FI20080248A0 - Kemiallinen kaasupinnoite ja menetelmä kaasupinnoitteen muodostamiseksi - Google Patents

Kemiallinen kaasupinnoite ja menetelmä kaasupinnoitteen muodostamiseksi

Info

Publication number
FI20080248A0
FI20080248A0 FI20080248A FI20080248A FI20080248A0 FI 20080248 A0 FI20080248 A0 FI 20080248A0 FI 20080248 A FI20080248 A FI 20080248A FI 20080248 A FI20080248 A FI 20080248A FI 20080248 A0 FI20080248 A0 FI 20080248A0
Authority
FI
Finland
Prior art keywords
gas coating
creating
chemical
coating
chemical gas
Prior art date
Application number
FI20080248A
Other languages
English (en)
Swedish (sv)
Other versions
FI20080248L (fi
Original Assignee
Savcor Face Group Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Savcor Face Group Oy filed Critical Savcor Face Group Oy
Priority to FI20080248A priority Critical patent/FI20080248L/fi
Publication of FI20080248A0 publication Critical patent/FI20080248A0/fi
Priority to CA2719306A priority patent/CA2719306A1/en
Priority to EP09725341A priority patent/EP2260121A1/en
Priority to CN2009801111507A priority patent/CN102027155A/zh
Priority to US12/934,143 priority patent/US20110097551A1/en
Priority to PCT/FI2009/050233 priority patent/WO2009118457A1/en
Priority to AU2009229013A priority patent/AU2009229013A1/en
Priority to JP2011501258A priority patent/JP2011515586A/ja
Publication of FI20080248L publication Critical patent/FI20080248L/fi

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
FI20080248A 2008-03-28 2008-03-28 Kemiallinen kaasupinnoite ja menetelmä kaasupinnoitteen muodostamiseksi FI20080248L (fi)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FI20080248A FI20080248L (fi) 2008-03-28 2008-03-28 Kemiallinen kaasupinnoite ja menetelmä kaasupinnoitteen muodostamiseksi
CA2719306A CA2719306A1 (en) 2008-03-28 2009-03-27 A coating and a method for producing a coating
EP09725341A EP2260121A1 (en) 2008-03-28 2009-03-27 A coating and a method for producing a coating
CN2009801111507A CN102027155A (zh) 2008-03-28 2009-03-27 涂层以及制备涂层的方法
US12/934,143 US20110097551A1 (en) 2008-03-28 2009-03-27 Coating and a method for producing a coating
PCT/FI2009/050233 WO2009118457A1 (en) 2008-03-28 2009-03-27 A coating and a method for producing a coating
AU2009229013A AU2009229013A1 (en) 2008-03-28 2009-03-27 A coating and a method for producing a coating
JP2011501258A JP2011515586A (ja) 2008-03-28 2009-03-27 コーティングおよびコーティングを生成するための方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI20080248A FI20080248L (fi) 2008-03-28 2008-03-28 Kemiallinen kaasupinnoite ja menetelmä kaasupinnoitteen muodostamiseksi

Publications (2)

Publication Number Publication Date
FI20080248A0 true FI20080248A0 (fi) 2008-03-28
FI20080248L FI20080248L (fi) 2009-09-29

Family

ID=39269482

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20080248A FI20080248L (fi) 2008-03-28 2008-03-28 Kemiallinen kaasupinnoite ja menetelmä kaasupinnoitteen muodostamiseksi

Country Status (8)

