ES543059A0 - Mejoras introducidas en los procedimientos para la fabrica- cion de planchas de impresion planograficas - Google Patents

Mejoras introducidas en los procedimientos para la fabrica- cion de planchas de impresion planograficas

Info

Publication number
ES543059A0
ES543059A0 ES543059A ES543059A ES543059A0 ES 543059 A0 ES543059 A0 ES 543059A0 ES 543059 A ES543059 A ES 543059A ES 543059 A ES543059 A ES 543059A ES 543059 A0 ES543059 A0 ES 543059A0
Authority
ES
Spain
Prior art keywords
procedures
manufacture
printing plates
planographic printing
improvements introduced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES543059A
Other languages
English (en)
Other versions
ES8700762A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of ES8700762A1 publication Critical patent/ES8700762A1/es
Publication of ES543059A0 publication Critical patent/ES543059A0/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
ES543059A 1984-05-12 1985-05-10 Mejoras introducidas en los procedimientos para la fabrica- cion de planchas de impresion planograficas Expired ES8700762A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19843417645 DE3417645A1 (de) 1984-05-12 1984-05-12 Lichtempfindliches aufzeichnungsmaterial fuer die herstellung von flachdruckplatten

Publications (2)

Publication Number Publication Date
ES8700762A1 ES8700762A1 (es) 1986-10-16
ES543059A0 true ES543059A0 (es) 1986-10-16

Family

ID=6235658

Family Applications (1)

Application Number Title Priority Date Filing Date
ES543059A Expired ES8700762A1 (es) 1984-05-12 1985-05-10 Mejoras introducidas en los procedimientos para la fabrica- cion de planchas de impresion planograficas

Country Status (11)

Country Link
US (1) US4687726A (es)
EP (1) EP0161592A3 (es)
JP (1) JPS60258546A (es)
CN (1) CN85102974A (es)
AU (1) AU585223B2 (es)
BR (1) BR8502239A (es)
CA (1) CA1265694A (es)
DE (1) DE3417645A1 (es)
ES (1) ES8700762A1 (es)
FI (1) FI80154C (es)
ZA (1) ZA853506B (es)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5178989A (en) * 1989-07-21 1993-01-12 Board Of Regents, The University Of Texas System Pattern forming and transferring processes
CA2191055A1 (en) 1995-12-04 1997-06-05 Major S. Dhillon Aqueous developable negative acting photosensitive composition having improved image contrast
DE19915717A1 (de) * 1999-04-08 2000-10-12 Agfa Gevaert Ag Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht
JP2007095750A (ja) 2005-09-27 2007-04-12 Canon Anelva Corp 磁気抵抗効果素子
DE602006009403D1 (de) * 2006-10-17 2009-11-05 Agfa Graphics Nv Negativ arbeitender, wärmeempfindlicher Lithographiedruckplattenvorläufer

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE447178C (de) * 1926-05-16 1927-07-20 Hans Dettmann Verfahren zur Herstellung moeglichst klarer, scharf begrenzter Rasterpunkte auf Offsetmaschinenplatten
US2746863A (en) * 1954-02-10 1956-05-22 Gen Aniline & Film Corp Light sensitive diazotype material
BE529755A (es) * 1954-02-10
US2871119A (en) * 1955-02-21 1959-01-27 Dietzgen Co Eugene Diazotype reproduction material and method
BE606888A (es) * 1960-08-05 1900-01-01
BE603930A (es) * 1960-05-19
US3679419A (en) * 1969-05-20 1972-07-25 Azoplate Corp Light-sensitive diazo condensate containing reproduction material
NL7009571A (es) * 1969-07-09 1971-01-12
BE789196A (fr) * 1971-09-25 1973-03-22 Kalle Ag Matiere a copier photosensible
US3891443A (en) * 1973-02-01 1975-06-24 Polychrome Corp Mat finish photosensitive relief plates
US4168979A (en) * 1974-03-19 1979-09-25 Fuji Photo Film Co., Ltd. Light-sensitive printing plate with matt overlayer
JPS5229302A (en) * 1975-08-28 1977-03-05 Fuji Photo Film Co Ltd Photoosensitive printing plate
DE2926236A1 (de) * 1979-06-29 1981-01-15 Hoechst Ag Lichtempfindliches, positiv arbeitendes kopiermaterial mit rauher oberflaeche
DE2926235A1 (de) * 1979-06-29 1981-01-08 Hoechst Ag Photopolymerisierbares kopiermaterial und verfahren zur herstellung von reliefbildern
JPS5660432A (en) * 1979-10-23 1981-05-25 Fuji Photo Film Co Ltd Photosolubilizing composition
JPS57115548A (en) * 1980-04-23 1982-07-19 Fuji Photo Film Co Ltd Photosensitive printing plate

Also Published As

Publication number Publication date
AU4228685A (en) 1985-11-14
ZA853506B (en) 1985-12-24
FI80154B (fi) 1989-12-29
AU585223B2 (en) 1989-06-15
DE3417645A1 (de) 1985-11-14
US4687726A (en) 1987-08-18
EP0161592A3 (de) 1987-10-28
EP0161592A2 (de) 1985-11-21
JPS60258546A (ja) 1985-12-20
FI851844A0 (fi) 1985-05-09
FI851844L (fi) 1985-11-13
ES8700762A1 (es) 1986-10-16
BR8502239A (pt) 1986-01-14
CN85102974A (zh) 1986-10-15
FI80154C (fi) 1990-04-10
CA1265694A (en) 1990-02-13

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