ES394122A1 - Mejoras introducidas en un procedimiento para la obtencion de una masa copiativa fotopolimerizable. - Google Patents

Mejoras introducidas en un procedimiento para la obtencion de una masa copiativa fotopolimerizable.

Info

Publication number
ES394122A1
ES394122A1 ES394122A ES394122A ES394122A1 ES 394122 A1 ES394122 A1 ES 394122A1 ES 394122 A ES394122 A ES 394122A ES 394122 A ES394122 A ES 394122A ES 394122 A1 ES394122 A1 ES 394122A1
Authority
ES
Spain
Prior art keywords
copying
photopolymerizable
material produced
composition
produced therewith
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES394122A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of ES394122A1 publication Critical patent/ES394122A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
ES394122A 1970-08-11 1971-08-10 Mejoras introducidas en un procedimiento para la obtencion de una masa copiativa fotopolimerizable. Expired ES394122A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2039861A DE2039861C3 (de) 1970-08-11 1970-08-11 Photopolymensierbare Kopier masse

Publications (1)

Publication Number Publication Date
ES394122A1 true ES394122A1 (es) 1975-09-16

Family

ID=5779444

Family Applications (1)

Application Number Title Priority Date Filing Date
ES394122A Expired ES394122A1 (es) 1970-08-11 1971-08-10 Mejoras introducidas en un procedimiento para la obtencion de una masa copiativa fotopolimerizable.

Country Status (17)

Country Link
US (1) US3765898A (es)
JP (1) JPS545293B1 (es)
AT (1) AT310553B (es)
AU (1) AU451129B2 (es)
BE (1) BE771108A (es)
BR (1) BR7105137D0 (es)
CA (1) CA973420A (es)
CS (1) CS157724B2 (es)
DE (1) DE2039861C3 (es)
ES (1) ES394122A1 (es)
FR (1) FR2102175B1 (es)
GB (1) GB1357367A (es)
NL (1) NL165849C (es)
NO (1) NO132775C (es)
PL (1) PL85202B1 (es)
SE (1) SE370582B (es)
ZA (1) ZA715281B (es)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4001017A (en) * 1972-12-05 1977-01-04 Ciba-Geigy Ag Process for the photopolymerization of ethylenically unsaturated compounds
CH573448A5 (es) * 1972-12-05 1976-03-15 Ciba Geigy Ag
US3873319A (en) * 1974-01-31 1975-03-25 Minnesota Mining & Mfg Dry-film negative photoresist having amidized styrene-maleic anhydride binder material
DE2558812C2 (de) * 1975-12-27 1987-04-30 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares Gemisch
US4273857A (en) * 1976-01-30 1981-06-16 E. I. Du Pont De Nemours And Company Polymeric binders for aqueous processable photopolymer compositions
US4239849A (en) * 1978-06-19 1980-12-16 Dynachem Corporation Polymers for aqueous processed photoresists
DE2850585A1 (de) * 1978-11-22 1980-06-04 Hoechst Ag Photopolymerisierbares gemisch
US4353978A (en) * 1979-08-14 1982-10-12 E. I. Du Pont De Nemours And Company Polymeric binders for aqueous processable photopolymer compositions
US4517281A (en) * 1980-10-06 1985-05-14 E. I. Du Pont De Nemours And Company Development process for aqueous developable photopolymerizable elements
US4485167A (en) * 1980-10-06 1984-11-27 E. I. Du Pont De Nemours And Company Aqueous developable photopolymerizable elements
US4365019A (en) 1981-08-06 1982-12-21 Eastman Kodak Company Positive-working resist quinone diazide containing composition and imaging method having improved development rates
EP0105382B1 (en) * 1982-04-07 1987-01-07 Sony Corporation Image-forming photo-sensitive material
DE3232621A1 (de) * 1982-09-02 1984-03-08 Hoechst Ag, 6230 Frankfurt 1,3-diaza-9-thia-anthracen-2,4-dione und diese enthaltendes photopolymerisierbares gemisch
DE3232620A1 (de) * 1982-09-02 1984-03-08 Hoechst Ag, 6230 Frankfurt 10-phenyl1-1,3,9-triazaanthracene und diese enthaltendes photopolymerisierbares gemisch
US4610951A (en) * 1983-06-06 1986-09-09 Dynachem Corporation Process of using a flexible, fast processing photopolymerizable composition
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
DE3420039A1 (de) * 1984-05-29 1985-12-12 Hoechst Ag, 6230 Frankfurt 2,3-bis(dialkylaminophenyl)chinoxaline und ihre verwendung in elektrophotographischen aufzeichnungsmaterialien
DE3420425A1 (de) * 1984-06-01 1985-12-05 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares gemisch, das als photoinitiator ein 1,3,10-triazaanthracen-4-on- enthaelt
DE3537380A1 (de) * 1985-10-21 1987-04-23 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
DE3613632A1 (de) * 1986-04-23 1987-10-29 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
US4940648A (en) * 1988-02-12 1990-07-10 Hoechst Celanese Corporation Increased sensitivity photoinitiation compositions
DE69524589D1 (de) 1995-08-08 2002-01-24 Agfa Gevaert Nv Verfahren zur Bildung von metallischen Bildern
EP0762214A1 (en) 1995-09-05 1997-03-12 Agfa-Gevaert N.V. Photosensitive element comprising an image forming layer and a photopolymerisable layer
US5753414A (en) * 1995-10-02 1998-05-19 Macdermid Imaging Technology, Inc. Photopolymer plate having a peelable substrate
US5935759A (en) * 1996-04-23 1999-08-10 Agfa-Gevaert Method for making a multicolor image and photosensitive material therefor
US6184226B1 (en) * 1998-08-28 2001-02-06 Scios Inc. Quinazoline derivatives as inhibitors of P-38 α
US6555288B1 (en) 1999-06-21 2003-04-29 Corning Incorporated Optical devices made from radiation curable fluorinated compositions
US6306563B1 (en) 1999-06-21 2001-10-23 Corning Inc. Optical devices made from radiation curable fluorinated compositions
JP4574606B2 (ja) * 2002-11-13 2010-11-04 株式会社半導体エネルギー研究所 電界発光素子
WO2004043937A1 (ja) * 2002-11-13 2004-05-27 Semiconductor Energy Laboratory Co., Ltd. キノキサリン誘導体、有機半導体素子および電界発光素子
US8071260B1 (en) * 2004-06-15 2011-12-06 Inphase Technologies, Inc. Thermoplastic holographic media
KR101426513B1 (ko) * 2006-09-29 2014-08-05 가부시키가이샤 한도오따이 에네루기 켄큐쇼 퀴녹살린 유도체, 발광소자, 발광장치 및 전자기기
CN102241637A (zh) * 2011-06-29 2011-11-16 泰山医学院 2,3-二苯基-6-酰胺基喹喔啉化合物及制备方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3479185A (en) * 1965-06-03 1969-11-18 Du Pont Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers
DE1597784C3 (de) * 1967-08-31 1976-01-02 Hoechst Ag, 6000 Frankfurt Sensibilisierte Druckplatte