Country Link
US (1) US20110097551A1 (fi)
EP (1) EP2260121A1 (fi)
JP (1) JP2011515586A (fi)
CN (1) CN102027155A (fi)
AU (1) AU2009229013A1 (fi)
CA (1) CA2719306A1 (fi)
FI (1) FI20080248L (fi)
WO (1) WO2009118457A1 (fi)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102815052B (zh) * 2012-06-29 2016-08-24 法国圣戈班玻璃公司 超疏水减反基板及其制作方法
KR101556677B1 (ko) * 2014-02-25 2015-10-01 성균관대학교산학협력단 초소수성 박막, 및 이의 제조 방법
US9751618B2 (en) * 2015-05-06 2017-09-05 The Boeing Company Optical effects for aerodynamic microstructures
EP3354771A4 (en) * 2015-09-21 2018-10-31 Posco Color-treated substrate and color treatment method therefor
US10737462B2 (en) * 2016-08-24 2020-08-11 Hyundai Motor Company Method for coating surface of moving part of vehicle and moving part of vehicle manufactured by the same
CN108059359B (zh) * 2017-12-11 2020-11-10 大连理工大学 一种具有复合润湿性特征的表面的制备方法
WO2023192104A1 (en) * 2022-03-30 2023-10-05 Applied Materials, Inc. Methods of forming cover lens structures for display devices, and related apparatus and devices
WO2023192126A1 (en) * 2022-03-31 2023-10-05 Applied Materials, Inc. Multi-layer wet-dry hardcoats including dual-sided wet hardcoats for flexible cover lens structures, and related methods and coating systems

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4844945A (en) * 1988-05-18 1989-07-04 Hewlett-Packard Company Process for producing patterns in dielectric layers formed by plasma enhanced chemical vapor deposition (PECVD)
US4952420A (en) * 1988-10-12 1990-08-28 Advanced Dielectric Technologies, Inc. Vapor deposition patterning method
US5154797A (en) * 1991-08-14 1992-10-13 The United States Of America As Represented By The Secretary Of The Army Silicon shadow mask
DE19708776C1 (de) * 1997-03-04 1998-06-18 Fraunhofer Ges Forschung Entspiegelungsschicht sowie Verfahren zur Herstellung derselben
JP3720974B2 (ja) * 1998-03-16 2005-11-30 治 高井 撥水性酸化珪素皮膜を有する基材
JP4502445B2 (ja) * 2000-03-16 2010-07-14 大日本印刷株式会社 反射防止フィルムの製造方法
US6661581B1 (en) * 2000-09-29 2003-12-09 Rockwell Scientific Company Graded index microlenses and methods of design and formation
KR20030028296A (ko) * 2001-09-28 2003-04-08 학교법인 한양학원 플라즈마 화학기상증착 장치 및 이를 이용한 탄소나노튜브제조방법
US6844673B1 (en) * 2001-12-06 2005-01-18 Alien Technology Corporation Split-fabrication for light emitting display structures
JP2003306770A (ja) * 2002-04-19 2003-10-31 Dainippon Printing Co Ltd プラズマｃｖｄ法による薄膜形成方法及び反射防止積層体
EP1507281B1 (en) * 2003-08-14 2007-05-16 Fuji Film Manufacturing Europe B.V. Arrangement, method and electrode for generating a plasma
US20070141114A1 (en) * 2005-12-15 2007-06-21 Essilor International Compagnie Generale D'optique Article coated with an ultra high hydrophobic film and process for obtaining same
KR100696554B1 (ko) * 2005-12-16 2007-03-19 삼성에스디아이 주식회사 증착 장치
CN100457960C (zh) * 2006-04-11 2009-02-04 友达光电股份有限公司 具有隔离层的屏蔽及包含此屏蔽的工艺设备
JP2008058723A (ja) * 2006-08-31 2008-03-13 Sharp Corp 防眩性フィルム及び液晶表示装置
US8120854B2 (en) * 2006-12-28 2012-02-21 3M Innovative Properties Company Interference films having acrylamide layer and method of making same
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Also Published As

Publication number Publication date
AU2009229013A1 (en) 2009-10-01
WO2009118457A8 (en) 2011-02-03
WO2009118457A1 (en) 2009-10-01
CN102027155A (zh) 2011-04-20
CA2719306A1 (en) 2009-10-01
FI20080248L (fi) 2009-09-29
EP2260121A1 (en) 2010-12-15
JP2011515586A (ja) 2011-05-19
US20110097551A1 (en) 2011-04-28

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