ES384199A1 - Procedimiento para la formacion de un revestimiento com- puesto que contiene niquel, de tres capas, protectorcontra la corrosion, sobre una superficie metalica base susceptiblede corroerse. - Google Patents
Procedimiento para la formacion de un revestimiento com- puesto que contiene niquel, de tres capas, protectorcontra la corrosion, sobre una superficie metalica base susceptiblede corroerse.Info
- Publication number
- ES384199A1 ES384199A1 ES384199A ES384199A ES384199A1 ES 384199 A1 ES384199 A1 ES 384199A1 ES 384199 A ES384199 A ES 384199A ES 384199 A ES384199 A ES 384199A ES 384199 A1 ES384199 A1 ES 384199A1
- Authority
- ES
- Spain
- Prior art keywords
- layer
- nickel
- sulfur
- electrodeposition
- intermediate layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title abstract 12
- 229910052759 nickel Inorganic materials 0.000 title abstract 6
- 239000002131 composite material Substances 0.000 title abstract 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 7
- 229910052717 sulfur Inorganic materials 0.000 abstract 7
- 239000011593 sulfur Substances 0.000 abstract 7
- 238000004070 electrodeposition Methods 0.000 abstract 4
- 230000001464 adherent effect Effects 0.000 abstract 3
- 150000001408 amides Chemical class 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Laminated Bodies (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US86294269A | 1969-10-01 | 1969-10-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES384199A1 true ES384199A1 (es) | 1973-01-01 |
Family
ID=25339801
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES384199A Expired ES384199A1 (es) | 1969-10-01 | 1970-10-02 | Procedimiento para la formacion de un revestimiento com- puesto que contiene niquel, de tres capas, protectorcontra la corrosion, sobre una superficie metalica base susceptiblede corroerse. |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS4840541B1 (enExample) |
| BE (1) | BE756432A (enExample) |
| CA (1) | CA918596A (enExample) |
| DE (1) | DE2045301B2 (enExample) |
| ES (1) | ES384199A1 (enExample) |
| FR (1) | FR2064070B1 (enExample) |
| GB (1) | GB1321859A (enExample) |
| NL (1) | NL7013991A (enExample) |
| SE (1) | SE375341B (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU8469875A (en) * | 1975-03-07 | 1977-03-17 | Oxy Metal Industries Corp | Thioether sulphonates |
| US4376682A (en) * | 1980-04-07 | 1983-03-15 | Tdc Technology Development Corporation | Method for producing smooth coherent metal chalconide films |
| US4411961A (en) * | 1981-09-28 | 1983-10-25 | Occidental Chemical Corporation | Composite electroplated article and process |
| JP6220359B2 (ja) * | 2015-03-26 | 2017-10-25 | Ｊｘ金属株式会社 | フィルム外装電池用タブリード材料及びその製造方法 |
-
0
- BE BE756432D patent/BE756432A/xx unknown
-
1970
- 1970-09-14 DE DE2045301A patent/DE2045301B2/de active Granted
- 1970-09-22 NL NL7013991A patent/NL7013991A/xx unknown
- 1970-09-22 FR FR707034252A patent/FR2064070B1/fr not_active Expired
- 1970-09-24 CA CA093979A patent/CA918596A/en not_active Expired
- 1970-09-28 GB GB4608870A patent/GB1321859A/en not_active Expired
- 1970-09-30 JP JP45085208A patent/JPS4840541B1/ja active Pending
- 1970-09-30 SE SE7013242A patent/SE375341B/xx unknown
- 1970-10-02 ES ES384199A patent/ES384199A1/es not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2045301B2 (de) | 1973-09-13 |
| DE2045301A1 (de) | 1971-04-08 |
| JPS4840541B1 (enExample) | 1973-12-01 |
| DE2045301C3 (enExample) | 1974-04-25 |
| SE375341B (enExample) | 1975-04-14 |
| CA918596A (en) | 1973-01-09 |
| NL7013991A (enExample) | 1971-04-05 |
| FR2064070B1 (enExample) | 1974-03-01 |
| BE756432A (fr) | 1971-03-22 |
| FR2064070A1 (enExample) | 1971-07-16 |
| GB1321859A (en) | 1973-07-04 |
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