009-06-04 Oerlikon Trading Ag, Trübbach Vakuumkammer auf Rahmenbasis für Beschichtungsanlagen
WO2010011397A2 (en) * 2008-05-13 2010-01-28 Northwestern University Scanning probe epitaxy

Also Published As

Publication number Publication date
FI122940B (fi) 2012-09-14
EP2393960A1 (en) 2011-12-14
US20110265719A1 (en) 2011-11-03
CN102308022A (zh) 2012-01-04
EP2393960A4 (en) 2012-10-10
TW201040309A (en) 2010-11-16
FI20095124A0 (fi) 2009-02-09
WO2010089459A1 (en) 2010-08-12

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