Also Published As

Publication number Publication date
ZA715281B (en) 1972-04-26
NO132775B (es) 1975-09-22
SU438204A3 (ru) 1974-07-30
AT310553B (de) 1973-10-10
DE2039861A1 (de) 1972-02-17
NL165849B (nl) 1980-12-15
BR7105137D0 (pt) 1973-04-12
JPS545293B1 (es) 1979-03-15
PL85202B1 (es) 1976-04-30
GB1357367A (en) 1974-06-19
CS157724B2 (es) 1974-09-16
US3765898A (en) 1973-10-16
AU451129B2 (en) 1974-07-25
DE2039861B2 (de) 1973-05-30
FR2102175A1 (es) 1972-04-07
SE370582B (es) 1974-10-21
NL7110562A (es) 1972-02-15
AU3223071A (en) 1973-02-15
NO132775C (es) 1976-01-07
BE771108A (fr) 1972-02-09
DE2039861C3 (de) 1973-12-13
FR2102175B1 (es) 1979-08-17
NL165849C (nl) 1981-05-15
CA973420A (en) 1975-08-26

Similar Documents

Publication Publication Date Title
ES394122A1 (es) Mejoras introducidas en un procedimiento para la obtencion de una masa copiativa fotopolimerizable.
ES391854A1 (es) Mejoras introducidas en un procedimiento para la obtencion de una masa copiadora fotopolimerizable.
IL38455A (en) Photopolymerizable copying composition
AR217039A1 (es) Composicion fotopolimerizable
SE415782B (sv) Slithallfast kompositlegering omfattande sferoidala partiklar
SE431880C (sv) Fotopolymeriserbar komposition
ZA713333B (en) New cement compositions
BG28074A4 (en) Vinyl resine stabilisator
ZA714857B (en) Photopolymerizable copying material
ZA715906B (en) Photopolymerizable compounds and copying compositions and copying materials produced therewith
BG31077A3 (en) Composition of polimerisation
IT1041779B (it) Compositzione ignifugante
BG31076A3 (en) Composition of polymerisation
IT1066036B (it) Composizioni polimerizzabili stabilizzate
AU7197374A (en) %dialkylsulfonamide derivative<
ES460282A2 (es) Perfeccionamientos introducidos en las prensas hidraulicas, especialmente a las destinadas a la fabricacion de losetas yplatos de material ceramico y similares.
ES454307A1 (es) Procedimiento para la preparacion de nuevos derivados de ci-clopentano.
ES439431A1 (es) Procedimiento de preparacion de derivados de la tienopiridi-na.
AU3653171A (en) Photopolymerizable composition
IL46607A0 (en) Fungicidal compositions containing disubstituted phosphonates
IT1042878B (it) Composizioni fotopolimerizzabili
ES438725A1 (es) Un procedimiento de preparacion de derivados sustituidos del acido prostanoico.
ES280575A1 (es) Mejoras introducidas en la fabricaciën de materiales ferromagneticos
CA668618A (en) Gypsum composition
AU3726771A (en) Addition polymerizable polymeric compounds and photopolymerizable compositions and elements containing them