ES491874A0 - Procedimiento de fabricacion de articulos especialmente uti-les en la fabricacion de circuitos integrados de gran escala - Google Patents
Procedimiento de fabricacion de articulos especialmente uti-les en la fabricacion de circuitos integrados de gran escalaInfo
- Publication number
- ES491874A0 ES491874A0 ES491874A ES491874A ES491874A0 ES 491874 A0 ES491874 A0 ES 491874A0 ES 491874 A ES491874 A ES 491874A ES 491874 A ES491874 A ES 491874A ES 491874 A0 ES491874 A0 ES 491874A0
- Authority
- ES
- Spain
- Prior art keywords
- manufacturing
- integrated circuits
- especially useful
- scale integrated
- items especially
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0279—Ionlithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
- G03F7/2065—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam using corpuscular radiation other than electron beams
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Toxicology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US4407379A | 1979-05-31 | 1979-05-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ES8103477A1 ES8103477A1 (es) | 1981-02-16 |
| ES491874A0 true ES491874A0 (es) | 1981-02-16 |
Family
ID=21930389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES491874A Granted ES491874A0 (es) | 1979-05-31 | 1980-05-27 | Procedimiento de fabricacion de articulos especialmente uti-les en la fabricacion de circuitos integrados de gran escala |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP0029061B1 (en, 2012) |
| JP (1) | JPH0536782B2 (en, 2012) |
| CA (1) | CA1145483A (en, 2012) |
| DE (1) | DE3069341D1 (en, 2012) |
| ES (1) | ES491874A0 (en, 2012) |
| IT (1) | IT1130689B (en, 2012) |
| WO (1) | WO1980002752A1 (en, 2012) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5362606A (en) * | 1989-10-18 | 1994-11-08 | Massachusetts Institute Of Technology | Positive resist pattern formation through focused ion beam exposure and surface barrier silylation |
| US5139925A (en) * | 1989-10-18 | 1992-08-18 | Massachusetts Institute Of Technology | Surface barrier silylation of novolak film without photoactive additive patterned with 193 nm excimer laser |
| JPH04130619A (ja) * | 1990-09-20 | 1992-05-01 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3143423A (en) * | 1962-04-02 | 1964-08-04 | Eastman Kodak Co | New photo-resist benzoylazide compositions |
| US3529960A (en) * | 1967-01-24 | 1970-09-22 | Hilbert Sloan | Methods of treating resist coatings |
| US3770433A (en) * | 1972-03-22 | 1973-11-06 | Bell Telephone Labor Inc | High sensitivity negative electron resist |
| JPS576578B2 (en, 2012) * | 1973-11-05 | 1982-02-05 | ||
| US4061799A (en) * | 1973-11-05 | 1977-12-06 | Texas Instruments Incorporated | Method of patterning styrene diene block copolymer electron beam resists |
| JPS5738897B2 (en, 2012) * | 1974-11-19 | 1982-08-18 | ||
| JPS55149942A (en) * | 1979-04-24 | 1980-11-21 | Westinghouse Electric Corp | Treatment for forming pattern on resist layer |
-
1980
- 1980-05-19 JP JP55501398A patent/JPH0536782B2/ja not_active Expired - Lifetime
- 1980-05-19 DE DE8080901137T patent/DE3069341D1/de not_active Expired
- 1980-05-19 WO PCT/US1980/000580 patent/WO1980002752A1/en active IP Right Grant
- 1980-05-23 CA CA000352644A patent/CA1145483A/en not_active Expired
- 1980-05-27 ES ES491874A patent/ES491874A0/es active Granted
- 1980-05-29 IT IT22403/80A patent/IT1130689B/it active
- 1980-12-15 EP EP80901137A patent/EP0029061B1/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| IT8022403A0 (it) | 1980-05-29 |
| DE3069341D1 (en) | 1984-11-08 |
| ES8103477A1 (es) | 1981-02-16 |
| EP0029061B1 (en) | 1984-10-03 |
| EP0029061A1 (en) | 1981-05-27 |
| IT1130689B (it) | 1986-06-18 |
| JPH0536782B2 (en, 2012) | 1993-05-31 |
| EP0029061A4 (en) | 1982-07-13 |
| WO1980002752A1 (en) | 1980-12-11 |
| JPS56500627A (en, 2012) | 1981-05-07 |
| CA1145483A (en) | 1983-04-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FD1A | Patent lapsed |
Effective date: 20010217 |