ES444100A1 - Fuente de vapor para material que tiene una elevada tempera-tura de evaporacion. - Google Patents

Fuente de vapor para material que tiene una elevada tempera-tura de evaporacion.

Info

Publication number
ES444100A1
ES444100A1 ES444100A ES444100A ES444100A1 ES 444100 A1 ES444100 A1 ES 444100A1 ES 444100 A ES444100 A ES 444100A ES 444100 A ES444100 A ES 444100A ES 444100 A1 ES444100 A1 ES 444100A1
Authority
ES
Spain
Prior art keywords
evaporation source
convection barrier
floating
melt
floating convection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES444100A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jersey Nuclear Avco Isotopes Inc
Original Assignee
Jersey Nuclear Avco Isotopes Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jersey Nuclear Avco Isotopes Inc filed Critical Jersey Nuclear Avco Isotopes Inc
Publication of ES444100A1 publication Critical patent/ES444100A1/es
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D59/00—Separation of different isotopes of the same chemical element
    • B01D59/34—Separation by photochemical methods
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Biophysics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacture And Refinement Of Metals (AREA)
ES444100A 1975-01-06 1976-01-05 Fuente de vapor para material que tiene una elevada tempera-tura de evaporacion. Expired ES444100A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/538,881 US3996469A (en) 1975-01-06 1975-01-06 Floating convection barrier for evaporation source

Publications (1)

Publication Number Publication Date
ES444100A1 true ES444100A1 (es) 1977-08-16

Family

ID=24148815

Family Applications (1)

Application Number Title Priority Date Filing Date
ES444100A Expired ES444100A1 (es) 1975-01-06 1976-01-05 Fuente de vapor para material que tiene una elevada tempera-tura de evaporacion.

Country Status (14)

Country Link
US (1) US3996469A (es)
JP (1) JPS5193781A (es)
AU (1) AU508034B2 (es)
BE (1) BE837327A (es)
CA (1) CA1043874A (es)
CH (1) CH603225A5 (es)
DE (1) DE2559065A1 (es)
ES (1) ES444100A1 (es)
FR (1) FR2296457A1 (es)
GB (1) GB1534140A (es)
IL (1) IL48720A (es)
IT (1) IT1052892B (es)
NL (1) NL7515181A (es)
SE (1) SE7514744L (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4124801A (en) * 1976-09-24 1978-11-07 Phrasor Technology Incorporated Apparatus and process for separating materials
US4251725A (en) * 1979-08-06 1981-02-17 Honeywell Inc. Programmed sample pyrolysis for mass spectrometer
US4472453A (en) * 1983-07-01 1984-09-18 Rca Corporation Process for radiation free electron beam deposition
JPS6270576A (ja) * 1985-09-21 1987-04-01 Kawasaki Steel Corp 大量蒸気流発生用蒸発源装置
CA2023044A1 (en) * 1990-08-09 1992-02-10 Naoum Araj Vessel for evaporation of low-temperature melting material
DE102021129537A1 (de) 2021-11-12 2023-05-17 VON ARDENNE Asset GmbH & Co. KG Verfahren, Verdampfungsanordnung und Verwendung einer Konvektionsbarriere

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3329524A (en) * 1963-06-12 1967-07-04 Temescal Metallurgical Corp Centrifugal-type vapor source
CH452313A (de) * 1965-12-18 1968-05-31 Balzers Patent Beteilig Ag Vorrichtung zur Verdampfung von Stoffen im Vakuum
US3414655A (en) * 1966-01-26 1968-12-03 Nat Res Corp Apparatus for evaporation of low temperature semiconductor material by electron beam impingement on the material and comprising means for draining electric charge from the material
SE345881B (es) * 1969-06-13 1972-06-12 Aga Ab
US3772519A (en) * 1970-03-25 1973-11-13 Jersey Nuclear Avco Isotopes Method of and apparatus for the separation of isotopes

Also Published As

Publication number Publication date
AU508034B2 (en) 1980-03-06
SE7514744L (sv) 1976-07-07
IL48720A (en) 1979-01-31
IL48720A0 (en) 1976-03-31
JPS5193781A (es) 1976-08-17
FR2296457B1 (es) 1979-07-20
CH603225A5 (es) 1978-08-15
US3996469A (en) 1976-12-07
CA1043874A (en) 1978-12-05
NL7515181A (nl) 1976-07-08
DE2559065A1 (de) 1976-07-08
FR2296457A1 (fr) 1976-07-30
BE837327A (fr) 1976-05-03
IT1052892B (it) 1981-07-20
GB1534140A (en) 1978-11-29
AU8788475A (en) 1977-06-30

Similar Documents

Publication Publication Date Title
GB2038074B (en) Target arrangement for spallation neutron sources
GB1557226A (en) Corpuscular beam microscopes
ES444100A1 (es) Fuente de vapor para material que tiene una elevada tempera-tura de evaporacion.
JPS5246384A (en) Vacuum evaporation apparatus employing electron beam
JPS5222471A (en) Field radiation type electron gun
JPS52143285A (en) Stabilization of cholesterol-oxydase
JPS5265783A (en) Equipment for evaporation by electron beam
JPS52134492A (en) Ion source unit
JPS5230277A (en) Fluorescent substance for low speed electron beam
JPS5239365A (en) Electronic gun device
JPS5264268A (en) Thermally electron emitting cathode structure
JPS5416968A (en) Field radiation type electronic gun
JPS5313200A (en) Production method of piezo-electric thin film
JPS51140965A (en) Primer composition for vacuum metal evaporation
JPS51136277A (en) Lens for electron particle beam
JPS5222470A (en) Field radiation type electron gun
JPS5222547A (en) Electron beam device
JPS5264269A (en) Thermally electron emitting cathode
JPS5282101A (en) Voltage generator
JPS531396A (en) Electron beam evaporating device
JPS5271972A (en) Acceleration tube
JPS52154997A (en) Evaporator
JPS5241176A (en) Crucible for evaporation source
JPS52107761A (en) Thermally electron emitting cathode
JPS5271239A (en) Electron beam sensitive material