ES524944A0 - Mejoras introducidas en una valvula destinada a evitar la difusion de gases entre camaras de deposicion adyacentes. - Google Patents

Mejoras introducidas en una valvula destinada a evitar la difusion de gases entre camaras de deposicion adyacentes.

Info

Publication number
ES524944A0
ES524944A0 ES524944A ES524944A ES524944A0 ES 524944 A0 ES524944 A0 ES 524944A0 ES 524944 A ES524944 A ES 524944A ES 524944 A ES524944 A ES 524944A ES 524944 A0 ES524944 A0 ES 524944A0
Authority
ES
Spain
Prior art keywords
gases
diffusion
avoid
deposition chambers
improvements introduced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES524944A
Other languages
English (en)
Other versions
ES8501568A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Energy Conversion Devices Inc
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/407,983 external-priority patent/US4438724A/en
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Publication of ES524944A0 publication Critical patent/ES524944A0/es
Publication of ES8501568A1 publication Critical patent/ES8501568A1/es
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/16—Sealings between relatively-moving surfaces
    • F16J15/168—Sealings between relatively-moving surfaces which permits material to be continuously conveyed
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/16—Sealings between relatively-moving surfaces
    • F16J15/40—Sealings between relatively-moving surfaces by means of fluid
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S277/00—Seal for a joint or juncture
    • Y10S277/906—Seal for article of indefinite length, e.g. strip, sheet

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Photovoltaic Devices (AREA)
  • Chemical Vapour Deposition (AREA)
ES524944A 1982-08-13 1983-08-12 Mejoras introducidas en una valvula destinada a evitar la difusion de gases entre camaras de deposicion adyacentes. Expired ES8501568A1 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/407,983 US4438724A (en) 1982-08-13 1982-08-13 Grooved gas gate
US06/466,995 US4450786A (en) 1982-08-13 1983-02-16 Grooved gas gate

Publications (2)

Publication Number Publication Date
ES524944A0 true ES524944A0 (es) 1984-11-16
ES8501568A1 ES8501568A1 (es) 1984-11-16

Family

ID=27020086

Family Applications (1)

Application Number Title Priority Date Filing Date
ES524944A Expired ES8501568A1 (es) 1982-08-13 1983-08-12 Mejoras introducidas en una valvula destinada a evitar la difusion de gases entre camaras de deposicion adyacentes.

Country Status (8)

Country Link
US (1) US4450786A (es)
EP (1) EP0101286B1 (es)
BR (1) BR8304258A (es)
CA (1) CA1194617A (es)
DE (1) DE3362604D1 (es)
ES (1) ES8501568A1 (es)
MX (1) MX159116A (es)
PH (1) PH19757A (es)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4480585A (en) * 1983-06-23 1984-11-06 Energy Conversion Devices, Inc. External isolation module
US4593644A (en) * 1983-10-26 1986-06-10 Rca Corporation Continuous in-line deposition system
DE3685380D1 (de) * 1985-07-29 1992-06-25 Energy Conversion Devices Inc Verfahren und vorrichtung zum kontinuierlichen niederschlagen von elektrischen isolatoren.
KR0171600B1 (ko) * 1990-02-26 1999-03-30 이노우에 아끼라 밀봉장치
JP2975151B2 (ja) * 1991-03-28 1999-11-10 キヤノン株式会社 半導体素子の連続的製造装置
US5997588A (en) * 1995-10-13 1999-12-07 Advanced Semiconductor Materials America, Inc. Semiconductor processing system with gas curtain
DE19727857C1 (de) * 1997-06-30 1999-04-29 Fraunhofer Ges Forschung Plasmarektor mit Prallströmung zur Oberflächenbehandlung
KR100689423B1 (ko) * 1999-07-13 2007-03-08 아익스트론 아게 씨일장치와 증착반응기에 대한 적용
KR100722592B1 (ko) 1999-12-22 2007-05-28 아익스트론 아게 화학 기상 증착 반응기
US6943066B2 (en) * 2002-06-05 2005-09-13 Advantech Global, Ltd Active matrix backplane for controlling controlled elements and method of manufacture thereof
CN101087899A (zh) * 2004-11-10 2007-12-12 德斯塔尔科技公司 光电装置的垂直生产
US20060096536A1 (en) * 2004-11-10 2006-05-11 Daystar Technologies, Inc. Pressure control system in a photovoltaic substrate deposition apparatus
US7271111B2 (en) * 2005-06-08 2007-09-18 Advantech Global, Ltd Shadow mask deposition of materials using reconfigurable shadow masks
US7531470B2 (en) * 2005-09-27 2009-05-12 Advantech Global, Ltd Method and apparatus for electronic device manufacture using shadow masks
US20080023059A1 (en) * 2006-07-25 2008-01-31 Basol Bulent M Tandem solar cell structures and methods of manufacturing same
US8323735B2 (en) * 2006-10-13 2012-12-04 Solopower, Inc. Method and apparatus to form solar cell absorber layers with planar surface
US20080175993A1 (en) * 2006-10-13 2008-07-24 Jalal Ashjaee Reel-to-reel reaction of a precursor film to form solar cell absorber
US9103033B2 (en) * 2006-10-13 2015-08-11 Solopower Systems, Inc. Reel-to-reel reaction of precursor film to form solar cell absorber
US20090050208A1 (en) * 2006-10-19 2009-02-26 Basol Bulent M Method and structures for controlling the group iiia material profile through a group ibiiiavia compound layer
US8409418B2 (en) * 2009-02-06 2013-04-02 Solopower, Inc. Enhanced plating chemistries and methods for preparation of group IBIIIAVIA thin film solar cell absorbers
US8425753B2 (en) * 2008-05-19 2013-04-23 Solopower, Inc. Electroplating methods and chemistries for deposition of copper-indium-gallium containing thin films
US20100226629A1 (en) * 2008-07-21 2010-09-09 Solopower, Inc. Roll-to-roll processing and tools for thin film solar cell manufacturing

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3602192A (en) * 1969-05-19 1971-08-31 Ibm Semiconductor wafer processing
US4048955A (en) * 1975-09-02 1977-09-20 Texas Instruments Incorporated Continuous chemical vapor deposition reactor
US4354686A (en) * 1979-07-06 1982-10-19 Matsushita Electric Industrial Co., Ltd. Contact-free sealing member
DE3009019A1 (de) * 1980-03-08 1981-09-24 M.A.N.- Roland Druckmaschinen AG, 6050 Offenbach Papierbahnschleuse an einer vakuum- oder gaskammer
IE53197B1 (en) * 1981-03-16 1988-08-31 Energy Conversion Devices Inc Isolation valve

Also Published As

Publication number Publication date
MX159116A (es) 1989-04-21
BR8304258A (pt) 1984-04-24
CA1194617A (en) 1985-10-01
US4450786A (en) 1984-05-29
DE3362604D1 (en) 1986-04-24
EP0101286B1 (en) 1986-03-19
EP0101286A1 (en) 1984-02-22
PH19757A (en) 1986-06-26
ES8501568A1 (es) 1984-11-16

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 20040601