FR2296457A1 - Source de vapeur d'un metal a temperature elevee de vaporisation - Google Patents

Source de vapeur d'un metal a temperature elevee de vaporisation

Info

Publication number
FR2296457A1
FR2296457A1 FR7600083A FR7600083A FR2296457A1 FR 2296457 A1 FR2296457 A1 FR 2296457A1 FR 7600083 A FR7600083 A FR 7600083A FR 7600083 A FR7600083 A FR 7600083A FR 2296457 A1 FR2296457 A1 FR 2296457A1
Authority
FR
France
Prior art keywords
metal
vaporization temperature
vapor source
high vaporization
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7600083A
Other languages
English (en)
Other versions
FR2296457B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jersey Nuclear Avco Isotopes Inc
Original Assignee
Jersey Nuclear Avco Isotopes Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jersey Nuclear Avco Isotopes Inc filed Critical Jersey Nuclear Avco Isotopes Inc
Publication of FR2296457A1 publication Critical patent/FR2296457A1/fr
Application granted granted Critical
Publication of FR2296457B1 publication Critical patent/FR2296457B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D59/00—Separation of different isotopes of the same chemical element
    • B01D59/34—Separation by photochemical methods
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacture And Refinement Of Metals (AREA)
FR7600083A 1975-01-06 1976-01-05 Source de vapeur d'un metal a temperature elevee de vaporisation Granted FR2296457A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/538,881 US3996469A (en) 1975-01-06 1975-01-06 Floating convection barrier for evaporation source

Publications (2)

Publication Number Publication Date
FR2296457A1 true FR2296457A1 (fr) 1976-07-30
FR2296457B1 FR2296457B1 (fr) 1979-07-20

Family

ID=24148815

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7600083A Granted FR2296457A1 (fr) 1975-01-06 1976-01-05 Source de vapeur d'un metal a temperature elevee de vaporisation

Country Status (14)

Country Link
US (1) US3996469A (fr)
JP (1) JPS5193781A (fr)
AU (1) AU508034B2 (fr)
BE (1) BE837327A (fr)
CA (1) CA1043874A (fr)
CH (1) CH603225A5 (fr)
DE (1) DE2559065A1 (fr)
ES (1) ES444100A1 (fr)
FR (1) FR2296457A1 (fr)
GB (1) GB1534140A (fr)
IL (1) IL48720A (fr)
IT (1) IT1052892B (fr)
NL (1) NL7515181A (fr)
SE (1) SE7514744L (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0475574A1 (fr) * 1990-08-09 1992-03-18 Noranda Inc. Appareillage pour évaporer un matériau à bas point de fusion

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4124801A (en) * 1976-09-24 1978-11-07 Phrasor Technology Incorporated Apparatus and process for separating materials
US4251725A (en) * 1979-08-06 1981-02-17 Honeywell Inc. Programmed sample pyrolysis for mass spectrometer
US4472453A (en) * 1983-07-01 1984-09-18 Rca Corporation Process for radiation free electron beam deposition
JPS6270576A (ja) * 1985-09-21 1987-04-01 Kawasaki Steel Corp 大量蒸気流発生用蒸発源装置
DE102021129537A1 (de) 2021-11-12 2023-05-17 VON ARDENNE Asset GmbH & Co. KG Verfahren, Verdampfungsanordnung und Verwendung einer Konvektionsbarriere

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3414655A (en) * 1966-01-26 1968-12-03 Nat Res Corp Apparatus for evaporation of low temperature semiconductor material by electron beam impingement on the material and comprising means for draining electric charge from the material
DE1521525B1 (de) * 1963-06-12 1970-03-12 Air Reduction Verfahren und Vorrichtung zum Herstellen von UEberzuegen,insbesondere auf flaechigen Traegerunterlagen,durch Vakuumaufdampfen

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH452313A (de) * 1965-12-18 1968-05-31 Balzers Patent Beteilig Ag Vorrichtung zur Verdampfung von Stoffen im Vakuum
SE345881B (fr) * 1969-06-13 1972-06-12 Aga Ab
US3772519A (en) * 1970-03-25 1973-11-13 Jersey Nuclear Avco Isotopes Method of and apparatus for the separation of isotopes

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1521525B1 (de) * 1963-06-12 1970-03-12 Air Reduction Verfahren und Vorrichtung zum Herstellen von UEberzuegen,insbesondere auf flaechigen Traegerunterlagen,durch Vakuumaufdampfen
US3414655A (en) * 1966-01-26 1968-12-03 Nat Res Corp Apparatus for evaporation of low temperature semiconductor material by electron beam impingement on the material and comprising means for draining electric charge from the material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0475574A1 (fr) * 1990-08-09 1992-03-18 Noranda Inc. Appareillage pour évaporer un matériau à bas point de fusion

Also Published As

Publication number Publication date
AU508034B2 (en) 1980-03-06
AU8788475A (en) 1977-06-30
SE7514744L (sv) 1976-07-07
CH603225A5 (fr) 1978-08-15
IL48720A0 (en) 1976-03-31
ES444100A1 (es) 1977-08-16
BE837327A (fr) 1976-05-03
GB1534140A (en) 1978-11-29
IL48720A (en) 1979-01-31
IT1052892B (it) 1981-07-20
FR2296457B1 (fr) 1979-07-20
NL7515181A (nl) 1976-07-08
US3996469A (en) 1976-12-07
JPS5193781A (fr) 1976-08-17
CA1043874A (fr) 1978-12-05
DE2559065A1 (de) 1976-07-08

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Legal Events

Date Code Title Description
ST Notification of lapse